-
公开(公告)号：EP1302248A3
公开(公告)日：2003-07-09
申请号：EP03001217.3
申请日：1992-05-08
申请人： CELESTECH, INC.
CPC分类号： C23C16/276 , C23C16/27 , C23C16/277 , C23C16/458 , C23C16/4584 , C23C16/513
摘要： The disclosure is directed to a plasma jet deposition method and apparatus for depositing a substance, such as synthetic diamond. A plasma beam containing constituents of the substance to be deposited is produced. A substrate (150) is provided, and has a surface in the path of the beam, the area of said surface being substantially larger than the cross-sectional area of the beam impinging on the surface. Repetitive motion is introduced between the substrate and the beam as the substrate is deposited on the surface. The substrate in a plasma jet deposition system can be provided with structural attributes, such as apertures (170) and/or grooves (168), that facilitate efficient deposition. Groups of substrates (610,620,630 and 640) can be arranged with surfaces generally along the envelope of plasma beam to facilitate efficient deposition.
摘要翻译： 本公开涉及用于沉积诸如人造金刚石的物质的等离子体射流沉积方法和设备。 产生包含待沉积物质成分的等离子束。 提供衬底（150），并且在所述光束的路径中具有表面，所述表面的面积基本大于撞击在所述表面上的光束的横截面面积。 当衬底沉积在表面上时，在衬底和梁之间引入重复运动。 等离子喷射沉积系统中的基底可以设置有促进有效沉积的结构属性，例如孔（170）和/或凹槽（168）。 基底组（610,620,630和640）可以布置为具有大致沿着等离子束的包络线的表面以促进有效的沉积。
-
2.发明公开
公开(公告)号：EP1302248A2
公开(公告)日：2003-04-16
申请号：EP03001217.3
申请日：1992-05-08
申请人： CELESTECH, INC.
CPC分类号： C23C16/276 , C23C16/27 , C23C16/277 , C23C16/458 , C23C16/4584 , C23C16/513
摘要： The disclosure is directed to a plasma jet deposition method and apparatus for depositing a substance, such as synthetic diamond. A plasma beam containing constituents of the substance to be deposited is produced. A substrate (150) is provided, and has a surface in the path of the beam, the area of said surface being substantially larger than the cross-sectional area of the beam impinging on the surface. Repetitive motion is introduced between the substrate and the beam as the substrate is deposited on the surface. The substrate in a plasma jet deposition system can be provided with structural attributes, such as apertures (170) and/or grooves (168), that facilitate efficient deposition. Groups of substrates (610,620,630 and 640) can be arranged with surfaces generally along the envelope of plasma beam to facilitate efficient deposition.
摘要翻译： 本公开涉及一种用于沉积诸如人造金刚石的物质的等离子体喷射沉积方法和装置。 产生含有待沉积物质成分的等离子体束。 提供基板（150），并且在光束的路径中具有表面，所述表面的面积基本上大于撞击在表面上的光束的横截面积。 当衬底沉积在表面上时，在衬底和光束之间引入重复运动。 等离子体喷射沉积系统中的基底可以具有有助于有效沉积的结构属性，例如孔（170）和/或凹槽（168）。 一组基板（610,620,630和640）可以布置成大致沿着等离子体束的包络线，以便于有效的沉积。
-
公开(公告)号：EP0969120A2
公开(公告)日：2000-01-05
申请号：EP99119093.5
申请日：1992-05-08
申请人： CELESTECH, INC.
CPC分类号： C23C16/276 , C23C16/27 , C23C16/277 , C23C16/458 , C23C16/4584 , C23C16/513
摘要： The disclosure is directed to a plasma jet deposition method and apparatus for depositing a substance, such as synthetic diamond. A plasma beam (225) containing constituents of the substance to be deposited is produced. A substrate (150) is provided, and has a surface in the path of the beam, the area of said surface being substantially larger than the cross-sectional area of the beam impinging on the surface. Repetitive motion is introduced between the substrate and the beam as the substrate is deposited on the surface. The substrate in a plasma jet deposition system can be provided with structural attributes, such as apertures (170) and/or grooves (168), that facilitate efficient deposition. Groups of substrates (610,620,630 and 640) can be arranged with surfaces generally along the envelope of plasma beam to facilitate efficient deposition.
摘要翻译： 本公开涉及用于沉积诸如人造金刚石的物质的等离子体射流沉积方法和设备。 产生包含待沉积物质成分的等离子束（225）。 提供衬底（150），并且在所述光束的路径中具有表面，所述表面的面积基本大于撞击在所述表面上的光束的横截面面积。 当衬底沉积在表面上时，在衬底和梁之间引入重复运动。 等离子喷射沉积系统中的基底可以设置有促进有效沉积的结构属性，例如孔（170）和/或凹槽（168）。 基底组（610,620,630和640）可以布置为具有大致沿着等离子束的包络线的表面以促进有效的沉积。
-
公开(公告)号：EP0969120B1
公开(公告)日：2003-07-30
申请号：EP99119093.5
申请日：1992-05-08
申请人： CELESTECH, INC.
CPC分类号： C23C16/276 , C23C16/27 , C23C16/277 , C23C16/458 , C23C16/4584 , C23C16/513
-
公开(公告)号：EP0969120A3
公开(公告)日：2000-04-12
申请号：EP99119093.5
申请日：1992-05-08
申请人： CELESTECH, INC.
CPC分类号： C23C16/276 , C23C16/27 , C23C16/277 , C23C16/458 , C23C16/4584 , C23C16/513
摘要： The disclosure is directed to a plasma jet deposition method and apparatus for depositing a substance, such as synthetic diamond. A plasma beam containing constituents of the substance to be deposited is produced. A substrate (150) is provided, and has a surface in the path of the beam, the area of said surface being substantially larger than the cross-sectional area of the beam impinging on the surface. Repetitive motion is introduced between the substrate and the beam as the substrate is deposited on the surface. The substrate in a plasma jet deposition system can be provided with structural attributes, such as apertures (170) and/or grooves (168), that facilitate efficient deposition. Groups of substrates (610,620,630 and 640) can be arranged with surfaces generally along the envelope of plasma beam to facilitate efficient deposition.
-
-
-
-
搜索结果
5 条记录 (耗时 0.007 秒)
