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公开(公告)号:EP0931176A1
公开(公告)日:1999-07-28
申请号:EP97944512.0
申请日:1997-09-26
申请人: CELESTECH, INC.
CPC分类号: C23C16/4551 , C23C16/513 , H05H1/42
摘要: A plasma jet CVD system (100) includes gas injectors (122a-122h) and a stand-off ring (126). The gas injectors have outlet holes (236a-h) preferably flared to approach the expansion angle of the injected jet, thereby keeping the holes substantially free from entrained atomic hydrogen. The injectors are arranged counter-rotational to the swirl of the primary jet, providing a more uniform mixture of hydrocarbons and atomic hydrogen. The stand-off ring provides vents (152a-152d) for cooler gases to enter the nozzle (128), thereby decreasing the overall temperature of the injectors and decreasing the temperature gradient experienced by the injectors, thereby preventing injector cracking. In addition the vents reduce shear, thereby increasing jet velocity and increasing the deposition rate for the coating. In addition, a new method of injector design permits optimal mixing characteristics to be obtained across various recipes whereby the ratio of the mass flux of the primary flow of the jet to the mass flux of the injected flow from the downstream injectors is kept constant.
摘要翻译: 等离子体喷射CVD系统(100)包括气体喷射器(122a-122h)和支座环(126)。 气体喷射器具有出口孔(236a-h),该出口孔优选地张开以接近喷射射流的膨胀角,由此保持孔基本上没有夹带的原子氢。 喷射器与主射流的旋流成反向旋转,提供更均匀的烃和原子氢混合物。 的对峙环提供通风口(152A-152D),用于冷却器气体进入喷嘴(128),从而降低了喷射器的整体温度和降低由喷射器所经历的温度梯度,从而防止注射器破裂。 另外,通风孔减少剪切力,从而增加射流速度并增加涂层的沉积速率。 此外,为了在各种配方,由此喷射的初级流从下游喷射器所喷射流的质量流量的质量流量之比保持恒定来获得的喷射器设计允许最优混合特性的新方法。