摘要:
The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and reduced polydispersity, by isolating such novolak resin fractions in a continuous fractionation and separation method using a liquid/liquid centrifuge, thereby reducing processing time and isolation steps which can cause undesirable changes in the novolak resin. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.