HIGH-GAIN WIDE BANDGAP DARLINGTON TRANSISTORS AND RELATED METHODS OF FABRICATION
    1.
    发明公开
    HIGH-GAIN WIDE BANDGAP DARLINGTON TRANSISTORS AND RELATED METHODS OF FABRICATION 审中-公开
    高增益宽带隙和相关方法达林顿晶体管

    公开(公告)号:EP2454751A1

    公开(公告)日:2012-05-23

    申请号:EP10742052.3

    申请日:2010-07-15

    申请人: Cree, Inc.

    摘要: A packaged power electronic device includes a wide bandgap bipolar driver transistor having a base, a collector, and an emitter terminal, and a wide bandgap bipolar output transistor having a base, a collector, and an emitter terminal. The collector terminal of the output transistor is coupled to the collector terminal of the driver transistor, and the base terminal of the output transistor is coupled to the emitter terminal of the driver transistor to provide a Darlington pair. An area of the output transistor is at least 3 times greater than an area of the driver transistor in plan view. For example, an area ratio of the output transistor to the driver transistor may be between about 3:1 to about 5:1. Related devices and methods of fabrication are also discussed.

    SILICON CARBIDE DEVICE AND METHOD OF FABRICATING THE SAME
    6.
    发明公开
    SILICON CARBIDE DEVICE AND METHOD OF FABRICATING THE SAME 审中-公开
    碳化硅器件及其制造方法

    公开(公告)号:EP1883972A1

    公开(公告)日:2008-02-06

    申请号:EP06738330.7

    申请日:2006-03-15

    申请人: CREE, INC.

    IPC分类号: H01L29/74 H01L29/06

    摘要: High voltage silicon carbide (SiC) devices, for example, thyristors, are provided. A first SiC layer having a first conductivity type is provided on a first surface of a voltage blocking SiC substrate having a second conductivity type. A first region of SiC is provided on the first SiC layer and has the second conductivity type. A second region of SiC is provided in the first SiC layer. The second region of SiC has the first conductivity type and is adjacent to the first region of SiC. A second SiC layer having the first conductivity type is provided on a second surface, opposite the first surface, of the voltage blocking SiC substrate. First, second and third contacts are provided on the first region of SiC, the second region of SiC and the second SiC layer, respectively. Related methods of fabricating high voltage SiC devices are also provided.