公开(公告)号：EP1391017A4

公开(公告)日：2006-04-12

申请号：EP02769658

申请日：2002-04-15

申请人： CYMER INC

发明人： WITTAK CHRISTIAN J ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  MELCHER PAUL C ,  JOHNS DAVID M ,  SAETHRE ROBERT B ,  NESS RICHARD M ,  RETTIG CURTIS L ,  SHANNON ROBERT A ,  UJAZDOWSKI RICHARD C ,  ROKNI SHAHRYAR ,  SMITH SCOTT ,  ANDERSON STUART L ,  ALGOTS JOHN M ,  SPANGLER RONALD L ,  FOMENKOV IGOR ,  STEIGER THOMAS D ,  EMILO JEROME A ,  TITUS CLAY C ,  IVASCHENKO ALEX P

IPC分类号： H01S3/097 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H01S3/23 ,  H01S3/104

CPC分类号： G03F7/70025 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter (4K) with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror, which is in a line narrowing module (15K) and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors (16K and 17K) drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the the discharge region during the approximately 0.25 milliseconds between pulses.

公开(公告)号：EP1502335A4

公开(公告)日：2006-04-12

申请号：EP03726621

申请日：2003-05-05

申请人： CYMER INC

发明人： RULE JOHN A ,  HOFMANN THOMAS ,  MORTON RICHARD G ,  BROWN DANIEL J W ,  FLEUROV VLADIMIR B ,  TRINTCHOUK FEDOR ,  ISHIHARA TOSHIHIKO ,  ERSHOV ALEXANDER I ,  WITTAK CHRISTIAN J ,  CARMICHAEL JAMES A

IPC分类号： H01L21/027 ,  H01S3/22 ,  G03F7/20 ,  H01S20060101 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08 ,  H01S3/134 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/225 ,  G03F7/70025 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/2258 ,  H01S3/2333

摘要： An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor (604) for monitoring the F2 consumption rates through the operating life of the laser system (4). These consumption rates are used by a processor (604) programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system (5).