摘要:
The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter (4K) with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror, which is in a line narrowing module (15K) and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors (16K and 17K) drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the the discharge region during the approximately 0.25 milliseconds between pulses.
摘要:
A grating based line narrowing device for line narrowing lasers producing high energy laser beams. A flexure grating mount is provided which virtually eliminates stress on the grating caused by differential thermal expansion between the grating and the housing structure. The grating which is comprised of a very thin aluminum surface on a thick ultra low expansion glass substrate is attached to an aluminum housing structure using a flexure grating mount. At least one flexure joint is provided in the grating mount which permits thermal expansion and contraction of the substrate. In some embodiments the mount comprises a metal plate and the flexure joint is a H-Flex joint (124) with four legs (126) which is machined into the metal plate. In another embodiment two H-Flex joints are provided. In other embodiments, the flexure joint is a dovetail joint permitting one end of the mount to slip relative to the other.