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公开(公告)号:EP2758987A1
公开(公告)日:2014-07-30
申请号:EP12843863.7
申请日:2012-10-19
发明人: ITO, Toshiki , MATSUFUJI, Naoko , KAWAHATA, Kanae
IPC分类号: H01L21/027 , B29C59/02
摘要: Provided is a method of manufacturing a film, including: applying, onto a substrate, a photocurable composition containing a polymerizable monomer, a photopolymerization initiator, and a photosensitive gas generator that generates a gas through light stimulation to form an applied film; bringing a mold into contact with the applied film; irradiating the applied film with light through the mold to cure the applied film and to generate the gas in the applied film; and releasing the mold from the applied film after the irradiation of the applied film with the light to form a film (cured film) having a predetermined pattern shape on the substrate, in which in the irradiation of the applied film with the light, a reaction rate of a polymerization reaction of the polymerizable monomer in the applied film is higher than a reaction rate of a gas-generating reaction of the photosensitive gas generator in the applied film.
摘要翻译: 提供一种膜的制造方法,其特征在于,在基板上涂布含有聚合性单体,光聚合引发剂和感光性气体发生剂的光固化性组合物,所述光固化性组合物通过光刺激产生气体,形成涂膜; 使模具与涂膜接触; 通过模具照射涂布的膜以固化涂膜并在涂膜中产生气体; 在涂敷膜照射光后,从涂布膜上脱模,在基板上形成具有预定图案形状的膜(固化膜),其中在用光照射所施加的膜时,产生反应 涂布膜中的聚合性单体的聚合反应速度高于涂膜中的感光性气体发生剂的气体发生反应的反应速度。
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公开(公告)号:EP2788389B1
公开(公告)日:2019-04-17
申请号:EP12859478.5
申请日:2012-11-26
发明人: MATSUFUJI, Naoko , ITO, Toshiki , KAWAHATA, Kanae
IPC分类号: C08F2/50 , H01L21/027 , C07C271/12 , C07C271/24 , B29L31/34 , B29C59/02 , H01L21/266 , H01L21/308
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公开(公告)号:EP2758987B1
公开(公告)日:2019-03-20
申请号:EP12843863.7
申请日:2012-10-19
发明人: ITO, Toshiki , MATSUFUJI, Naoko , KAWAHATA, Kanae
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公开(公告)号:EP2760894B1
公开(公告)日:2018-12-12
申请号:EP12847152.1
申请日:2012-10-24
IPC分类号: G03F7/00 , G03F7/027 , G03F7/031 , G03F7/038 , B82Y10/00 , B82Y40/00 , C08F2/24 , C08F2/48 , C08K5/06
CPC分类号: C08K5/06 , B05D3/067 , B05D3/12 , B82Y10/00 , B82Y40/00 , C08F2/24 , C08F2/48 , G03F7/0002 , G03F7/0046 , G03F7/0048 , G03F7/027 , G03F7/031 , G03F7/038 , H05K3/0014 , H05K3/0017 , Y10T428/24802
摘要: The present invention provides a photo-curable composition that requires a small demolding force. The present invention also provides a UV imprint method that requires a small demolding force. The photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C). A photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.
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