公开(公告)号：EP3857281A1

公开(公告)日：2021-08-04

申请号：EP19782496.4

申请日：2019-09-24

申请人： Carl Zeiss SMT GmbH

发明人： KUGLER, Jens ,  GEUPPERT, Bernhard ,  KHARITONOV, Alexander

IPC分类号： G02B7/02 ,  G02B7/182 ,  G03F7/20

公开(公告)号：EP1803012B1

公开(公告)日：2015-06-03

申请号：EP05802258.3

申请日：2005-10-01

申请人： Carl Zeiss SMT GmbH

发明人： RAU, Johannes ,  SCHÖPPACH, Armin ,  GELLRICH, Bernhard ,  KUGLER, Jens ,  MAHLMANN, Martin ,  GEUPPERT, Bernhard ,  PETASCH, Thomas ,  FÜRTER, Gerhard

IPC分类号： G02B7/00 ,  G03F7/20 ,  G02B17/08

CPC分类号： G03F7/7015 ,  G02B7/00 ,  G02B7/008 ,  G02B7/021 ,  G02B7/028 ,  G02B7/22 ,  G02B17/08 ,  G02B17/0804 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70883

摘要： An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.

公开(公告)号：EP2097789B1

公开(公告)日：2012-08-01

申请号：EP07846848.5

申请日：2007-11-27

申请人： Carl Zeiss SMT GmbH

发明人： XALTER, Stefan ,  MEYER, Peter ,  LIMBACH, Guido ,  SORG, Franz ,  SCHOEPPACH, Armin ,  WEBER, Ulrich ,  LOERING, Ulrich ,  HELLWEG, Dirk ,  KUGLER, Jens ,  GELLRICH, Bernhard ,  HEMBACHER, Stefan ,  GEUPPERT, Bernhard ,  GÖHNERMEIER, Aksel

IPC分类号： G03F7/20 ,  G02B7/14 ,  G02B27/00

CPC分类号： G02B7/004 ,  G02B27/0068 ,  G03F7/70191 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70825

摘要： The invention relates to a projection exposure apparatus for semiconductor lithography, comprising at least one manipulator (14) for reducing image aberrations, wherein the manipulator (14) contains at least one optical element (8) which can be manipulated by means of at least one actuator (13), and wherein the manipulator (14) is formed in changeable fashion together with an actuator (13).

公开(公告)号：EP2044487B1

公开(公告)日：2011-04-20

申请号：EP07786179.7

申请日：2007-07-19

申请人： Carl Zeiss SMT GmbH

发明人： SCHRIEVER, Martin ,  WEGMANN, Ulrich ,  HEMBACHER, Stefan ,  GEUPPERT, Bernhard ,  HUBER, Jürgen ,  KERWIEN, Norbert ,  TOTZECK, Michael ,  HAUF, Markus

IPC分类号： G03F7/20

CPC分类号： G03F7/70825 ,  G03F7/70041 ,  G03F7/70266

摘要： An optical apparatus has a light source which emits light in the form of light pulses at a pulse repetition frequency and at least one optical element which is connected to apparatuses for excitation of oscillation at an oscillation frequency. The oscillation of the optical element leads to cyclic modulation in time of at least one parameter, which is relevant for optical imaging of the optical element. The oscillation frequency can be adjusted by means of the apparatuses for excitation of an oscillation of the optical element such that it is synchronized to the pulse repetition frequency of the light source. A timer is provided for the pulse repetition frequency of the light pulses, with the timer being connected to at least one frequency multiplier, whose output is connected to the apparatuses for excitation of an oscillation. Furthermore, a method is described for correction or improvement of the imaging behaviour of an optical apparatus.