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237 条记录 (耗时 0.02 秒)

    An image forming method and apparatus
    1.
    发明公开
    An image forming method and apparatus 审中-公开
    Bilderzeugungsverfahren und -vorrichtung

    公开(公告)号：EP2290445A2

    公开(公告)日：2011-03-02

    申请号：EP10175836.5

    申请日：2003-02-13

    申请人： Micronic Mydata AB

    发明人： Sandström, Torbjörn

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70291 ,  G03F7/70041 ,  G03F7/70466

    摘要： The present invention relates to an apparatus for forming a pattern on a radiation sensitive material comprising a source to form a radiation beam, a scanning element to scan at least one beam from said radiation source over said radiation sensitive material, a modulator to modulate said at least one beam during scanning according to an input pattern data file, where said modulation of the beam creates a coherent sub-image on the workpiece and several sub-images are non-coherently superposed to create a final image. The invention also relates to a method of patterning a workpiece and a workpiece as such.

    摘要翻译： 本发明涉及一种用于在辐射敏感材料上形成图案的装置，其包括用于形成辐射束的源，扫描元件，用于扫描来自所述辐射源的至少一个光束穿过所述辐射敏感材料，调制器， 根据输入图案数据文件在扫描期间至少一个光束，其中所述光束的调制在工件上创建相干子图像，并且几个子图像被非相干叠加以产生最终图像。 本发明还涉及一种使工件和工件图案化的方法。

    MULTIPLEXING OF PULSED SOURCES
    3.
    发明公开
    MULTIPLEXING OF PULSED SOURCES 审中-公开
    脉冲源的多路复用

    公开(公告)号：EP2245511A1

    公开(公告)日：2010-11-03

    申请号：EP08751156.4

    申请日：2008-02-19

    申请人： NANO UV

    发明人： CHOI, Peter

    IPC分类号： G03F7/20 ,  H05G2/00 ,  G21K1/00

    CPC分类号： G03F7/70391 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/7005 ,  G03F7/70091 ,  G03F7/70208

    摘要： The invention concerns a device (10) for generating an output radiation through an output aperture (5), said device (10) comprising a plurality of radiation sources (11-14) and a temporal multiplexer (15) for temporally- multiplexing the radiation sources (11-14). Each radiation source comprises a plasma (211) in which an elementary radiation is generated and in which rays of this elementary radiation are selectively deviated as a function of their wavelength. Such sources have a small size and a small etendue. The device can comprise for example one hundred or more radiation sources. Each radiation source can be used to generate a dynamically modified radiation pattern (24, 25, 26), or as a reserve source that replaces a broken down source, or as a supportive source that generates a radiation only if the power of the output radiation is lower than a minimum threshold value. The invention also relates to a process implemented by said device, and to a photolithography apparatus comprising said device.

    摘要翻译： 本发明涉及一种用于通过输出孔径（5）产生输出辐射的装置（10），所述装置（10）包括多个辐射源（11-14）和时间复用器（15），用于时间复用辐射 来源（11-14）。 每个辐射源包括其中产生基本辐射的等离子体（211），并且其中该基本辐射的射线根据它们的波长选择性地偏离。 这些来源具有较小的尺寸和较小的集光率。 该装置可以包括例如一百个或更多个辐射源。 每个辐射源可以用于产生动态修改的辐射图（24,25,26），或者作为替代损坏源的备用源，或者作为仅当输出辐射的功率产生辐射的支持源 低于最小阈值。 本发明还涉及由所述设备实现的过程，并涉及包括所述设备的光刻设备。

    EXPOSURE EQUIPMENT AND EXPOSURE METHOD
    5.
    发明公开
    EXPOSURE EQUIPMENT AND EXPOSURE METHOD 有权
    BELICHTUNGSGERÄTEUND BELICHTUNGSVERFAHREN

    公开(公告)号：EP1811545A4

    公开(公告)日：2010-07-21

    申请号：EP05800365

    申请日：2005-11-07

    申请人： NIPPON KOGAKU KK

    发明人： KONDO HIROYUKI ,  MIYACHI TAKASHI

    IPC分类号： H01L21/027 ,  G03F7/20 ,  G21K5/02 ,  H05H1/24

    CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70725

    摘要： The present invention relates to an exposure equipment and an exposure method that generates pulsed light by producing plasma from a target material to carry out exposure with the pulsed light and aims at obtaining a high degree of uniformity in the quantity of exposure light even when the pulsed light generated by producing plasma from the target material is used for a light source of exposure. The exposure equipment is characterized by having a light emitting portion that generates the pulsed light by producing plasma from the target material supplied intermittently, a reticle stage on which a reticle is arranged and irradiated with the pulsed light, a photosensitive substrate stage on which a photosensitive substrate irradiated with the pulsed light is arranged, the pulsed light being patterned by the reticle, and a control portion that controls the photosensitive substrate stage so that, before exposure onto the photosensitive substrate is started, the exposure starting point or the exposure ending point and the light emission timing coincide with each other based on the drive timing of the photosensitive substrate stage and the light emission timing of the pulsed light.

    摘要翻译： 本发明涉及曝光设备和曝光方法，其通过从目标材料产生等离子体来产生脉冲光，以用脉冲光进行曝光，并且旨在获得暴露光量的高度均匀性，即使当脉冲 通过从目标材料产生等离子体产生的光用于曝光光源。 曝光设备的特征在于具有通过从间歇供给的目标材料产生等离子体而产生脉冲光的发光部分，其上布置有掩模版并用脉冲光照射的标线片台，感光基板台上，光敏元件 用脉冲光照射的基板被布置，脉冲光被掩模版图形化，控制部分控制感光基板台，使得在曝光到感光基板上之前，将曝光开始点或曝光终点和 基于感光基板台的驱动定时和脉冲光的发光定时，发光定时相互重合。

    METHOD AND UNIT FOR MICRO-STRUCTURING A MOVING SUBSTRATE
    6.
    发明公开
    METHOD AND UNIT FOR MICRO-STRUCTURING A MOVING SUBSTRATE 审中-公开
    方法和单元微结构的移动基板

    公开(公告)号：EP2030082A2

    公开(公告)日：2009-03-04

    申请号：EP07732837.5

    申请日：2007-05-15

    申请人： Oerlikon Balzers Coating (UK) Limited

    发明人： BOEHLEN, Karl

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70425 ,  B23K26/0084 ,  B23K26/066 ,  G03F7/70041 ,  Y10T428/24479

    摘要： A method for exposing a polymer or other substrate (S) to patterned illumination from a pulsed laser source (12) at a suitable energy density in order to cause ablation of the surface to form a dense, regular array of 2-D or 3-D microstructures, characterised by the steps of: locating a mask (13) containing a series of identical or different features on a fixed pitch relative to a target area (14) of the substrate (S); projecting a uniform laser beam (18) through the mask (13) in order to project an image made up of a multiplicity of the features of the mask (13) onto the target area (14), de-magnifying the image carried by the beam (18) between the mask (13) and the target area (14); locating a substrate (S) for ablation in the target area (14); moving the substrate (S), at least while in the target area, in a first direction (Dl) parallel to one axis of the projected array of microstructures and also in a second direction (D2) perpendicular to the first direction; and controlling (20) the firing of the pulsed laser (12) in relation to the exact position of the substrate (S) in the target area (14). The invention further comprises a unit for ablating the surface of a polymer or other substrate (S) to form a dense, regular array of 2D or 3D microstructures by patterned illumination comprising: a pulsable laser source (12); a mask (13) containing a series of identical or different features on a fixed pitch and disposed between the laser source (12) and a target area (14); an illumination system (15) for creating a uniform laser beam (16) that exposes a multiplicity of the features on the mask (13) and disposed between the laser source (12) and the mask (13); an optical projection system (17) to de-magnify the mask image onto the target area (12) and disposed between the mask (13) and the target area (12); a 2- axis stage system (19) for the substrate (s) adapted to move the substrate (S) in the target area (14) in a first direction parallel to one axis of the regular array of microstructures and also in a second direction perpendicular to the first direction; and a control system (20) that links the firing of the pulsed laser (12) to the exact position of the substrate (S) in the target area (14).

    IMAGE ENHANCEMENT TECHNIQUE
    9.
    发明公开
    IMAGE ENHANCEMENT TECHNIQUE 审中-公开
    图像改进技术

    公开(公告)号：EP1896901A1

    公开(公告)日：2008-03-12

    申请号：EP05738056.0

    申请日：2005-04-15

    申请人： MICRONIC LASER SYSTEMS AB

    发明人： LJUNGBLAD, Ulric

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70725 ,  G03F7/70041

    摘要： The present invention relates to a method to improve at least one feature edge steepness in an image to be exposed onto a moving workpiece, comprising the actions of: moving the image in essentially the same direction relative to the direction of movement of the workpiece, synchronizing said moving of the image with a pulse length of an exposure radiation source. The invention also relates to a pattern generator for creating patterns on a workpiece