公开(公告)号：EP3933882A1

公开(公告)日：2022-01-05

申请号：EP20183384.5

申请日：2020-07-01

申请人： Carl Zeiss SMT GmbH ,  Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO

发明人： ROOZEBOOM, Fred ,  EHM, Dirk Heinrich ,  BECKER, Moritz ,  SCHMIDT, Stefan Wolfgang ,  CREIJGHTON, Yves Lodewijk Maria ,  SMELTINK, Jeroen ,  EIJNDEN, Edwin van den

IPC分类号： H01J37/32 ,  C23C16/455 ,  H01L21/02 ,  G03F7/20

摘要： The invention relates to an atomic layer processing apparatus (1) for atomic layer processing of an optical surface (4) of an optical element (2) preferably configured to reflect EUV radiation, the apparatus (1) comprising: a processing chamber (3), and at least one processing head (5) configured for atomic layer processing of the optical surface (4) of the optical element (2) within the processing chamber (3). The at least one processing head (5) is configured to perform atomic layer processing of a curved optical surface (4) of the optical element (2). The invention also relates to a method for atomic layer processing of an optical surface (4) of an optical element (2), preferably configured to reflect EUV radiation.

公开(公告)号：EP3649510A1

公开(公告)日：2020-05-13

申请号：EP18737868.2

申请日：2018-07-03

申请人： Carl Zeiss SMT GmbH

发明人： ROOZEBOOM, Fred ,  EHM, Dirk Heinrich ,  ILLIBERI, Andrea ,  BECKER, Moritz ,  TE SLIGTE, Edwin ,  CREIJGHTON, Yves Lodewijk Maria

IPC分类号： G03F7/20