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    OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT THEREWITH
    1.
    发明公开
    OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT THEREWITH 有权

    公开(公告)号：EP3368948A1

    公开(公告)日：2018-09-05

    申请号：EP16788086.3

    申请日：2016-10-26

    申请人： Carl Zeiss SMT GmbH

    发明人： EHM, Dirk Heinrich ,  SCHMIDT, Stefan-Wolfgang

    IPC分类号： G03F7/20 ,  G03F1/62 ,  G02B5/09 ,  G02B26/08

    摘要： An optical assembly includes an optical element (13), configured in particular for the reflection of EUV radiation (4), and a protective element (30) for protecting a surface (31) of the optical element (13, 14) from contaminating substances (P). The protective element (30) has a membrane (33a-c) and a frame (34) on which the membrane (33a-c) is mounted. The membrane is formed by a plurality of membrane segments (33a, 33b, 33c) which respectively protect a partial region (T) of the surface (31) of the optical element (13) from the contaminating substances (P). The optical assembly can form part of an overall optical arrangement, for example an EUV lithography system.

    OPTICAL SYSTEM
    3.
    发明公开
    OPTICAL SYSTEM 审中-公开
    光学系统

    公开(公告)号：EP2580626A1

    公开(公告)日：2013-04-17

    申请号：EP11726128.9

    申请日：2011-06-14

    申请人： Carl Zeiss SMT GmbH

    发明人： EHM, Dirk Heinrich ,  WEISS, Markus ,  ZACZEK, Christoph ,  HACKL, Tobias ,  SEITZ, Wolfgang

    IPC分类号： G03F7/20

    CPC分类号： G21K5/04 ,  G03F7/70233 ,  G03F7/70916

    摘要： To prevent reflective optical elements (2) for EUV lithography from getting electrically charged as they are irradiated with EUV radiation (4), an optical system for EUV lithography is proposed, comprising a reflective optical element (2), including a substrate (21) with a highly reflective coating (22) emitting secondary electrons when irradiated with EUV radiation (4), and a source (3) of electrically charged particles, which is arranged in such a manner that electrically charged particles can be applied to the reflective optical element (2), wherein the source (3) is a flood gun applying electrons to the reflective optical element (2) as only means for charge carrier compensation.

    摘要翻译： 为了防止用于EUV光刻的反射光学元件（2）在被EUV辐射（4）照射时被带电，提出了一种用于EUV光刻的光学系统，其包括反射光学元件（2），其包括衬底（21） 具有当用EUV辐射（4）照射时发射二次电子的高反射涂层（22）和带电粒子的源（3），其以这样的方式排列，使得可以将带电粒子施加到反射光学元件 （2），其中所述源（3）是作为用于电荷载流子补偿的唯一装置将电子施加到所述反射光学元件（2）的泛光枪。