公开(公告)号：EP1984788B1

公开(公告)日：2011-09-21

申请号：EP07703501.2

申请日：2007-02-16

申请人： Carl Zeiss SMT GmbH

发明人： WOLF, Oliver ,  SIEKMANN, Heiko ,  KALCHBRENNER, Eva ,  RENNON, Siegfried ,  WANGLER, Johannes ,  BRESAN, Andre ,  GERHARD, Michael ,  HAVERKAMP, Nils ,  SCHOLZ, Axel ,  SCHARNWEBER, Ralf ,  LAYH, Michael ,  BURKART, Stefan

IPC分类号： G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70075 ,  Y10T83/0304 ,  Y10T83/04

摘要： An optical integrator for producing a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus comprises a first array of elongated convexly curved first microlenses (112X) that are arranged side by side in a first plane and have first vertex lines (V). The optical integrator further comprises a second array of elongated convexly curved second microlenses (114X; 214X) that are arranged side by side in a second plane and have second vertex lines (V1 to V4). At least one second vertex line or a portion thereof does not coincide, in a projection along an optical axis of the optical integrator, with any one of the first vertex lines (V) or portions thereof.

公开(公告)号：EP2577399A1

公开(公告)日：2013-04-10

申请号：EP11720415.6

申请日：2011-04-29

申请人： Carl Zeiss SMT GmbH

发明人： SÄNGER, Ingo ,  SCHARNWEBER, Ralf ,  DITTMANN, Olaf ,  GRUNER, Toralf ,  WEIß, Gundula ,  MAJOR, András G. ,  VOGT, Martin ,  DEGÜNTHER, Markus ,  WANGLER, Johannes ,  KORB, Thomas ,  WALDIS, Severin

IPC分类号： G03F7/20

CPC分类号： G03F7/70116 ,  G03F7/70566

摘要： An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.

公开(公告)号：EP1984787B1

公开(公告)日：2013-05-08

申请号：EP07703454.4

申请日：2007-02-14

申请人： Carl Zeiss SMT GmbH

发明人： WANGLER, Johannes ,  SIEKMANN, Heiko ,  WEIBLE, Kenneth ,  SCHARNWEBER, Ralf ,  MAUL, Manfred ,  DEGUENTHER, Markus ,  LAYH, Michael ,  SCHOLZ, Axel ,  SPENGLER, Uwe ,  VÖLKEL, Reinhard

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G02B3/0056 ,  G02B27/0911 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70158