公开(公告)号：EP2122393B1

公开(公告)日：2013-04-03

申请号：EP08707756.6

申请日：2008-02-18

申请人： Carl Zeiss SMT GmbH

发明人： WARM, Berndt ,  RENNON, Sigfried ,  DINGER, Udo ,  BAIER, Jürgen ,  BURKART, Stefan ,  KOUROUKLIS, Christos ,  CHUNG, Hin Yiu Anthony ,  WIESNER, Stefan ,  ENKISCH, Hartmut ,  DENGEL, Günther

IPC分类号： G02B5/09 ,  G03F7/20 ,  G02B7/18

CPC分类号： G02B5/08 ,  B29D11/00596 ,  G02B5/09 ,  G03F7/702 ,  G03F7/70825

公开(公告)号：EP1984788B1

公开(公告)日：2011-09-21

申请号：EP07703501.2

申请日：2007-02-16

申请人： Carl Zeiss SMT GmbH

发明人： WOLF, Oliver ,  SIEKMANN, Heiko ,  KALCHBRENNER, Eva ,  RENNON, Siegfried ,  WANGLER, Johannes ,  BRESAN, Andre ,  GERHARD, Michael ,  HAVERKAMP, Nils ,  SCHOLZ, Axel ,  SCHARNWEBER, Ralf ,  LAYH, Michael ,  BURKART, Stefan

IPC分类号： G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70075 ,  Y10T83/0304 ,  Y10T83/04

摘要： An optical integrator for producing a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus comprises a first array of elongated convexly curved first microlenses (112X) that are arranged side by side in a first plane and have first vertex lines (V). The optical integrator further comprises a second array of elongated convexly curved second microlenses (114X; 214X) that are arranged side by side in a second plane and have second vertex lines (V1 to V4). At least one second vertex line or a portion thereof does not coincide, in a projection along an optical axis of the optical integrator, with any one of the first vertex lines (V) or portions thereof.