摘要:
[Problem] To provide a method for producing a highly pure difluoroacetic acid chloride composition product that at least contains difluoroacetic acid fluoride, by using a simple means and a simple device. [Solution] A method for purifying difluoroacetic acid chloride, including the step of bringing a difluoroacetic acid chloride composition that contains at least difluoroacetic acid fluoride into contact with calcium chloride at a temperature enabling reaction thereof thereby converting the difluoroacetic acid fluoride into difluoroacetic acid chloride.
摘要:
Provided is a purification method for efficiently reducing an undesirable organic compound or compound in (E)-1-chloro-3,3,3-trifluoropropene and thereby obtaining (E)-1-chloro-3,3,3-trifluoropropene with high purity. The purification method of OF-1233E according to the present invention is characterized by bringing a composition containing OF-1233E and at least one organic compound selected from the group consisting of HCFC-142 isomers, HCFC-244fa, HFC-245fa, OF-1234E, OF-1234Z and OF-1233Z into contact with a solid adsorbent.
摘要:
The present invention provides a process for purifying a (E)-1-chloro-3,3,3-trifluoropropene composition (OF-1233E composition) in which at hydrogen fluoride and 2-chloro-1,1,1,3,3-pentafluoropropane are contained by bringing the (E)-1-chloro-3,3,3-trifluoropropene composition into contact with a weak base and a method for producing (E)-1-chloro-3,3,3-trifluoropropene composition by distilling the (E)-1-chloro-3,3,3-trifluoropropene composition obtained by such a purification process. This makes it possible to efficiently produce OF-1233E by removing the hydrogen fluoride from the OF-1233E composition, without generating any new component difficult to separate by distillation, and subjecting the resulting composition to distillation.
摘要:
[Problem] To provide a method for producing a highly pure difluoroacetic acid chloride composition product that at least contains difluoroacetic acid fluoride, by using a simple means and a simple device. [Solution] A method for purifying difluoroacetic acid chloride, including the step of bringing a difluoroacetic acid chloride composition that contains at least difluoroacetic acid fluoride into contact with calcium chloride at a temperature enabling reaction thereof thereby converting the difluoroacetic acid fluoride into difluoroacetic acid chloride.
摘要:
A method for producing 1,2-dichloro-3,3,3-trifluoropropene (1223xd) according to the present invention includes the step of reacting 1,1,2,3,3-pentachloropropene (1220xa) with a fluorinating agent and is characterized in that hydrogen fluoride is used as the fluorinating agent.
摘要:
A production method of difluoroacetyl chloride according to the present invention includes a chlorination step of bringing a raw material containing at least either a 1-alkoxy-1,1,2,2-tetrafluoroethane or difluoroacetyl chloride into contact with calcium chloride at a reaction enabling temperature. A production method of 2,2-difluoroethyl alcohol according to the present invention includes a catalytic reduction step of causing catalytic reduction of the difluoroacetyl chloride obtained by the above production method. By these methods, the difluoroacetyl fluoride can be efficiently converted to the difluoroacetyl chloride and to the 2,2-difluoroethyl alcohol.
摘要:
Provided is a purification method for efficiently reducing an undesirable organic compound or compound in (E)-1-chloro-3,3,3-trifluoropropene and thereby obtaining (E)-1-chloro-3,3,3-trifluoropropene with high purity. The purification method of OF-1233E according to the present invention is characterized by bringing a composition containing OF-1233E and at least one organic compound selected from the group consisting of HCFC-142 isomers, HCFC-244fa, HFC-245fa, OF-1234E, OF-1234Z and OF-1233Z into contact with a solid adsorbent.
摘要:
Disclosed is an etching gas provided containing CHF 2 COF. The etching gas may contain, as an additive, at least one kind of gas selected from O 2 , O 3 , CO, CO 2 , F 2 , NF 3 , Cl 2 , Br 2 , I 2 , XF n (In this formula, X represents Cl, I or Br. n represents an integer satisfying 1≤n≤7.), CH 4 , CH 3 F, CH 2 F 2 , CHF 3 , N 2 , He, Ar, Ne, Kr and the like, from CH 4 , C 2 H 2 ,C 2 H 4 ,C 2 H 6 , C 3 H 4 , C 3 H 6 , C 3 H 8 , HI, HBr, HCl, CO, NO, NH 3 , H 2 and the like, or from CH 4 , CH 3 F, CH 2 F 2 and CHF 3 . This etching gas is not only excellent in etching performances such as the selection ratio to a resist and the patterning profile but also easily available and does not substantially by-produce CF 4 that places a burden on the environment.
摘要翻译:公开了一种含有CHF 2 COF的蚀刻气体。 蚀刻气体可以含有选自O 2,O 3,CO,CO 2,F 2,NF 3,Cl 2,Br 2,I 2,XF n中的至少一种气体作为添加剂(在该式 ,X表示Cl,I或Br,n表示满足1‰¤‰¤7),CH 4,CH 3 F,CH 2 F 2,CHF 3,N 2,He,Ar,Ne,Kr和 从CH 4,C 2 H 2,C 2 H 4,C 2 H 6,C 3 H 4,C 3 H 6,C 3 H 8,HI,HBr,HCl,CO,NO,NH 3, H 2等或CH 4,CH 3 F,CH 2 F 2和CHF 3。 该蚀刻气体不仅具有优异的蚀刻性能,例如与抗蚀剂的选择比和图案形貌,而且易于获得,并且基本上不产生对环境造成负担的CF 4。
摘要:
Disclosed is a cleaning gas for deposits, which contains CHF 2 COF. The cleaning gas may contain O 2 , O 3 , CO, CO 2 , F 2 , NF 3 , Cl 2 , Br 2 , I 2 , XF n (In this formula, X represents Cl, I or Br. n represents an integer satisfying 1≤n≤7.), CH 4 , CH 3 F, CH 2 F 2 , CHF 3 , N 2 , He, Ar, Ne, Kr and the like, and can be applied to deposits that include W, Ti, Mo, Re, Ge, P, Si, V, Nb, Ta, Se, Te, Mo, Re, Os, Ir, Sb, Ge, Au, Ag, As, Cr, their compounds, and the like. This cleaning gas is not only excellent in cleaning performances but also easily available and does not substantially by-produce CF 4 that places a burden on the environment.