METHOD FOR PRODUCING (E)-1-CHLORO-3,3,3-TRIFLUOROPROPENE
    4.
    发明公开
    METHOD FOR PRODUCING (E)-1-CHLORO-3,3,3-TRIFLUOROPROPENE 有权
    VERFAHREN ZUR HERSTELLUNG VON(E)-1-CHLOR-3,3,3-TRIFLUORPROPEN

    公开(公告)号:EP2778151A1

    公开(公告)日:2014-09-17

    申请号:EP12848425.0

    申请日:2012-10-03

    摘要: The present invention provides a process for purifying a (E)-1-chloro-3,3,3-trifluoropropene composition (OF-1233E composition) in which at hydrogen fluoride and 2-chloro-1,1,1,3,3-pentafluoropropane are contained by bringing the (E)-1-chloro-3,3,3-trifluoropropene composition into contact with a weak base and a method for producing (E)-1-chloro-3,3,3-trifluoropropene composition by distilling the (E)-1-chloro-3,3,3-trifluoropropene composition obtained by such a purification process. This makes it possible to efficiently produce OF-1233E by removing the hydrogen fluoride from the OF-1233E composition, without generating any new component difficult to separate by distillation, and subjecting the resulting composition to distillation.

    摘要翻译: 本发明提供一种纯化(E)-1-氯-3,3,3-三氟丙烯组合物(OF-1233E组合物)的方法,其中在氟化氢和2-氯-1,1,1,3,3 (E)-1-氯-3,3,3-三氟丙烯组合物与弱碱接触以及(E)-1-氯-3,3,3-三氟丙烯组合物的制备方法包含 - 五氟丙烷 通过蒸馏通过这种纯化方法获得的(E)-1-氯-3,3,3-三氟丙烯组合物。 这使得可以通过从OF-1233E组合物除去氟化氢来有效地生产OF-1233E,而不会产生通过蒸馏难以分离的任何新组分,并将所得组合物蒸馏。

    METHOD FOR PURIFYING DIFLUOROACETIC ACID CHLORIDE
    5.
    发明公开
    METHOD FOR PURIFYING DIFLUOROACETIC ACID CHLORIDE 有权
    纯化二氟乙酸氯化物的方法

    公开(公告)号:EP2676948A1

    公开(公告)日:2013-12-25

    申请号:EP12763938.3

    申请日:2012-03-28

    IPC分类号: C07C51/64 C07C53/48

    摘要: [Problem] To provide a method for producing a highly pure difluoroacetic acid chloride composition product that at least contains difluoroacetic acid fluoride, by using a simple means and a simple device.
    [Solution] A method for purifying difluoroacetic acid chloride, including the step of bringing a difluoroacetic acid chloride composition that contains at least difluoroacetic acid fluoride into contact with calcium chloride at a temperature enabling reaction thereof thereby converting the difluoroacetic acid fluoride into difluoroacetic acid chloride.

    摘要翻译: 本发明提供一种使用简单的手段和简单的装置来制造至少含有二氟乙酰氟的高纯度二氟乙酰氯组合物的制造方法。 包括使含有至少二氟乙酰氟的二氟乙酰氯组合物与氯化钙在能够使其反应的温度下接触,由此将二氟乙酰氟转化成二氟乙酰氯的步骤。

    METHOD FOR PRODUCING DIFLUOROACETYL CHLORIDE
    7.
    发明公开
    METHOD FOR PRODUCING DIFLUOROACETYL CHLORIDE 有权
    VERFAHREN ZUR HERSTELLUNG VON DIFLUORACETYLCHLORID

    公开(公告)号:EP2554534A1

    公开(公告)日:2013-02-06

    申请号:EP11762579.8

    申请日:2011-03-16

    摘要: A production method of difluoroacetyl chloride according to the present invention includes a chlorination step of bringing a raw material containing at least either a 1-alkoxy-1,1,2,2-tetrafluoroethane or difluoroacetyl chloride into contact with calcium chloride at a reaction enabling temperature. A production method of 2,2-difluoroethyl alcohol according to the present invention includes a catalytic reduction step of causing catalytic reduction of the difluoroacetyl chloride obtained by the above production method. By these methods, the difluoroacetyl fluoride can be efficiently converted to the difluoroacetyl chloride and to the 2,2-difluoroethyl alcohol.

    摘要翻译: 根据本发明的二氟乙酰氯的制备方法包括使反应使含有至少含有1-烷氧基-1,1,2,2-四氟乙烷或二氟乙酰氯的原料与氯化钙接触的氯化步骤 温度。 根据本发明的2,2-二氟乙醇的制备方法包括通过上述制备方法获得的二氟乙酰氯的催化还原步骤。 通过这些方法,可以将二氟乙酰氟有效地转化为二氟乙酰氯和2,2-二氟乙醇。

    ETCHING GAS
    9.
    发明公开
    ETCHING GAS 审中-公开
    ÄTZGAS

    公开(公告)号:EP2508500A1

    公开(公告)日:2012-10-10

    申请号:EP10834491.2

    申请日:2010-11-19

    摘要: Disclosed is an etching gas provided containing CHF 2 COF. The etching gas may contain, as an additive, at least one kind of gas selected from O 2 , O 3 , CO, CO 2 , F 2 , NF 3 , Cl 2 , Br 2 , I 2 , XF n (In this formula, X represents Cl, I or Br. n represents an integer satisfying 1≤n≤7.), CH 4 , CH 3 F, CH 2 F 2 , CHF 3 , N 2 , He, Ar, Ne, Kr and the like, from CH 4 , C 2 H 2 ,C 2 H 4 ,C 2 H 6 , C 3 H 4 , C 3 H 6 , C 3 H 8 , HI, HBr, HCl, CO, NO, NH 3 , H 2 and the like, or from CH 4 , CH 3 F, CH 2 F 2 and CHF 3 . This etching gas is not only excellent in etching performances such as the selection ratio to a resist and the patterning profile but also easily available and does not substantially by-produce CF 4 that places a burden on the environment.

    摘要翻译: 公开了一种含有CHF 2 COF的蚀刻气体。 蚀刻气体可以含有选自O 2,O 3,CO,CO 2,F 2,NF 3,Cl 2,Br 2,I 2,XF n中的至少一种气体作为添加剂(在该式 ,X表示Cl,I或Br,n表示满足1‰¤‰¤7),CH 4,CH 3 F,CH 2 F 2,CHF 3,N 2,He,Ar,Ne,Kr和 从CH 4,C 2 H 2,C 2 H 4,C 2 H 6,C 3 H 4,C 3 H 6,C 3 H 8,HI,HBr,HCl,CO,NO,NH 3, H 2等或CH 4,CH 3 F,CH 2 F 2和CHF 3。 该蚀刻气体不仅具有优异的蚀刻性能,例如与抗蚀剂的选择比和图案形貌,而且易于获得,并且基本上不产生对环境造成负担的CF 4。

    CLEANING GAS
    10.
    发明公开
    CLEANING GAS 审中-公开
    REINIGUNGSGAS

    公开(公告)号:EP2505687A1

    公开(公告)日:2012-10-03

    申请号:EP10834490.4

    申请日:2010-11-19

    IPC分类号: C23C16/44 C23C14/00 H01L21/31

    摘要: Disclosed is a cleaning gas for deposits, which contains CHF 2 COF. The cleaning gas may contain O 2 , O 3 , CO, CO 2 , F 2 , NF 3 , Cl 2 , Br 2 , I 2 , XF n (In this formula, X represents Cl, I or Br. n represents an integer satisfying 1≤n≤7.), CH 4 , CH 3 F, CH 2 F 2 , CHF 3 , N 2 , He, Ar, Ne, Kr and the like, and can be applied to deposits that include W, Ti, Mo, Re, Ge, P, Si, V, Nb, Ta, Se, Te, Mo, Re, Os, Ir, Sb, Ge, Au, Ag, As, Cr, their compounds, and the like. This cleaning gas is not only excellent in cleaning performances but also easily available and does not substantially by-produce CF 4 that places a burden on the environment.

    摘要翻译: 公开了一种用于沉积物的清洁气体,其含有CHF 2 COF。 清洁气体可以含有O 2,O 3,CO,CO 2,F 2,NF 3,Cl 2,Br 2,I 2,XF n(在该式中,X表示Cl,I或Br,n表示整数 CH 4,CH 3 F,CH 2 F 2,CHF 3,N 2,He,Ar,Ne,Kr等,可用于包括W, Ti,Mo,Re,Ge,P,Si,V,Nb,Ta,Se,Te,Mo,Re,Os,Ir,Sb,Ge,Au,Ag,As,Cr,它们的化合物等。 这种清洁气体不仅具有优异的清洁性能,而且易于获得,并且基本上不产生对环境造成负担的CF 4。