DISPOSITIF ET PROCEDE DE PRODUCTION ET/OU DE CONFINEMENT D'UN PLASMA
    1.
    发明公开
    DISPOSITIF ET PROCEDE DE PRODUCTION ET/OU DE CONFINEMENT D'UN PLASMA 有权
    装置和方法,用于产生和/或等离子狭窄

    公开(公告)号:EP2353347A1

    公开(公告)日:2011-08-10

    申请号:EP09740707.6

    申请日:2009-10-28

    IPC分类号: H05H1/46 H01J37/32

    摘要: The invention relates to a device for producing and/or confining a plasma (10), said device comprising a chamber (13) in the space of which the plasma is produced and/or confined, said chamber (13) including a wall (1) defining a housing (15) inside the chamber (15) and encompassing said space, wherein said device is characterised in that it comprises at least one assembly (30) for producing and/or confining plasma, each assembly (30) being composed of magnets (3) having only an axial magnetisation direction and being recessed in the wall (1) defining the housing, so that the magnetisation direction of all the magnets (3) defining each assembly (30) is substantially perpendicular to the housing (15) defined by the wall (1) and so that the assembly (30) is substantially symmetrical to the housing, wherein the magnetic field lines (5) do not extend through the wall (1) of the chamber. The invention also relates to a method for producing and/or confining a plasma.