摘要:
The invention relates to a method for obtaining a heterogeneous substrate intended for use in the production of a semiconductor, comprising the following steps: (a) obtaining a first substrate (2) made from a type II-VI or type III-V material and a second substrate (1), each substrate being substantially planar and each substrate having a pre-determined surface area; (b) grinding a non-through recess (10) into the second substrate (1), the surface area of said recess being greater than the surface area of the first substrate, such that the first substrate can be housed in the recess; (c) depositing a bonding material (15) in the recess (10); (d) depositing the first substrate (2) in the recess (10) of the second substrate and securing the first substrate in the second substrate at a temperature below 300°C; and (e) levelling the first and second substrates in order to obtain a heterogeneous substrate having a substantially planar face (30).
摘要:
The invention relates to a method for producing at least one photosensitive infrared detector by assembling a first electronic component (100, 230) comprising a plurality of photodiodes (110) sensitive to infrared radiation and a second electronic component (400) comprising at least one electronic circuit for reading the plurality of photodiodes, the method being characterised in that it comprises: the production, on each of the first (100, 230) and second (400) components, of a connection surface (192, 492) formed at least partially by a layer (210, 405) containing silicon oxide (SiO2); and a step of adhering the first component (100, 230) and the second component (400) by means of the connection surfaces (192, 492) thereof, enabling the direct adhesion the two components (100, 230, 400). This method enables the simplification of the hybridisation of heterogeneous components for the production of an infrared detector. The invention also relates to an infrared detector and to an assembly for producing such a detector.