BANC D'ECRITURE LASER DIRECTE DE STRUCTURES MESA COMPORTANT DES FLANCS A PENTES NEGATIVES
    3.
    发明公开
    BANC D'ECRITURE LASER DIRECTE DE STRUCTURES MESA COMPORTANT DES FLANCS A PENTES NEGATIVES 审中-公开
    系统FÜRDIREKTES LASERBESCHRIFTEN VON MESASTRUKTUREN MIT NEGATIV GENEIGTENSEITENWÄNDEN

    公开(公告)号:EP2633366A1

    公开(公告)日:2013-09-04

    申请号:EP11770461.9

    申请日:2011-10-18

    IPC分类号: G03F7/20 H01L21/027

    摘要: The general field of the invention is that of photolithography systems intended for producing electronic components, using the lift-off technique, on a flat substrate (1) comprising one or more flat photosensitive layers. The system according to the invention is a laser direct-write system. It comprises optical or mechanical means arranged so that the useful part of the optical beam (F) is inclined in the plane of the photosensitive layers in order to create re-entrant profiles in said layers, the useful part of the optical beam being the part of the optical beam that actually contributes to create said profiles. In a preferred embodiment of the invention, the system comprises means (50) for partially blocking the optical beam, said means being located in the vicinity of the focusing optics (23).

    摘要翻译: 在使用在包括一个或多个平面感光层的平面基板上使用称为“剥离”的技术来生产电子部件的光刻系统领域中,系统使用激光直写技术。 它包括光学或机械装置,其被配置为使得光束的有用部分在感光层的平面上倾斜,以便在所述层内产生具有倒置斜率的轮廓,光束的有用部分是 有效地有助于创建所述轮廓的光束。 在一个优选实施例中,系统包括用于部分快门位于聚焦光学器件附近的光束的装置。