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公开(公告)号:EP3329509A1
公开(公告)日:2018-06-06
申请号:EP16754215.8
申请日:2016-08-01
发明人: KIM, Dong-Chul , HØIAAS, Ida Marie , MUNSHI, Mazid , FIMLAND, Bjørn Ove , WEMAN, Helge , REN, Dingding , DHEERAJ, Dasa
IPC分类号: H01L21/20
CPC分类号: H01L21/0262 , H01L21/02376 , H01L21/02458 , H01L21/02538 , H01L21/0254 , H01L21/02603 , H01L21/02631 , H01L21/02639
摘要: A process for growing nanowires or nanopyramids comprising: (I) providing a graphitic substrate and depositing AlGaN, InGaN, AlN or AlGa(In)N on said graphitic substrate at an elevated temperature to form a buffer layer or nanoscale nucleation islands of said compounds; (II) growing a plurality of semiconducting group III-V nanowires or nanopyramids, preferably III-nitride nanowires or nanopyramids, on the said buffer layer or nucleation islands on the graphitic substrate, preferably via MOVPE or MBE.