公开(公告)号：EP1540783A2

公开(公告)日：2005-06-15

申请号：EP03772177.6

申请日：2003-07-30

申请人： Cymer, Inc.

发明人： FALLON, John, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander I. ,  ISHIHARA, Toshihiko ,  MEISNER, John ,  NESS, Richard, M. ,  MELCHER, Paul, C.

IPC分类号： H01S3/22

CPC分类号： H01S3/2333 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2366

摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.