公开(公告)号：EP2351170A1

公开(公告)日：2011-08-03

申请号：EP09822307.6

申请日：2009-10-20

申请人： Cymer, Inc.

发明人： JACQUES, Robert, N.

IPC分类号： H01S3/13

CPC分类号： H01S3/104 ,  G03F7/70025 ,  H01S3/0057 ,  H01S3/034 ,  H01S3/13 ,  H01S3/2325

摘要： A laser control system contains an oscillator gas chamber and an amplifier gas chamber. A first voltage input is operatively connected to deliver electrical pulses to a first pair of electrodes within the oscillator gas chamber and a second pair of electrodes within the amplifier gas chamber. An output of the gas chambers is an energy dose calculated by a trapezoidal window. A control circuit connects to the first voltage input for modifying the first voltage input. A feedback control loop communicates an output of the gas chambers to the control circuit for modifying the first voltage input.

公开(公告)号：EP2137798A2

公开(公告)日：2009-12-30

申请号：EP08742695.3

申请日：2008-04-09

申请人： Cymer, Inc. (A Nevada Corporation)

发明人： PARTLO, William, N. ,  JACQUES, Robert, N. ,  O'BRIEN, Kevin, M. ,  ISHIHARA, Toshihiko

IPC分类号： H01S3/22

CPC分类号： H01S3/1055 ,  G02B27/646 ,  H01S3/137 ,  H01S3/139 ,  H01S3/225 ,  H01S2301/02

摘要： According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal.

公开(公告)号：EP1474844A1

公开(公告)日：2004-11-10

申请号：EP03708837.4

申请日：2003-01-15

申请人： Cymer, Inc.

发明人： JACQUES, Robert, N. ,  WARKENTIN, David, J.

IPC分类号： H01R3/00 ,  B23P19/00

CPC分类号： G03F7/709 ,  F16F15/005 ,  F16F15/02 ,  F16F15/0275 ,  F16F2230/08 ,  G03F7/70725 ,  G03F7/70833 ,  G05D19/02 ,  Y10T29/5313 ,  Y10T29/53174

摘要： A vibration reducing system includes a position control dive (65) and a vibration control drive (45). At least one position sensor (60) is used to provide feedback signals which are in turn unses to provide control signals fore both the position control drive (65) and the vibration control drive (45).

公开(公告)号：EP1730763A2

公开(公告)日：2006-12-13

申请号：EP05714037.8

申请日：2005-02-24

申请人： Cymer, Inc.

发明人： PARTLO, William, N. ,  BOWERING, Norbert, R. ,  ERSHOV, Alexander, I. ,  FOMENKOV, Igor, V. ,  OLIVER, I., Roger ,  VIATELLA, John ,  JACQUES, Robert, N.

IPC分类号： H01J35/20

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A laser produced plasma extreme ultraviolet light source control system (10) includes a target delivery system (80) for delivering plasma initiation targets (20), an EUV light collection optic (40), a target tracking and feedback system (150), at least one imaging device (60, 62) for providing an image of a target stream track (92); a stream track error detector (120, 122) for detecting an error in the position of the target stream track (92) in at least one axis perpendicular to the target stream track (92).

公开(公告)号：EP1540783A2

公开(公告)日：2005-06-15

申请号：EP03772177.6

申请日：2003-07-30

申请人： Cymer, Inc.

发明人： FALLON, John, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander I. ,  ISHIHARA, Toshihiko ,  MEISNER, John ,  NESS, Richard, M. ,  MELCHER, Paul, C.

IPC分类号： H01S3/22

CPC分类号： H01S3/2333 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2366

摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

公开(公告)号：EP1310022A2

公开(公告)日：2003-05-14

申请号：EP01954584.7

申请日：2001-04-30

申请人： Cymer, Inc.

发明人： SPANGLER, Ronald, L. ,  JACQUES, Robert, N. ,  EVERAGE, George, J. ,  ANDERSON, Stuart, L. ,  PALENSCHAT, Frederick, A. ,  FOMENKOV, Igor, V. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ALGOTS, John, M. ,  BROWN, Daniel, J., W.

IPC分类号： H01S3/22

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/1312 ,  H01S3/134 ,  H01S3/137 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

摘要： Fast wavelenght correction equipment for an electric discharge laser includes at least one piezoelectic drive (80) and a fast wavelength measurement system and a fast feedback response time. In a preferred embodiment equipment is provided to control wavelength on a slow, intermediate amd fast time scales, which vary in range from several milliseconds to a few microseconds respectively. Techniques include a combination of a relatively slow stepper motor (82) and a very fast piezoelectric drive (80) for tuning the laser wavelength using a tuning mirror (14).

公开(公告)号：EP1994549A2

公开(公告)日：2008-11-26

申请号：EP07716893.8

申请日：2007-01-22

申请人： Cymer, Inc.

发明人： DUNSTAN, Wayne, J. ,  JACQUES, Robert, N. ,  RAO, Rajasekhar, M. ,  TRINTCHOUK, Fedor, B.

IPC分类号： H01L21/00

CPC分类号： H01S3/13 ,  G03F7/70575 ,  H01S3/134 ,  H01S3/136

摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output light pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.

摘要翻译： 根据所公开主题的实施例的多个方面，公开了一种线窄化高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括带宽度量模块，其测量激光输出光脉冲 由光源产生并提供带宽测量的光束脉冲; 带宽误差信号发生器，接收带宽测量值和带宽设定值并提供带宽误差信号; 有源带宽控制器，响应带宽误差提供精细带宽校正致动器信号和粗带宽校正致动器信号。 细带宽校正致动器和粗带宽校正致动器各自可以引起光源行为的相应修改，这减少了带宽误差。 粗和细带宽校正致动器均可以包括多个带宽校正致动器。

公开(公告)号：EP1726028A2

公开(公告)日：2006-11-29

申请号：EP05724572.2

申请日：2005-03-03

申请人： Cymer, Inc.

发明人： AKINS, Robert, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  STEIGER, Thomas, D. ,  ALGOTS, Martin, J. ,  BOWERING, Norbert, R. ,  JACQUES, Robert, N. ,  PALENSCHAT, Frederick, A. ,  SONG, Jun

IPC分类号： H01J35/20

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap.

公开(公告)号：EP1726028B1

公开(公告)日：2014-05-21

申请号：EP05724572.2

申请日：2005-03-03

申请人： Cymer, Inc.

发明人： AKINS, Robert, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  STEIGER, Thomas, D. ,  ALGOTS, Martin, J. ,  BOWERING, Norbert, R. ,  JACQUES, Robert, N. ,  PALENSCHAT, Frederick, A. ,  SONG, Jun

IPC分类号： H05G2/00 ,  G03F7/20

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

公开(公告)号：EP1310022B1

公开(公告)日：2011-08-24

申请号：EP01954584.7

申请日：2001-04-30

申请人： Cymer, Inc.

发明人： SPANGLER, Ronald, L. ,  JACQUES, Robert, N. ,  EVERAGE, George, J. ,  ANDERSON, Stuart, L. ,  PALENSCHAT, Frederick, A. ,  FOMENKOV, Igor, V. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ALGOTS, John, M. ,  BROWN, Daniel, J., W.

IPC分类号： H01S3/22

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/1312 ,  H01S3/134 ,  H01S3/137 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

摘要： Fast wavelenght correction equipment for an electric discharge laser includes at least one piezoelectic drive (80) and a fast wavelength measurement system and a fast feedback response time. In a preferred embodiment equipment is provided to control wavelength on a slow, intermediate amd fast time scales, which vary in range from several milliseconds to a few microseconds respectively. Techniques include a combination of a relatively slow stepper motor (82) and a very fast piezoelectric drive (80) for tuning the laser wavelength using a tuning mirror (14).