公开(公告)号：EP1867218A2

公开(公告)日：2007-12-19

申请号：EP06720851.2

申请日：2006-02-17

申请人： Cymer, Inc. (A Nevada Corporation)

发明人： ALGOTS, John Martin ,  FOMENKOV, Igor V. ,  ERSHOV, Alexander I. ,  PARTLO, William N. ,  SANDSTROM, Richard L. ,  HEMBERG, Oscar ,  BYKANOV, Alexander N. ,  COBB, Dennis W.

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.