METHOD AND APPARATUS FOR EUV PLASMA SOURCE TARGET DELIVERY
    2.
    发明公开
    METHOD AND APPARATUS FOR EUV PLASMA SOURCE TARGET DELIVERY 有权
    方法和装置EUV等离子体源目标传递

    公开(公告)号:EP1867218A2

    公开(公告)日:2007-12-19

    申请号:EP06720851.2

    申请日:2006-02-17

    IPC分类号: H05G2/00

    CPC分类号: H05G2/003 H05G2/005 H05G2/006

    摘要: An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.