公开(公告)号：EP2084500A2

公开(公告)日：2009-08-05

申请号：EP07838971.5

申请日：2007-09-27

申请人： Cymer, Inc. (A Nevada Corporation)

发明人： BYKANOV, Alexander N. ,  FOMENKOV, Igor V. ,  KHODYKIN, Oleh V. ,  ERSHOV, Alexander I.

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H01S3/0064 ,  H01S3/073 ,  H01S3/0805 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/105 ,  H01S3/1066 ,  H01S3/115 ,  H01S3/121 ,  H01S3/127 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2383 ,  H05G2/008

摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.

公开(公告)号：EP2084500B1

公开(公告)日：2014-02-26

申请号：EP07838971.5

申请日：2007-09-27

申请人： Cymer, Inc. (A Nevada Corporation)

发明人： BYKANOV, Alexander N. ,  FOMENKOV, Igor V. ,  KHODYKIN, Oleh V. ,  ERSHOV, Alexander I.

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H01S3/0064 ,  H01S3/073 ,  H01S3/0805 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/105 ,  H01S3/1066 ,  H01S3/115 ,  H01S3/121 ,  H01S3/127 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2383 ,  H05G2/008