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    POWER SUPPLY CIRCUIT FOR PLASMA GENERATION, PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA-PROCESSED OBJECT
    1.
    发明公开
    POWER SUPPLY CIRCUIT FOR PLASMA GENERATION, PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA-PROCESSED OBJECT 审中-公开
    电源电路用于产生等离子体，等离子体产生装置，等离子体处理装置及电浆加工对象

    公开(公告)号：EP1748687A4

    公开(公告)日：2009-07-08

    申请号：EP05710329

    申请日：2005-02-17

    申请人： DAIKEN CHEMICAL CO LTD ,  TAKIKAWA HIROFUMI

    发明人： TAKIKAWA HIROFUMI ,  NISHIMURA YOSHIMI ,  HARADA AKIO

    IPC分类号： H05H1/36 ,  H05H1/46 ,  H01L21/304 ,  H05H1/30

    CPC分类号： H05H1/36 ,  H05H1/48

    摘要： A power supply circuit for plasma generation by which a large quantity of generated plasma can be smoothly obtained without increasing the sizes of an apparatus, a plasma generating apparatus, a plasma processing apparatus which can process a large quantity of objects to be processed at a low cost by using the plasma generating apparatus, and plasma-processed objects having target qualities. An electric discharge generating electrode is composed of two or more first electrodes and one or more second electrodes. An LC series circuit is provided by connecting a capacitor C and a coil L in series between one of outputs of an alternating high voltage generating circuit which generates an alternating high voltage to be applied between the electrodes of the electric discharge generating electrode, and the first electrode. When electricity is discharged in one of the electrode pair, voltage drop is suppressed by the coil even when the electric discharge of the capacitor progresses, and since electric discharge from the other electrode pair is induced without being disturbed, a large quantity of plasma can be smoothly generated by sharing the alternating high voltage generating circuit.

    PLASMA GENERATOR
    2.
    发明公开
    PLASMA GENERATOR 有权
    PLASMAGENERATOR

    公开(公告)号：EP1727406A4

    公开(公告)日：2007-04-18

    申请号：EP05710327

    申请日：2005-02-17

    申请人： FERROTEC CORP ,  TAKIKAWA HIROFUMI

    发明人： TAKIKAWA HIROFUMI ,  SHIINA YUICHI

    IPC分类号： H01J37/32 ,  C23C14/24 ,  C23C14/32 ,  H05H1/50

    CPC分类号： C23C14/325 ,  H01J37/32055 ,  H01J37/32614 ,  H05H1/50

    摘要： A plasma generator capable of performing intermittent operation of repeating a sequence operation including start, sustaining, and stop of a cathode arc plasma for a long time. The plasma generator for forming a thin film comprises a cathode (4) for supplying constituent particles of an arc plasma and a trigger-cum-anode (6) for starting and sustaining the arc plasma. The cathode surface (4a) of the cathode (4) is flat or finely irregular, and the anode surface (6c) of the trigger-cum-anode (6) brought into contact with the cathode surface (4a) is flat. The anode surface (6c) is so arranged as to be brought into contact with the whole cathode surface (4a) when a plasma is started. The contact point between a fine projection end (4b) of the cathode surface (4a) and the anode surface (6c) is made a plasma emission point. When the projection is consumed by plasma emission, another projection end which can be brought into contact with the anode surface (6c) is used as another plasma emission point, thus enabling intermittent operation of persistently repeating the sequence operation. Consequently, a stable plasma can be produced for a long time.