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    SYSTEM AND METHOD FOR PLASMA GENERATION
    4.
    发明公开
    SYSTEM AND METHOD FOR PLASMA GENERATION 有权
    系统和方法用于产生等离子体

    公开(公告)号：EP2926361A1

    公开(公告)日：2015-10-07

    申请号：EP12883678.0

    申请日：2012-08-27

    申请人： JH Quantum Technology Inc.

    发明人： HUNT, Jack

    IPC分类号： H01J7/24

    CPC分类号： H05H1/46 ,  F41B6/00 ,  F41H5/007 ,  F42B6/006 ,  H05H1/50 ,  H05H2001/4682

    摘要： A system and method for generating a plasma. An embodiment of the system for generating a plasma may include a first electrode; a second electrode disposed adjacent the first electrode; a first power supply for supplying power at the second electrode; a second power supply for generating a magnetic field; and a sequencer for coordinating a discharge of power from the first power supply and a discharge of power from the second power supply. The first power supply may be configured such that the discharge of power from the first power supply generates a plasma between the first electrode and the second electrode. The second power supply may be configured such that the magnetic field generated by the discharge of power from the second power supply rotates the plasma.

    PLASMA GENERATOR
    7.
    发明授权
    PLASMA GENERATOR 有权
    等离子发生器

    公开(公告)号：EP1727406B1

    公开(公告)日：2011-03-30

    申请号：EP05710327.7

    申请日：2005-02-17

    申请人： FERROTEC CORPORATION ,  Takikawa, Hirofumi

    发明人： TAKIKAWA, Hirofumi ,  SHIINA, Yuichi, Ferrotec Corporation

    IPC分类号： H01J37/32 ,  H05H1/50

    CPC分类号： C23C14/325 ,  H01J37/32055 ,  H01J37/32614 ,  H05H1/50

    摘要： A plasma generator capable of performing intermittent operation of repeating a sequence operation including start, sustaining, and stop of a cathode arc plasma for a long time. The plasma generator for forming a thin film comprises a cathode (4) for supplying constituent particles of an arc plasma and a trigger-cum-anode (6) for starting and sustaining the arc plasma. The cathode surface (4a) of the cathode (4) is flat or finely irregular, and the anode surface (6c) of the trigger-cum-anode (6) brought into contact with the cathode surface (4a) is flat. The anode surface (6c) is so arranged as to be brought into contact with the whole cathode surface (4a) when a plasma is started. The contact point between a fine projection end (4b) of the cathode surface (4a) and the anode surface (6c) is made a plasma emission point. When the projection is consumed by plasma emission, another projection end which can be brought into contact with the anode surface (6c) is used as another plasma emission point, thus enabling intermittent operation of persistently repeating the sequence operation. Consequently, a stable plasma can be produced for a long time.

    VERFAHREN ZUM BETREIBEN EINES PLASMABRENNERS UND PLASMABRENNER
    8.
    发明公开
    VERFAHREN ZUM BETREIBEN EINES PLASMABRENNERS UND PLASMABRENNER 审中-公开

    公开(公告)号：EP2206418A1

    公开(公告)日：2010-07-14

    申请号：EP08799950.4

    申请日：2008-10-08

    申请人： Qasar Technologieentwicklung Ges.m.b.H.

    发明人： BARTUSCH, Tobias

    IPC分类号： H05H1/50 ,  H05H1/40

    CPC分类号： H05H1/50 ,  H05H1/34 ,  H05H1/40 ,  H05H1/44

    摘要： The invention relates to a method and to a device for operating a plasma burner (1) for machining workpieces (2), wherein a gas (G) is fed to the workpiece (2) in a bundled manner by a jet source (3), and the gas jet (GS) is ionized by means of an arc (L), thereby forming a plasma jet (P), wherein the arc (L) is ignited between at least two electrodes (4) disposed next to the gas jet (GS) and is operated such that the arc (L) traverses the gas jet (GS), thereby thermally exciting it. In order to reduce the thermal load of the jet source (3) of the plasma burner (1), and in order to enable the machining of electrically non-conductive workpieces (2), it is provided to focus the plasma jet (P).

    摘要翻译： 本发明涉及一种用于操作用于加工工件（2）的等离子体燃烧器（1）的方法和设备，其中气体（G）通过喷射源（3）以捆扎的方式供给到工件（2） ，并且通过电弧（L）将气体射流（GS）离子化，由此形成等离子体射流（P），其中电弧（L）在至少两个设置在气体射流旁边的电极 （GS）并且操作使得电弧（L）横穿气体射流（GS），从而热激励它。 为了减小等离子体燃烧器（1）的喷射源（3）的热负荷，并且为了能够加工非导电工件（2），提供将等离子体射流（P） 。

    PLASMABRENNER MIT MIKROWELLENANREGUNG
    10.
    发明授权
    PLASMABRENNER MIT MIKROWELLENANREGUNG 有权
    微波STIMULUS等离子体炬

    公开(公告)号：EP1421832B1

    公开(公告)日：2006-10-04

    申请号：EP02762243.0

    申请日：2002-08-20

    申请人： Wu, Jeng-Ming

    发明人： Wu, Jeng-Ming

    IPC分类号： H05H1/30

    CPC分类号： H05H1/30 ,  H05H1/50

    摘要： The invention relates to a plasma burner with microwave stimulation, by means of which a stable plasma (5) can be generated even with significant pressure variations for the process gas. Said plasma burner comprises, in addition to a diameter enlargement (4) of the cavity (3) in the region of the plasma (5) as already disclosed in DE 19 511 915 A1, electrically-conducting windings (12), coaxially encompassing the plasma (5) within the cavity formed by the diameter enlargement. Said windings (12) permit the electrical waveguide system, formed by the diametrically-enlarged cavity (4) and windings (12) as coaxial outer guide and the plasma as coaxial inner guide, to be suitable for the transmission of microwaves in said region of the plasma burner with regard to the parameters of impedance and transmission bandwidth in a particular manner, even with significant pressure variations in the process gas and corresponding variable conductance conditions. Said plasma burner is characterised in operation by a stable plasma (5) and very good ignition and re-ignition properties.