摘要:
The present invention provides a film having excellent heat resistance and a small difference between the permittivity at low temperatures and the permittivity at high temperatures. The present invention provides a film having a relative permittivity of 8 or more at a frequency of 1 kHz at 30°C, wherein the rate of change is - 8 to +8% as calculated from a relative permittivity A at a frequency of 1 kHz at 30°C and a relative permittivity B at a frequency of 1 kHz at 150°C according to the following formula: Rate of change % = B − A / A × 100.
摘要:
There is provided a radio wave absorbing material comprising a fluoropolymer. The fluoropolymer preferably contains a vinylidene fluoride unit, and more preferably contains a vinylidene fluoride and a tetrafluoroethylene unit.
摘要:
An object of the present invention is to provide a hydrophobic dielectric film for electrowetting, which can drive a conductive liquid by using a low voltage. The present invention provides a hydrophobic dielectric film for electrowetting containing a vinylidene fluoride based polymer.
摘要:
Provided are a fluororesin film with few defects in lamination and highly adhesive to copper foil, and a copper-clad laminate using the same. A fluororesin film that is a film including a fluorine-containing composition, wherein the oxygen element percentage as measured when heat treatment is performed at 180°C for 3 minutes and then the state of one or both surfaces of the film is observed by scanning X-ray photoelectron spectroscopy (XPS/ESCA) is 1.35 atom% or more, and an absolute value of the rate of dimensional change in MD and TD before and after heat treatment as measured when the film is heat-treated at 180°C for 10 minutes and then cooled to room temperature is 2% or less.
摘要:
The invention provides a film having a low dielectric dissipation factor and an excellent dielectric breakdown strength at high temperatures. The film has a dielectric dissipation factor at a frequency of 1 kHz and 160°C of 0.02% or lower and a dielectric breakdown strength at 160°C of 400 V/µm or higher.
摘要:
The invention provides a film having a high relative permittivity, a high volume resistivity, and a high breakdown strength. The film has a relative permittivity of 9 or higher at a frequency of 1 kHz and 30°C, a volume resistivity of 5E + 15 Ω·cm or higher at 30°C, and a breakdown strength of 500 V/µm or higher.
摘要:
The present invention provides a high dielectric film comprising: a film-forming resin (A); and inorganic particles (B), wherein the film-forming resin (A) contains a vinylidene fluoride resin (a1), an amount of the inorganic particles (B) is not less than 0.01 parts by mass and less than 10 parts by mass for each 100 parts by mass of the film-forming resin (A), and the inorganic oxide particles (B) is at least one selected from the group consisting of: (B1) inorganic oxide particles of a metallic element of Group 2, 3, 4, 12, or 13 of the Periodic Table, or inorganic oxide composite particles of these; (B2) inorganic composite oxide particles represented by formula (1) :
M 1 a1 N b1 O c1
wherein M 1 represents a metallic element of Group 2, N represents a metallic element of Group 4, a1 represents 0.9 to 1.1, b1 represents 0.9 to 1.1, c1 represents 2.8 to 3.2, and the numbers of M 1 and N each may be more than 1; and (B3) inorganic oxide composite particles of an oxide of a metallic element of Group 2, 3, 4, 12, or 13 of the Periodic Table and silicon oxide. The film has improved volume resistivity while maintaining a high dielectric constant owing to a VdF resin.
摘要翻译:本发明提供一种高介电膜,包括:成膜树脂(A); 和无机粒子(B),其中成膜树脂(A)含有偏二氟乙烯树脂(a1),无机颗粒(B)的量不小于0.01质量份且小于10质量份,对于 每100质量份成膜树脂(A)和无机氧化物颗粒(B)是选自以下的至少一种:(B1)第2,3组金属元素的无机氧化物颗粒, 4,12或13,或这些的无机氧化物复合颗粒; (B2)由式(1)表示的无机复合氧化物颗粒:€ƒ€ƒ€ƒ€ƒ€ƒM1 a1 N b1 O c1其中M 1表示第2组的金属元素,N表示 第4族的金属元素,a1表示0.9〜1.1,b1表示0.9〜1.1,c1表示2.8〜3.2,M 1和N的数可以分别大于1, 和(B3)元素周期表第2,3,4,12或13族金属元素的氧化物的无机氧化物复合颗粒和氧化硅。 由于VdF树脂,该膜具有改善的体积电阻率,同时保持高的介电常数。
摘要:
The present invention provides a high dielectric film for a film capacitor obtained by molding a film forming composition for a film capacitor comprising a thermoplastic resin (A) and surface-treated high dielectric inorganic particles (B) obtained by treating the surfaces of high dielectric inorganic particles (b1) having a dielectric constant (20°C, 1 kHz) of 100 or more with a low dielectric compound (b2) having a dielectric constant (20°C, 1 kHz) of 10 or less. This high dielectric film for a film capacitor can restrain the decrease of electrical insulating property, in spite of the high dielectric inorganic particles being dispersed at a high filling rate.
摘要:
The present invention provides a nonporous highly dielectric film which can improve withstanding voltage, insulating property and dielectric constant, especially can decrease a dielectric loss at high temperatures and can be made thin, and a coating composition for forming the highly dielectric film comprising (A) a vinylidene fluoride resin, (B) a cellulose resin and (C) a solvent.