公开(公告)号：EP4451061A1

公开(公告)日：2024-10-23

申请号：EP21968294.5

申请日：2021-12-22

申请人： Dongjin Semichem Co., Ltd.

发明人： KIM, Jaehyun ,  HUR, Myoung Hyun ,  KIM, Jeong Sik ,  YOO, Min Ja ,  LEE, Hyung Kun ,  JI, Chanhyuk ,  JANG, Gyeonghun ,  HA, Jeongmin

IPC分类号： G03F7/004 ,  C07C323/20 ,  C07C323/21

摘要： The present disclosure relates to: a photoacid generator comprising an anion having a novel structure having a specific polar functional group such as a sulfonate group, a photoresist composition comprising the same, and a method for forming a photoresist pattern.

公开(公告)号：EP4450486A1

公开(公告)日：2024-10-23

申请号：EP21968295.2

申请日：2021-12-22

申请人： Dongjin Semichem Co., Ltd.

发明人： KIM, Jaehyun ,  HUR, Myoung Hyun ,  KIM, Jeong Sik ,  YOO, Min Ja ,  LEE, Hyung Kun

IPC分类号： C07C311/06 ,  C07C311/14 ,  C07C311/17 ,  C07C321/28 ,  C07C323/22 ,  C07C323/66 ,  C07C25/18 ,  C07D319/20 ,  G03F7/004

摘要： The present disclosure relates to: a salt compound comprising an anion having a specific structure represented by Chemical Formula 1, and a cation represented by Chemical Formula 2; a quencher including the salt compound; and a photoresist composition including the salt compound.