公开(公告)号：EP4451061A1

公开(公告)日：2024-10-23

申请号：EP21968294.5

申请日：2021-12-22

申请人： Dongjin Semichem Co., Ltd.

发明人： KIM, Jaehyun ,  HUR, Myoung Hyun ,  KIM, Jeong Sik ,  YOO, Min Ja ,  LEE, Hyung Kun ,  JI, Chanhyuk ,  JANG, Gyeonghun ,  HA, Jeongmin

IPC分类号： G03F7/004 ,  C07C323/20 ,  C07C323/21

摘要： The present disclosure relates to: a photoacid generator comprising an anion having a novel structure having a specific polar functional group such as a sulfonate group, a photoresist composition comprising the same, and a method for forming a photoresist pattern.