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1.发明公开Quantitative measurement of gas phase process intermediates using Raman spectroscopy 审中-公开量子信号气相色谱法测定拉曼光谱
公开(公告)号：EP2514716A2
公开(公告)日：2012-10-24
申请号：EP12176590.3
申请日：2010-05-11
发明人： Harms, Greg , Kreszowski, Douglas , Licht, David , Lipp, Elmer , Molnar, Mike , Pinet, Marc
IPC分类号： C01B33/027 , G01N21/27 , G01N21/65
CPC分类号： G01N21/65 , C01B33/027 , G01N21/274 , Y10T436/12
摘要： A method for quantitatively monitoring gas phase materials in a chemical process is provided and includes, providing a gaseous feed stream containing one or more reactant gases of interest; exposing the gaseous feed stream to coherent radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in the feed stream; analyzing the spectroscopic signal to determine the presence and concentration of each of the gaseous components; and displaying the results of the analysis. In one embodiment, the method is useful for quantitatively monitoring gas phase materials in a process for making high purity silicon.
摘要翻译： 提供了一种在化学过程中定量监测气相材料的方法，包括提供含有一种或多种感兴趣的反应物气体的气态进料流; 将气态进料流暴露于来自拉曼光谱装置的相干辐射; 从进料流中的每个气体组分获取拉曼光谱信号; 分析光谱信号以确定每种气态组分的存在和浓度; 并显示分析结果。 在一个实施方案中，该方法可用于在制备高纯度硅的方法中定量监测气相材料。
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2.发明公开Quantitative measurement of gase phase process intermediates using raman spectroscopy 审中-公开量子信号气相色谱法测定拉曼光谱
公开(公告)号：EP2799396A1
公开(公告)日：2014-11-05
申请号：EP14170474.2
申请日：2010-05-11
发明人： Harms, Greg , Kreszowski, Douglas , Licht, David , Lipp, Elmer , Molnar, Mike , Pinet, Marc
IPC分类号： C01B33/027 , G01N21/27 , G01N21/65
CPC分类号： G01N21/65 , C01B33/027 , G01N21/274 , Y10T436/12
摘要： A method for quantitatively monitoring gas phase materials in a chemical process is provided and includes, providing a gaseous feed stream containing one or more reactant gases of interest; exposing the gaseous feed stream to coherent radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in the feed stream; analysing the spectroscopic signal to determine the presence and concentration of each of the gaseous components; and displaying the results of the analysis. In one embodiment, the method is useful for quantitatively monitoring gas phase materials in a process for making high purity silicon.
摘要翻译： 提供了一种在化学过程中定量监测气相材料的方法，包括提供含有一种或多种感兴趣的反应物气体的气态进料流; 将气态进料流暴露于来自拉曼光谱装置的相干辐射; 从进料流中的每个气体组分获取拉曼光谱信号; 分析光谱信号以确定每种气态组分的存在和浓度; 并显示分析结果。 在一个实施方案中，该方法可用于在制备高纯度硅的方法中定量监测气相材料。
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3.发明公开Quantitative measurement of gas phase process intermediates using Raman spectroscopy 审中-公开通过拉曼光谱法的装置的气相法工艺的中间产物定量测量
公开(公告)号：EP2514716A3
公开(公告)日：2013-02-13
申请号：EP12176590.3
申请日：2010-05-11
发明人： Harms, Greg , Kreszowski, Douglas , Licht, David , Lipp, Elmer , Molnar, Mike , Pinet, Marc
IPC分类号： C01B33/027 , G01N21/27 , G01N21/65
CPC分类号： G01N21/65 , C01B33/027 , G01N21/274 , Y10T436/12
摘要： A method for quantitatively monitoring gas phase materials in a chemical process is provided and includes, providing a gaseous feed stream containing one or more reactant gases of interest; exposing the gaseous feed stream to coherent radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in the feed stream; analyzing the spectroscopic signal to determine the presence and concentration of each of the gaseous components; and displaying the results of the analysis. In one embodiment, the method is useful for quantitatively monitoring gas phase materials in a process for making high purity silicon.
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