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    Compositions and antireflective coatings for photolithography
    2.
    发明公开
    Compositions and antireflective coatings for photolithography 审中-公开
    Zusammensetzungen und AntireflektionsbeschichtungenfürFotolithografie

    公开(公告)号：EP2573619A1

    公开(公告)日：2013-03-27

    申请号：EP12184809.7

    申请日：2012-09-18

    申请人： Dow Global Technologies LLC ,  Rohm and Haas Electronic Materials LLC

    发明人： Rao, Yuanqiao ,  Auger, Robert L. ,  Kiarie, Cecilia W. ,  Srivastava, Yasmin N. ,  Sullivan, Christopher P.

    IPC分类号： G03F7/075 ,  G03F7/09 ,  C08G77/08

    CPC分类号： G03F7/091 ,  C08G77/08 ,  C08G77/14 ,  C08G77/20 ,  C08G77/80 ,  C08L83/04 ,  G03F7/0751 ,  C08L83/00

    摘要： The invention provides a composition comprising at least the following A and B:
    A) polymer that comprises the following structural unit 1:

    wherein
    L is CX-CYZ, where X, Y, and Z are each independently selected from hydrogen, an alkyl, or a substituted alkyl; and,
    M is an alkylene, an arylene, a substituted alkylene, a substituted arylene, or C(O)O-W-, where W is an alkylene or a substituted alkylene; and
    R', R", and R"' are each independently selected from an aromatic hydrocarbon, an aliphatic hydrocarbon, or a substituted hydrocarbon that comprises one or more of O, N, S, or Si atoms, provided that at least one of R', R", and R'" is selected from alkoxyl, aryloxyl, hydroxyl, halide, carboxyl, or carbonate; and,
    p is an integer from 1 to 10,000; and

    with the proviso that the polymer does not comprise a polyhedral oligomeric silsesquioxane (POSS) structure; and
    B) a polymer formed from a first composition comprising at least one of Compound F1, Compound F2, Compound F3 and/or Compound F4, each as described herein.

    摘要翻译： 本发明提供包含至少以下A和B：A）聚合物的组合物，其包含以下结构单元1：其中L是CX-CYZ，其中X，Y和Z各自独立地选自氢，烷基或 取代的烷基; 和M是亚烷基，亚芳基，取代的亚烷基，取代的亚芳基或C（O）O-W-，其中W是亚烷基或取代的亚烷基; 和R“，R”和R“'各自独立地选自芳族烃，脂族烃或包含O，N，S或Si原子中的一个或多个的取代的烃，条件是至少一个 R“，R”和R“”选自烷氧基，芳氧基，羟基，卤素，羧基或碳酸酯; p为1〜10000的整数; 并且条件是聚合物不包含多面体低聚倍半硅氧烷（POSS）结构; 和B）由包含化合物F1，化合物F2，化合物F3和/或化合物F4中的至少一种的第一组合物形成的聚合物，各自如本文所述。

    Compositions and antireflective coatings for photolithography
    4.
    发明公开
    Compositions and antireflective coatings for photolithography 有权
    用于光刻的组合物和抗反射涂层

    公开(公告)号：EP2597518A2

    公开(公告)日：2013-05-29

    申请号：EP12184808.9

    申请日：2012-09-18

    申请人： Dow Global Technologies LLC ,  Rohm and Haas Electronic Materials LLC

    发明人： Rao, Yuanqiao ,  Auger, Robert L. ,  Weaver, John D. ,  Popa, Paul J. ,  Jenkins, Roxanne M. ,  Sullivan, Christopher P. ,  Evans, Jessica P. ,  Kiarie, Cecilia W. ,  Stivastava, Yasmin N. ,  Fenton, Jr, Jeffrey L.

    IPC分类号： G03F7/09 ,  G03F7/075

    CPC分类号： G03F7/0752 ,  G03F7/091 ,  Y10T428/31663

    摘要： The invention provides a first composition comprising at least the following:
    A) a Compound F1 selected from Formula 1:

    wherein Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one multiple bond, these multiple bonds are not in a conjugated configuration; and
    R1, R2, and R3 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, or OC(O)OR, wherein R is alkyl or a substituted alkyl; and
    B) a Compound F2 selected from Formula 2:

    wherein Rb is selected from H or a saturated group comprising alkyl, alkylene, or alkylidene, and
    R4, R5, and R6 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, or OC(O)OR, wherein R is alkyl or a substituted alkyl; and
    C) a Compound F3 selected from Formula 3:

    wherein Rc comprises more than one multiple bond, and these multiple bonds are in a conjugated configuration; and
    R7, R8, and R9 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, or OC(O)OR, wherein R is alkyl or a substituted alkyl; and
    D) A Compound F4 selected from Formula 4:

    wherein R10, R11, R12, and R13 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, or OC(O)OR, wherein R is alkyl or a substituted alkyl.

    摘要翻译： 本发明提供了第一组合物，其至少包含以下物质：A）选自式1的化合物F1：其中Ra包含一个或多个重键，条件是如果Ra包含多于一个的多重键，则这些重键不在 共轭构型; 且R 1，R 2和R 3各自独立地选自烷氧基，羟基，卤素，OC（O）R或OC（O）OR，其中R为烷基或取代的烷基; 和B）选自式2的化合物F2：其中Rb选自H或包含烷基，亚烷基或亚烷基的饱和基团，并且R 4，R 5和R 6各自独立地选自烷氧基，羟基，卤化物，OC（O ）R或OC（O）OR，其中R是烷基或取代的烷基; 和C）选自式3的化合物F3：其中R c包含多于一个的多重键，并且这些多重键处于共轭构型; 和R7，R8和R9各自独立地选自烷氧基，羟基，卤素，OC（O）R或OC（O）OR，其中R是烷基或取代的烷基; 和D）选自式4的化合物F4：其中R10，R11，R12和R13各自独立地选自烷氧基，羟基，卤素，OC（O）R或OC（O）OR，其中R是烷基或 取代的烷基。