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    LITHOGRAPHIC PRINTING PLATE PRECURSORS AND COATING
    4.
    发明公开
    LITHOGRAPHIC PRINTING PLATE PRECURSORS AND COATING 有权
    LITHOGRAFISCHEDRUCKPLATTENVORLÄUFERUND BESCHICHTUNG

    公开(公告)号：EP3063591A4

    公开(公告)日：2017-08-02

    申请号：EP14857114

    申请日：2014-10-24

    申请人： ANOCOIL CORP

    发明人： KITSON ANTHONY PAUL

    IPC分类号： G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  G03F7/075 ,  G03F7/085 ,  G03F7/32

    CPC分类号： G03F7/0755 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  G03F7/0751 ,  G03F7/085 ,  G03F7/2002 ,  G03F7/322

    摘要： A coating for use with a hydrophilic sheet substrate to form a lithographic printing plate precursor, including at least one Compound A silane compound and at least one Compound B phosphinic acid or organic derivative thereof. Compounds A and B experience a synergistic interaction which substantially increases adhesion to the substrate of areas imaged by radiation. The resulting plate is exhibits high on-press durability suitable for high volume commercial uses without a preheat step prior to development, even when imaged with lower levels of radiation such as violet lasers. A method of preparing a lithographic printing plate includes imagewise exposing the coating on a surface of a hydrophilic substrate to violet radiation and developing in an alkaline aqueous solution without preheating.

    摘要翻译： 一种用于与亲水性片基材一起使用以形成平版印刷版原版的涂层，其包含至少一种化合物A硅烷化合物和至少一种化合物B次膦酸或其有机衍生物。 化合物A和B经历协同相互作用，其显着增加对通过辐射成像的区域的基底的粘附。 即使用较低水平的辐射（例如紫激光）成像，所得到的印版也表现出高的机上耐久性，适合大量商业用途，而不需要显影之前的预热步骤。 制备平版印刷版的方法包括将亲水基材表面上的涂层成像曝光成紫色辐射，并在碱性水溶液中显影而不预热。

    PHOTOSENSITIVE RESIN COMPOSITION, RESIST LAMINATE, AND CURED PRODUCT (2) THEREOF
    6.
    发明公开
    PHOTOSENSITIVE RESIN COMPOSITION, RESIST LAMINATE, AND CURED PRODUCT (2) THEREOF 有权
    光敏树脂组合物，层叠体RESIST和固化物（2）THEREOF

    公开(公告)号：EP2913712A4

    公开(公告)日：2016-06-08

    申请号：EP13849046

    申请日：2013-10-25

    申请人： NIPPON KAYAKU KK

    发明人： IMAIZUMI NAOKO ,  INAGAKI SHINYA ,  HONDA NAO

    IPC分类号： G03F7/038 ,  G03F7/004 ,  G03F7/075

    CPC分类号： G03F7/0751 ,  G03F7/038 ,  G03F7/0755

    摘要： The purpose of the present invention is to provide: a photosensitive epoxy resin composition and/or a resist laminate of said resin composition that makes it possible to use photolithography to form an image having a vertical sidewall shape and fine resolution, low stress, and heat/humidity resistance; and a cured product of said resin composition and said resist laminate. The present invention is a photosensitive resin composition comprising (A) an epoxy resin; (B) a polyphenol compound having a specific structure; (C) a photocationic polymerization initiator; and (D) an epoxy group-containing silane compound. The epoxy resin (A) comprises: an epoxy resin (a) obtained by reacting a phenol derivative that is represented by formula (1) with an epihalohydrin; and an epoxy resin (b) that is represented by formula (2).

    Compositions and antireflective coatings for photolithography
    9.
    发明公开
    Compositions and antireflective coatings for photolithography 审中-公开
    Zusammensetzungen und AntireflektionsbeschichtungenfürFotolithografie

    公开(公告)号：EP2573619A1

    公开(公告)日：2013-03-27

    申请号：EP12184809.7

    申请日：2012-09-18

    申请人： Dow Global Technologies LLC ,  Rohm and Haas Electronic Materials LLC

    发明人： Rao, Yuanqiao ,  Auger, Robert L. ,  Kiarie, Cecilia W. ,  Srivastava, Yasmin N. ,  Sullivan, Christopher P.

    IPC分类号： G03F7/075 ,  G03F7/09 ,  C08G77/08

    CPC分类号： G03F7/091 ,  C08G77/08 ,  C08G77/14 ,  C08G77/20 ,  C08G77/80 ,  C08L83/04 ,  G03F7/0751 ,  C08L83/00

    摘要： The invention provides a composition comprising at least the following A and B:
    A) polymer that comprises the following structural unit 1:

    wherein
    L is CX-CYZ, where X, Y, and Z are each independently selected from hydrogen, an alkyl, or a substituted alkyl; and,
    M is an alkylene, an arylene, a substituted alkylene, a substituted arylene, or C(O)O-W-, where W is an alkylene or a substituted alkylene; and
    R', R", and R"' are each independently selected from an aromatic hydrocarbon, an aliphatic hydrocarbon, or a substituted hydrocarbon that comprises one or more of O, N, S, or Si atoms, provided that at least one of R', R", and R'" is selected from alkoxyl, aryloxyl, hydroxyl, halide, carboxyl, or carbonate; and,
    p is an integer from 1 to 10,000; and

    with the proviso that the polymer does not comprise a polyhedral oligomeric silsesquioxane (POSS) structure; and
    B) a polymer formed from a first composition comprising at least one of Compound F1, Compound F2, Compound F3 and/or Compound F4, each as described herein.

    摘要翻译： 本发明提供包含至少以下A和B：A）聚合物的组合物，其包含以下结构单元1：其中L是CX-CYZ，其中X，Y和Z各自独立地选自氢，烷基或 取代的烷基; 和M是亚烷基，亚芳基，取代的亚烷基，取代的亚芳基或C（O）O-W-，其中W是亚烷基或取代的亚烷基; 和R“，R”和R“'各自独立地选自芳族烃，脂族烃或包含O，N，S或Si原子中的一个或多个的取代的烃，条件是至少一个 R“，R”和R“”选自烷氧基，芳氧基，羟基，卤素，羧基或碳酸酯; p为1〜10000的整数; 并且条件是聚合物不包含多面体低聚倍半硅氧烷（POSS）结构; 和B）由包含化合物F1，化合物F2，化合物F3和/或化合物F4中的至少一种的第一组合物形成的聚合物，各自如本文所述。