PERFLUOROAMIDATED AND HYDROLYZED MALEIC ANHYDRIDE COPOLYMERS
    1.
    发明授权
    PERFLUOROAMIDATED AND HYDROLYZED MALEIC ANHYDRIDE COPOLYMERS 有权
    全氟化和水解马来酸酐共聚物

    公开(公告)号:EP1874829B1

    公开(公告)日:2008-10-22

    申请号:EP06751210.3

    申请日:2006-04-24

    IPC分类号: C08F8/32 C08F8/00 D06M15/295

    摘要: A composition which provides stain resistance and soil resistance to substrates comprising a copolymer of Formula (1) wherein D is at least one vinyl monomer selected from the group consisting of aryl olefin, vinyl ether, allyl ether, alpha olefin and diene; each M is independently H, NH4, Ca, Mg, Al, or a Group I metal; R is H, a C1 - C16 alkyl group, or an arylalkyl group; Rf is a fully fluorinated straight or branched C2 to C20 aliphatic radical, or mixture thereof, which is optionally interrupted by at least one oxygen atom; x is 1 to about 10, or a mixture thereof; k and h are each independently a positive integer; i and j are each independently zero or a positive integer, provided that i and j are not both simultaneously zero; the molar ratio of k to (h + i + j) is from about 3:1 to about 1:3, and the molar ratio of h to (i + j) is from about 1:99 to about 22:78 is disclosed.

    摘要翻译: 一种组合物,其为包含式(1)的共聚物的基材提供耐污染性和防污性,其中D为至少一种选自芳基烯烃,乙烯基醚,烯丙基醚,α-烯烃和二烯的乙烯基单体; 每个M独立地为H,NH 4,Ca,Mg,Al或I族金属; R为H,C1-C16烷基或芳基烷基; R f是完全氟化的直链或支链C 2 -C 20脂族基团或其混合物,其任选被至少一个氧原子中断; x为1至约10,或其混合物; k和h各自独立地为正整数; i和j各自独立地为零或正整数,只要i和j不同时为零; 公开了k与(h + i + j)的摩尔比为约3:1至约1:3,并且h与(i + j)的摩尔比为约1:99至约22:78 。

    POLY(HYDROXYSTYRENE) STAIN RESIST
    5.
    发明公开
    POLY(HYDROXYSTYRENE) STAIN RESIST 审中-公开
    POLY(羟基苯乙烯)染料

    公开(公告)号:EP1945679A1

    公开(公告)日:2008-07-23

    申请号:EP06836596.4

    申请日:2006-10-27

    摘要: A composition for use as a stain blocker and a method of treating substrates therewith, said composition comprising a polymer of Formula (I) having the following repeating units in random sequence insert Formula (I) here wherein R1 is H, methyl or ethyl; R2 and R3 are each independently H, C1 to about C10 alkyl, -COOR4, CONR5R6, or -CN; R4 is M, C1 to about C20 alkyl, or C6 to C10 aryl; R5 and R6 are each independently H, C1 to C10 alkyl, C6 to C10 aryl, or R5 and R6 together with the nitrogen atom form a morpholine, pyrrolidine, or piperidine ring; R7 is a C4 to C8 alkyl group; M is H, an alkali metal or alkali earth metal; h is about 10 to 100 mole %; i is 0 to about 80 mole %; j is 0 to about 60 mole %; k and n are each independently 0 to about 40 mole %; and m is 0.01 to about 0.5; provided that h + i + j + k + n equals 100, and provided that i + j + k + n is greater than zero, except when h is 100%.

    摘要翻译: 用作染色体阻断剂的组合物和用其处理底物的方法,所述组合物包含式(I)的聚合物,其具有以下重复单元:其中R 1为H,甲基或乙基的随机序列插入式(I) R2和R3各自独立地为H,C1至约C10烷基,-COOR4,CONR5R6或-CN; R4为M,C1至约C20烷基或C6至C10芳基; R5和R6各自独立地为H,C1至C10烷基,C6至C10芳基或R5和R6与氮原子一起形成吗啉,吡咯烷或哌啶环; R7是C4至C8烷基; M是H,碱金属或碱土金属; h约为10至100摩尔%; i为0至约80摩尔%; j为0至约60摩尔%; k和n各自独立地为0至约40摩尔%; 且m为0.01至约0.5; 条件是h + i + j + k + n等于100,并且假定i + j + k + n大于零,除非h为100%。