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    Chemical vapor deposition apparatus and cleaning method thereof
    1.
    发明公开
    Chemical vapor deposition apparatus and cleaning method thereof 有权
    化学气相沉积设备及其清洁方法

    公开(公告)号：EP0909837A3

    公开(公告)日：1999-05-19

    申请号：EP98119305.5

    申请日：1998-10-13

    申请人： EBARA CORPORATION

    发明人： Suzuki, Hidenao ,  Nakada, Tsutomu ,  Abe, Masahito ,  Saitoh, Masao

    IPC分类号： C23C16/54

    CPC分类号： C23C16/4401 ,  Y10S156/916

    摘要： A chemical vapor deposition apparatus for depositing a thin film of highly dielectric materials for giga-capacity memory devices can reliably clean reaction products formed within the deposition chamber without sacrificing the production efficiency. The apparatus comprises a hermetic deposition chamber (10) containing a substrate holding section for placing a substrate, and a gas supply head (12) disposed opposite to the substrate holding section (14) for directing a gaseous feed material onto the substrate. There are provided a trapping member supporting device for supporting a trapping member (26) so as to be opposite to a target cleaning area inside the deposition chamber, and a plasma generation device for generating a plasma between the target cleaning area and the trapping member supported by the trapping member supporting device.

    摘要翻译： 用于沉积用于千兆容量存储器件的高介电材料薄膜的化学气相沉积设备可以可靠地清洁在沉积室内形成的反应产物而不牺牲生产效率。 该设备包括一个气密沉积室（10），该室包含一个用于放置衬底的衬底保持部分和一个与衬底保持部分（14）相对设置的气体供给头（12），用于将气体供给材料引导到衬底上。 提供了一种用于支撑捕获构件（26）以便与沉积室内的目标清洁区域相对的捕获构件支撑装置以及用于在目标清洁区域和被支撑的捕获构件之间产生等离子体的等离子体产生装置 通过俘获构件支撑装置。

    Liquid feed vaporization system and gas injection device
    2.
    发明公开
    Liquid feed vaporization system and gas injection device 失效
    液体进料汽化系统和注气装置

    公开(公告)号：EP0849375A3

    公开(公告)日：1998-12-02

    申请号：EP97120370.8

    申请日：1997-11-20

    申请人： EBARA CORPORATION

    发明人： Horie, Kuniaki ,  Suzuki, Hidenao ,  Nakada, Tsutomu ,  Kuriyama, Fumio ,  Murakami, Takeshi ,  Abe, Masahito ,  Araki, Yuji ,  Ueyama, Hiroyuki

    IPC分类号： C23C16/44 ,  B01D1/00

    CPC分类号： C23C16/45565 ,  C23C16/448 ,  C23C16/45561 ,  C23C16/4557

    摘要： A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO 3 , SrTiO 3 and others such materials. The vaporization apparatus comprises a feed tank (12) for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section (22) disposed in the delivery path comprising a high temperature heat exchanger (40) having a capillary tube (14a) for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section (20) disposed upstream of the vaporizer section for preventing heating effects of the vaporizer section to the liquid feed within the vaporization prevention section.

    摘要翻译： 提出了一种紧凑的蒸发器系统，用于从液体进料产生高质量的蒸汽进料，并将其输送到化学气相沉积处理室，以生产基于高介电或铁电材料（例如BaTiO 3，SrTiO 3等材料）的薄膜器件。 汽化装置包括用于储存液体进料的进料罐（12） 用于通过进料输送路径输送液体进料的进料输送装置; 布置在输送路径中的蒸发器部分（22），其包括具有用于输送液体进料的毛细管（14a）和用于从外部加热毛细管的热源的高温热交换器（40） 和设置在汽化器部分上游的汽化防止部分（20），用于防止汽化器部分在汽化防止部分内对液体进料的加热作用。

    Chemical vapor deposition apparatus and cleaning method thereof
    4.
    发明公开
    Chemical vapor deposition apparatus and cleaning method thereof 有权
    用于从气相化学沉积以及它们的纯化方法的装置

    公开(公告)号：EP0909837A2

    公开(公告)日：1999-04-21

    申请号：EP98119305.5

    申请日：1998-10-13

    申请人： EBARA CORPORATION

    发明人： Suzuki, Hidenao ,  Nakada, Tsutomu ,  Abe, Masahito ,  Saitoh, Masao

    IPC分类号： C23C16/54

    CPC分类号： C23C16/4401 ,  Y10S156/916

    摘要： A chemical vapor deposition apparatus for depositing a thin film of highly dielectric materials for giga-capacity memory devices can reliably clean reaction products formed within the deposition chamber without sacrificing the production efficiency. The apparatus comprises a hermetic deposition chamber (10) containing a substrate holding section for placing a substrate, and a gas supply head (12) disposed opposite to the substrate holding section (14) for directing a gaseous feed material onto the substrate. There are provided a trapping member supporting device for supporting a trapping member (26) so as to be opposite to a target cleaning area inside the deposition chamber, and a plasma generation device for generating a plasma between the target cleaning area and the trapping member supported by the trapping member supporting device.

    摘要翻译： 用于沉积用于千兆容量存储器器件高介电性材料的薄膜的化学气相沉积设备能够可靠地清洁反应产物沉积室中形成不牺牲了生产效率。 该装置包括一个密封沉积室（10）包含一个基片用于放置基板保持部，和相对设置保持用于引导一个气体进料材料到基底部分（14）在基板的气体供给头（12）。 设置有捕集构件用于支撑捕集部件（26），以便相对于该沉积室内部的目标清洁区域支承装置，和用于产生所述目标清洁区域之间的等离子体的等离子体生成装置和所述捕集部件支撑 由捕获部件支撑装置。

    Vapor-phase film growth apparatus and gas ejection head
    5.
    发明公开
    Vapor-phase film growth apparatus and gas ejection head 失效
    Vorrichtung zur Abscheidung eines Films aus der Gasphase undGasinjektionsdüse

    公开(公告)号：EP0853138A1

    公开(公告)日：1998-07-15

    申请号：EP98100217.3

    申请日：1998-01-08

    申请人： EBARA CORPORATION

    发明人： Horie, Kuniaki ,  Nakada, Tsutomu ,  Murakami, Takeshi ,  Suzuki, Hidenao ,  Abe, Masahito ,  Araki, Yuji

    IPC分类号： C23C16/44 ,  C30B25/14

    CPC分类号： C23C16/45574 ,  C23C16/45565 ,  C30B25/14

    摘要： A vapor-phase film growth apparatus includes a substrate holder for holding a substrate, a gas ejection head, and a radiant heat shield device. The substrate holder has a substrate heater therein, and the gas ejection head has a gas injection surface for ejecting a material gas toward a substrate held by the substrate holder. The radiant heat shield device is disposed between the substrate holder and the gas injection head in confronting relationship to the gas injection surface of the gas ejection nozzle. The substantially planar radiant heat shield device is permeable to gases and has a heating capability. The gas ejection head allows gas to be ejected at supersonic velocity.

    摘要翻译： 气相膜生长装置包括用于保持基板的基板保持器，气体喷射头和辐射热屏蔽装置。 衬底保持器在其中具有衬底加热器，并且气体喷射头具有用于将材料气体朝向由衬底保持器保持的衬底喷射的气体注入表面。 辐射热屏蔽装置以与气体喷射喷嘴的气体注入表面相对的关系设置在衬底保持器和气体注入头之间。 基本平坦的辐射热屏蔽装置可透气并具有加热能力。 气体喷射头允许气体以超音速喷射。

    Vapor feed supply system
    7.
    发明公开
    Vapor feed supply system 失效
    系统zur Versorgung mit Dampf

    公开(公告)号：EP0852970A2

    公开(公告)日：1998-07-15

    申请号：EP98100218.1

    申请日：1998-01-08

    申请人： EBARA CORPORATION

    发明人： Horie, Kuniaki ,  Suzuki, Hidenao ,  Nakada, Tsutomu ,  Murakami, Takeshi ,  Fukunaga, Yukio ,  Abe, Masahito ,  Shinozaki, Hiroyuki ,  Tsukamoto, Kiwamu ,  Shibasaki, Mitsunao ,  Araki, Yuji ,  Ueyama, Hiroyuki

    IPC分类号： B08B9/00

    CPC分类号： C23C16/448 ,  B08B9/00 ,  C23C16/4407 ,  Y10S134/902

    摘要： A vapor feed supply system including a vaporizer device and a method of cleaning a vapor flow region including such a vaporizer device, to enable thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device is presented. The method comprises: defining a cleaning fluid passage having a predetermined withstand pressure by isolating a cleaning region of the vapor flow region; and flowing a cleaning fluid into the cleaning fluid passage under a pressure so as to enable the cleaning fluid to remain in a liquid state at a cleaning temperature of the cleaning region.

    摘要翻译： 提供一种蒸气供给系统，其包括蒸发器装置和清洁包括这种蒸发器装置的蒸气流动区域的方法，以便能够彻底清洁系统，而不必在清洁蒸发器装置的过程中降低总体系统真空度 。 该方法包括：通过隔离蒸汽流动区域的清洁区域来限定具有预定耐受压力的清洁流体通道; 并且在压力下将清洁流体流入清洁流体通道，以使清洁流体能够在清洁区域的清洁温度下保持液体状态。

    Liquid feed vaporization system and gas injection device
    8.
    发明公开
    Liquid feed vaporization system and gas injection device 失效
    一种用于液体和气体喷射器的蒸发

    公开(公告)号：EP0849375A2

    公开(公告)日：1998-06-24

    申请号：EP97120370.8

    申请日：1997-11-20

    申请人： EBARA CORPORATION

    发明人： Horie, Kuniaki ,  Suzuki, Hidenao ,  Nakada, Tsutomu ,  Kuriyama, Fumio ,  Murakami, Takeshi ,  Abe, Masahito ,  Araki, Yuji ,  Ueyama, Hiroyuki

    IPC分类号： C23C16/44 ,  B01D1/00

    CPC分类号： C23C16/45565 ,  C23C16/448 ,  C23C16/45561 ,  C23C16/4557

    摘要： A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO 3 , SrTiO 3 and others such materials. The vaporization apparatus comprises a feed tank (12) for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section (22) disposed in the delivery path comprising a high temperature heat exchanger (40) having a capillary tube (14a) for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section (20) disposed upstream of the vaporizer section for preventing heating effects of the vaporizer section to the liquid feed within the vaporization prevention section.