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1.发明公开
公开(公告)号：EP0703596A2
公开(公告)日：1996-03-27
申请号：EP95114979.8
申请日：1995-09-22
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kobata, Tadasuke , Nakao, Masayuki , Hatamura, Yotaro
IPC分类号： H01J37/305
CPC分类号： H01J37/3056 , H01J2237/3114
摘要： An energy beam is irradiated to a workpiece (12) through a beam transmission hole (14a) defined in a mask (14). At that time, a relative position between an energy beam source (13) and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which corresponds to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths can be very easily made and further the product can be machined to desired depths with a high accuracy by a single machining operation in a short time.
摘要翻译： 通过限定在掩模（14）中的光束透射孔（14a）将能量束照射到工件（12）。 此时，能量束源（13）与掩模或掩模和工件之间的相对位置改变，使得工件的加工深度根据工件的加工部分而变化，这对应于照射量 的能量束。 通过这种方法，可以非常容易地制造具有局部不同深度的加工产品，并且通过在短时间内的单个加工操作，可以以高精度将产品加工成期望的深度。
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公开(公告)号：EP0703596B1
公开(公告)日：2003-04-23
申请号：EP95114979.8
申请日：1995-09-22
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kobata, Tadasuke , Nakao, Masayuki , Hatamura, Yotaro
IPC分类号： H01J37/305 , H01J37/31 , C03C23/00
CPC分类号： H01J37/3056 , H01J2237/3114
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公开(公告)号：EP0703596A3
公开(公告)日：1999-01-07
申请号：EP95114979.8
申请日：1995-09-22
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kobata, Tadasuke , Nakao, Masayuki , Hatamura, Yotaro
IPC分类号： H01J37/305
CPC分类号： H01J37/3056 , H01J2237/3114
摘要： An energy beam is irradiated to a workpiece (12) through a beam transmission hole (14a) defined in a mask (14). At that time, a relative position between an energy beam source (13) and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which corresponds to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths can be very easily made and further the product can be machined to desired depths with a high accuracy by a single machining operation in a short time.
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公开(公告)号：EP0790757A1
公开(公告)日：1997-08-20
申请号：EP97102532.5
申请日：1997-02-17
申请人： EBARA CORPORATION
IPC分类号： H05H3/02
CPC分类号： H05H3/02
摘要： A fast atomic beam (FAB) source is capable of generating fast atomic beams having characteristics of a high beam density, a precise directionality, and a wide range of controlled out put energy levels.
The FAB source is comprised of a discharge tube, an inductively coupled plasma generator for generating gas plasma in the discharge tube from introduced gas therein, positive and negative electrodes for accelerating ions to control the beam for a variety of energy levels. The negative electrode has a beam control opening for generating a FAB, wherein directionability, neutralization factor, and other FAB characteristics are controlled.摘要翻译： 快速原子束（FAB）源能够产生具有高光束密度，精确方向性和大范围的控制输出能级的快速原子束。 FAB源包括放电管，用于在放电管中从其中引入气体产生气体等离子体的电感耦合等离子体发生器，用于加速离子以控制各种能级的离子束的正电极和负电极。 负电极具有用于产生FAB的束控制开口，其中方向性，中和因子和其他FAB特性受到控制。
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5.发明公开Ultra-fine microfabrication method using an energy beam 失效超新星Mikroherstellungsverfahren unter Verwendung einesEnergiebündel
公开(公告)号：EP0731490A2
公开(公告)日：1996-09-11
申请号：EP96102976.6
申请日：1996-02-28
IPC分类号： H01L21/033 , G03F7/00
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01J2209/0223 , H01L21/0331 , H01L21/0337
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micronmeter sized micro-particles to produce a variety of three-dimensional fine-structures which have not been possible to produce by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basic technique of radiation of energy beam and shielding is combined with a shield positioning technique using magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particles beams or solutions, fine-structures of very high aspect ratios can be produced with precision. Applications of devices having the fine-structure produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.
摘要翻译： 使用能量束的超微细微细加工方法是基于使用由纳米或微米尺寸的微粒提供的屏蔽来产生不可能通过传统光刻技术产生的各种三维微结构， 基本上设计用于生产二维结构。 当能量束和屏蔽辐射的基本技术与使用磁场，电场或激光束的屏蔽定位技术结合使用或不伴随反应气体粒子束或解决方案提供的附加化学效应时，非常高的方面的精细结构 比率可以精确地生产。 通过该方法制造的具有精细结构的器件的应用包括光通信中的波长偏移，量子效应器件和强激光器件。
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公开(公告)号：EP0731490A3
公开(公告)日：1998-03-11
申请号：EP96102976.6
申请日：1996-02-28
IPC分类号： H01L21/033 , G03F7/00
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01J2209/0223 , H01L21/0331 , H01L21/0337
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micronmeter sized micro-particles to produce a variety of three-dimensional fine-structures which have not been possible to produce by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basic technique of radiation of energy beam and shielding is combined with a shield positioning technique using magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particles beams or solutions, fine-structures of very high aspect ratios can be produced with precision. Applications of devices having the fine-structure produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.
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公开(公告)号：EP0735564A3
公开(公告)日：1998-01-14
申请号：EP96105077.0
申请日：1996-03-29
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kato, Takao , Kajiyama, Masaaki , Tsuzuki, Takashi , Hatamura, Yotaro , Nakao, Masayuki
CPC分类号： H01J37/3005 , H01J37/20
摘要： A micro-working apparatus performs fabrication and assembly tasks for micron/nanometer sized objects while observing the progress of work in real-time under at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions, thus offering a spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to demonstrate the production of micron-sized parts for use in advanced applications of optical and electronic devices.
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公开(公告)号：EP0735564A2
公开(公告)日：1996-10-02
申请号：EP96105077.0
申请日：1996-03-29
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kato, Takao , Kajiyama, Masaaki , Tsuzuki, Takashi , Hatamura, Yotaro , Nakao, Masayuki
CPC分类号： H01J37/3005 , H01J37/20
摘要： A micro-working apparatus performs fabrication and assembly tasks for micron/nanometer sized objects while observing the progress of work in real-time under at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions, thus offering a spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to demonstrate the production of micron-sized parts for use in advanced applications of optical and electronic devices.
摘要翻译： 微型加工设备对微米/纳米尺寸的物体执行制造和组装任务，同时在至少一对光学或电子显微镜下实时观察工作进展，以从至少两个方向提供同时观看，从而提供空间 关于微型工作特别关键的工作空间的视觉信息。 通过使用专门设计用于该设备的微型托盘装置，还提供其他应用的可能性，进一步促进了微加工。 微型托盘提供的旋转和平行平移运动结合设备的微加工能力被用来证明用于光学和电子设备的先进应用的微米级部件的生产。
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公开(公告)号：EP0732624A2
公开(公告)日：1996-09-18
申请号：EP96104171.2
申请日：1996-03-15
IPC分类号： G03F7/00 , H01L21/033
CPC分类号： H01L21/3086 , G03F7/001 , G03F7/2037 , G03F7/70358 , H01J9/025 , H01J2209/0223 , H01L21/0331 , H01L21/0337
摘要： A method and apparatus are presented for producing a three-dimensional ultra-fine micro-fabricated structures of the order of µm and less for use in advanced optical communication systems and quantum effect devices. The basic components are an energy beam source, a mask member and a specimen stage. Because the mask member is an independent component, various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing a multiple lines or array of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films on a multiple line pattern or in an array pattern. Because of the flexibility of fabrication method and material of fabrication, labyrinth seals having curved surface with grooved structure can be used as friction reduction means for bearing components. The fine groove dimensions of the order of nm is possible. Energy beams can be any of fast atomic beams, ion beams, electron beam, laser beams, radiation beams, X-ray beams and radical particle beams. Parallel beams are often used, but when a focused beam is used, a technique of reduced projection imaging can be utilized to produce a fine-structure of the order of nm.
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公开(公告)号：EP0735564B1
公开(公告)日：2003-11-05
申请号：EP96105077.0
申请日：1996-03-29
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kato, Takao , Kajiyama, Masaaki , Tsuzuki, Takashi , Hatamura, Yotaro , Nakao, Masayuki
CPC分类号： H01J37/3005 , H01J37/20
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