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    MICROSCOPY IMAGING METHOD
    2.
    发明公开
    MICROSCOPY IMAGING METHOD 审中-公开

    公开(公告)号：EP3528276A2

    公开(公告)日：2019-08-21

    申请号：EP18211266.4

    申请日：2012-05-14

    申请人： Fibics Incorporated

    发明人： Phaneuf, Michael, William ,  Lagarec, Ken, Guillaume

    IPC分类号： H01J37/28 ,  H01J37/22

    CPC分类号： H01J37/26 ,  G06T2207/10061 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/3056 ,  H01J2237/226 ,  H01J2237/2811 ,  H01J2237/3174 ,  H01J2237/31749

    摘要： Generally, the present disclosure provides a method and system for improving imaging efficiency for CPB systems while maintaining or improving imaging accuracy over prior CPB systems. A large field of view image of a sample is acquired at a low resolution and thus, at high speed. The low resolution level is selected to be sufficient for an operator to visually identify structures or areas of interest on the low resolution image. The operator can select one or more small areas of arbitrary shape and size on the low resolution image, referred to as an exact region of interest (XROI). The outline of the XROI is mapped to an x-y coordinate system of the image, and the CPB system is then controlled to acquire a high resolution image of only the XROI identified on the low resolution image. For 3D imaging, once the XROI is identified, each section of the sample can be iteratively imaged in the previously described manner, with the operator having the option to redefine the XROI later.

    PARTICLE BEAM SYSTEM INCLUDING A SUPPLY OF PROCESS GAS TO A PROCESSING LOCATION
    4.
    发明公开
    PARTICLE BEAM SYSTEM INCLUDING A SUPPLY OF PROCESS GAS TO A PROCESSING LOCATION 审中-公开

    公开(公告)号：EP3373323A2

    公开(公告)日：2018-09-12

    申请号：EP18165410.4

    申请日：2013-01-23

    申请人： Carl Zeiss Microscopy GmbH

    发明人： Zeile, Ulrike ,  Knappich, Matthias

    IPC分类号： H01J37/305 ,  H01J37/02

    CPC分类号： F17D1/04 ,  H01J37/02 ,  H01J37/3056 ,  H01J2237/006 ,  Y10T137/8593

    摘要： A system for supplying a process gas to a processing location 7 of a particle beam system 1 comprises a gas reservoir 63; a gas conduit 65; a pipe 69 located close to the processing location; a valve 67 provided between the gas conduit and the pipe; and a controller 71 configured to open and to close the valve to switch the system from a first mode of operation in which process gas is not supplied to the processing location to a second mode of operation in which process gas is supplied to the processing location. The controller can alternately open and close the valve in cycles, wherein each cycle includes a first duration in which the valve is open and a second duration in which the valve is closed, wherein a ratio between the first duration and the second duration can be changed.

    Charged particle energy filter
    7.
    发明授权
    Charged particle energy filter 有权
    带电粒子能量过滤器

    公开(公告)号：EP2592642B1

    公开(公告)日：2018-04-11

    申请号：EP12191522.7

    申请日：2012-11-07

    申请人： FEI COMPANY

    发明人： Parker, William ,  Hughes, Wesley

    IPC分类号： H01J37/305 ,  H01J37/05

    CPC分类号： H01J37/05 ,  H01J37/3056 ,  H01J2237/043 ,  H01J2237/057 ,  H01J2237/1534

    摘要： A multi-element electrostatic chicane energy filter (300) , with the addition of electrostatic quadrupole and hexapole excitations to the dipole elements (302, 304, 306, 308). A charged particle energy filter according to the present invention with a combination of dipole, quadrupole, and hexapole elements capable of producing a line focus at an aperture (310) reduces space-charge effects and aperture damage. A preferred embodiment allows the filter to act as a conjugate blanking system. The energy filter is capable of narrowing the energy spread to result in a smaller beam.

    Method of processing a material-specimen
    8.
    发明公开
    Method of processing a material-specimen 审中-公开
    处理材料样本的方法

    公开(公告)号：EP2743026A3

    公开(公告)日：2017-10-11

    申请号：EP13005323.4

    申请日：2013-11-12

    申请人： Carl Zeiss Microscopy GmbH

    发明人： Salzer, Roland

    IPC分类号： B23K26/36 ,  G01N1/32 ,  H01J37/305

    CPC分类号： H01J37/3053 ,  B23K26/03 ,  B23K26/14 ,  B23K26/361 ,  B23K26/362 ,  G01N1/32 ,  H01J37/3056 ,  H01J2237/3174 ,  H01J2237/31744 ,  H01L21/02

    摘要： A method for generating a smooth surface 23 in a material-specimen 1, comprising: generating a substantially smooth, first surface region 21 by removing a first material-volume by particle beam etching, wherein the first material-volume is partially defined by the first surface region and wherein an angle between a beam direction 15 and a surface normal of the first surface region 21 is greater than 80° and smaller than 90°; and generating a substantially smooth, second surface region 23 by removing a second material-volume II, wherein the second material-volume is partially defined by the first surface region 21' and is partially defined by the second surface region 23 and wherein an angle α between the beam direction 15 and a surface normal of the second surface region 23 is smaller than 60°.

    摘要翻译： 一种用于在材料样本1中产生光滑表面23的方法，包括：通过利用粒子束蚀刻去除第一材料体积而产生基本光滑的第一表面区域21，其中第一材料体积部分地由第一材料体积限定 并且其中束方向15与第一表面区域21的表面法线之间的角度大于80°且小于90°; 并且通过去除第二材料体积II来产生基本光滑的第二表面区域23，其中第二材料体积部分地由第一表面区域21'限定并且部分地由第二表面区域23限定，并且其中角度α 光束方向15与第二表面区域23的表面法线之间的距离小于60°。

    DUAL-BEAM CHARGED PARTICLE APPARATUS WITH ANTI-CONTAMINATION SHIELD
    9.
    发明公开
    DUAL-BEAM CHARGED PARTICLE APPARATUS WITH ANTI-CONTAMINATION SHIELD 审中-公开
    具有抗污染屏蔽的双束带电粒子装置

    公开(公告)号：EP3223297A1

    公开(公告)日：2017-09-27

    申请号：EP17161381.3

    申请日：2017-03-16

    申请人： Hitachi High-Tech Science Corporation

    发明人： OONISHI, Tsuyoshi ,  HASUDA, Masakatsu

    IPC分类号： H01J37/02 ,  H01J37/30 ,  H01J37/28

    CPC分类号： H01J37/09 ,  H01J37/023 ,  H01J37/20 ,  H01J37/28 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/3056 ,  H01J37/31 ,  H01J2237/022 ,  H01J2237/2809 ,  H01J2237/2813 ,  H01J2237/31745

    摘要： Disclosed herein is a composite charged particle beam apparatus including a sample tray 15 on which a sample S is placed; a focused ion beam column 11 irradiating the sample by using a focused ion beam; an electron beam column 12 irradiating the sample by using an electron beam; a sample chamber receiving the sample tray, and the columns therein; an anti-contamination plate 22 moving between an inserted position inserted into a space between a beam emission surface 12a of the electron beam column and the sample tray, thus preventing the electron beam column from being contaminated by sputtered particles M, and an open position withdrawn from the space between the beam emission surface and the sample tray; and an operation unit operating the anti-contamination plate to move between the positions.

    摘要翻译： 本发明公开了一种复合带电粒子束装置，其包括其上放置有样品S的样品盘15; 通过使用聚焦离子束照射样本的聚焦离子束柱11; 通过使用电子束照射样品的电子束柱12; 接收样品盘的样品室和其中的柱; 在插入到电子束柱的电子束发射表面12a与样品盘之间的空间中的插入位置之间移动的防污染板22，从而防止电子束柱被溅射粒子M污染，并且打开位置被撤回 从光束发射表面和样品盘之间的空间; 以及操作单元，操作防污染板以在这些位置之间移动。

    Method of processing of an object
    10.
    发明公开
    Method of processing of an object 审中-公开
    对象的处理方法

    公开(公告)号：EP2400524A3

    公开(公告)日：2017-06-28

    申请号：EP11005111.7

    申请日：2011-06-22

    申请人： Carl Zeiss NTS GmbH

    发明人： Biberger, Josef ,  Pulwey, Ralph ,  Paluszynski, Jaroslaw ,  Dönitz, Dietmar ,  Mathée, Hans ,  Steigerwald, Michael

    IPC分类号： H01J37/30 ,  H01J37/305 ,  H01J37/304 ,  H01J37/317 ,  G01B15/08

    CPC分类号： H01J37/3056 ,  G01B15/04 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/2611 ,  H01J2237/30455 ,  H01J2237/30494 ,  H01J2237/31722 ,  H01J2237/31749

    摘要： A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning (103,105); determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons (107); determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations (113).

    摘要翻译： 一种处理物体的方法包括扫描物体表面上的粒子束并检测由于扫描而从物体出现的电子（103,105）; 基于检测到的电子，确定物体表面上的多个位置中的每一个位置处的物体的表面与预定表面之间的高度差（107）; 基于所确定的高度差确定对象的表面上的多个位置中的每一个的处理强度; 以及基于所确定的处理强度将粒子束引导至所述多个位置，以便从所述多个位置（113）处的物体上去除材料或将材料沉积在所述物体上。