公开(公告)号：EP2656372B1

公开(公告)日：2018-07-25

申请号：EP11799160.4

申请日：2011-12-14

申请人： Element Six Technologies Limited

发明人： BRANDON, John, Robert ,  CULLEN, Alexander, Lamb ,  WILLIAMS, Stephen, David ,  DODSON, Joseph, Michael ,  WILMAN, Jonathan, James ,  WORT, Christopher, John, Howard

IPC分类号： H01J37/32 ,  C23C16/511

CPC分类号： H01J37/32458 ,  C23C16/274 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32284

摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode, wherein the resonance cavity has a central rotational axis of symmetry extending from the base to the top plate, and wherein the top plate is mounted across said central rotational axis of symmetry; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; and a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use; wherein the resonance cavity is configured to have a height, as measured from the base to the top plate of the plasma chamber, which supports a TM011 resonant mode between the base and the top plate at said frequency f, and wherein the resonance cavity is further configured to have a diameter, as measured at a height less than 50% of the height of the resonance cavity as measured from the base, which satisfies the condition that a ratio of the resonance cavity height/the resonance cavity diameter is in the range 0.3 to 1.0.