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公开(公告)号：EP4322198A3
公开(公告)日：2024-06-12
申请号：EP23190106.7
申请日：2023-08-07
申请人： FEI Company
IPC分类号： H01J37/153
CPC分类号： H01J37/153 , H01J2237/153420130101 , H01J2237/153220130101 , H01J2237/1220130101 , H01J2237/2820130101 , H01J37/12
摘要： Optical corrector modules for charged particle columns which comprise split multipoles, according to the present invention include at least one split multipole composed of two multipoles separated by a distance less than 10mm, 1m, 100µm, and/or 10µm. Each of the individual multipoles may comprise at least two electrodes positioned to partially define a beam path through the multipole. According to the present invention, each of the electrodes comprises: a first surface that faces upstream of a charged particle beam when used in the charged particle column; and a second surface that faces downstream of the charged particle beam when used in the charged particle column, wherein the thickness between the first surface and the second surface for each of the electrodes is less than 10 mm, 5mm, and/or 3mm. Within the scope of the disclosure, the split multipoles may be electrostatic and may correspond to hexapoles.
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公开(公告)号：EP4322196A2
公开(公告)日：2024-02-14
申请号：EP23190282.6
申请日：2023-08-08
申请人： FEI COMPANY
IPC分类号： H01J37/147 , H01J37/153 , H01J1/46 , H01J9/14 , H01J37/28
摘要： The present invention is directed to an electrode component 200 with at least two electrodes 202,204 or a multipole component as generally known in the art. Each of the electrodes can be provided with a beam neighboring section or end section forming the free electrodes. This section is the section exposed to high voltages, i.e. more than 10 KV, and is intended to nevertheless work very reliable and precise with respect to the guidance and/or controlling of a beam of a charged particle beam in a microscope or lithographic apparatus. This neighboring section are positioned in the vicinity or close to a charged particle beam or even facing it. This bears the preferred advantage that high voltages can be generated by the electrodes or to the electrode component and they can withstand those high voltages. This assists in a better guidance and/or controlling of the charged beam, such as for compensating aberration etc. The beam neighboring section can have a surface configured to face the beam. This neighboring section or surface are fabricated with absolute dimensional tolerances less than a desired maximum absolute dimensional tolerance wherein the desired maximum absolute dimensional tolerance is based at least on a maximum voltage to be applied to the electrode. With such a precisely fabricated surface, a more precise and/or efficient field can be generated being able to control the charged particle beam more precisely and efficiently.
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公开(公告)号：EP4207242A1
公开(公告)日：2023-07-05
申请号：EP22217129.0
申请日：2022-12-29
申请人： FEI Company
IPC分类号： H01J37/153
摘要： Electrostatic mirror chromatic aberration (Cc) correctors, according to the present disclosure, comprise an electrostatic electron mirror that itself comprises a multipole. The electrostatic electron mirror is positioned within the corrector such that, when the corrector is in use, an electron beam passing through the corrector is not incident on the electrostatic electron mirror along the optical axis of the mirror. The mirror object distance of the electrostatic mirror is equal to the mirror image distance of the electrostatic mirror, and the electrostatic mirror is configured such that the electrostatic mirror applies no dispersion or coma aberration to the electron beam. The multipole is positioned in the mirror plane of the electrostatic electron mirror, and in some embodiments the multipole is a quadrupole.
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公开(公告)号：EP4167265A1
公开(公告)日：2023-04-19
申请号：EP22198145.9
申请日：2022-09-27
申请人： FEI Company
IPC分类号： H01J37/153
摘要： An electron optical module for providing an off-axial electron beam with a tunable coma, according to the present disclosure includes a structure positioned downstream of an electron source and an electron lens assembly positioned between the structure and the electron source. The structure generates a decelerating electric field, and is positioned to prevent the passage of electrons along the optical axis of the electron lens assembly. The electron optical module further includes a micro-lens that is not positioned on the optical axis of the electron lens assembly and is configured to apply a lensing effect to an off-axial election beam. Aberrations applied to the off-axial electron beam by the micro-lens and the electron lens assembly combine so that a coma of the off-axial beam has a desired value in a downstream plane.
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公开(公告)号：EP4322198A2
公开(公告)日：2024-02-14
申请号：EP23190106.7
申请日：2023-08-07
申请人： FEI Company
IPC分类号： H01J37/153
摘要： Optical corrector modules for charged particle columns which comprise split multipoles, according to the present invention include at least one split multipole composed of two multipoles separated by a distance less than 10mm, 1m, 100µm, and/or 10µm. Each of the individual multipoles may comprise at least two electrodes positioned to partially define a beam path through the multipole. According to the present invention, each of the electrodes comprises: a first surface that faces upstream of a charged particle beam when used in the charged particle column; and a second surface that faces downstream of the charged particle beam when used in the charged particle column, wherein the thickness between the first surface and the second surface for each of the electrodes is less than 10 mm, 5mm, and/or 3mm. Within the scope of the disclosure, the split multipoles may be electrostatic and may correspond to hexapoles.
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公开(公告)号：EP4322197A1
公开(公告)日：2024-02-14
申请号：EP23189973.3
申请日：2023-08-07
申请人： FEI Company
IPC分类号： H01J37/153
摘要： Compact correctors for correcting spherical aberrations of a particle-optical lens in a charged particle microscope system, according to the present disclosure a strong hexapole configured to generate a strong hexapole field when a voltage is applied to it, and a weak hexapole positioned between the strong hexapole and a sample. The strong hexapole is positioned such that the crossover of a charged particle beam of the charged particle system does not pass through the center of the strong hexapole, such that the strong hexapole field applies at least an A2 aberration and a D4 aberration to the charged particle beam. The weak hexapole is further positioned or otherwise configured such that, when a voltage is applied to the weak hexapole it generates a weak hexapole field that applies at least a combination A2 aberration and a combination D4 aberration to the charged particle beam of the charged particle microscopy system.
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