公开(公告)号：EP3258485A4

公开(公告)日：2018-03-14

申请号：EP16749153

申请日：2016-02-04

Applicant: FUJIFILM CORP

Inventor： TAKAHASHI SATOMI ,  BAK SEONGMU ,  MIZUTANI ATSUSHI ,  INABA TADASHI

IPC: H01L21/306 ,  H01L21/311

CPC classification number: H01L21/304 ,  C07C321/04 ,  C07C321/22 ,  C07C321/26 ,  C22B30/04 ,  C22B58/00 ,  H01L21/02052 ,  H01L21/02057 ,  H01L21/3081 ,  H01L21/31111

Abstract: Provided are a removal liquid for removing an oxide of a Group III-V element, an oxidation prevention liquid for preventing the oxidation of an oxide of a Group III-V element or a treatment liquid for treating an oxide of a Group III-V element, each liquid including an acid and a mercapto compound; and a method using each of the same liquids. Further provided are a treatment liquid for treating a semiconductor substrate, including an acid and a mercapto compound, and a method for producing a semiconductor substrate product using the same.

公开(公告)号：EP2960691A4

公开(公告)日：2016-02-17

申请号：EP14754459

申请日：2014-02-13

Applicant: FUJIFILM CORP

Inventor： NARA YUKI ,  BAK SEONGMU ,  EZOE TOSHIHIDE ,  KAWASHIMA TAKASHI ,  HITOMI SEIICHI

IPC: G02B5/22 ,  G02B1/04 ,  G02B5/20 ,  G02B13/00 ,  G03B11/00 ,  H01L27/146 ,  H04N5/33 ,  H04N5/335

CPC classification number: G02B5/208 ,  G02B1/04 ,  G02B13/003 ,  G03B11/00 ,  H01L27/14621 ,  H01L27/14638 ,  H01L27/14685 ,  H04N5/2254 ,  H04N5/33 ,  H04N5/335 ,  C08L63/00 ,  C08L101/14