专利检索 ap:("FUJIFILM CORP") AND inv:"MURO NAOTSUGU" 第 1 页

1.

发明公开
ETCHING METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE PRODUCT AND SEMICONDUCTOR DEVICE USING THE SAME, AS WELL AS KIT FOR PREPARATION OF ETCHING LIQUID 审中-公开
标题翻译：用于制造半导体基板产物及半导体部件腐蚀和方法和试剂盒用于生产蚀刻

公开(公告)号：EP2875520A4

公开(公告)日：2016-02-24

申请号：EP13819335

申请日：2013-07-17

申请人： FUJIFILM CORP

发明人： KAMIMURA TETSUYA , INABA TADASHI , MURO NAOTSUGU , NISHIWAKI YOSHINORI

IPC分类号： H01L21/3213 , C09K13/00 , C09K13/06 , H01L21/311

CPC分类号： H01L21/30604 , C09K13/00 , C09K13/02 , C09K13/06 , C23F1/00 , C23F1/02 , C23F1/14 , C23F1/26 , C23F1/38 , C23F1/44 , C23G1/106 , C23G1/205 , H01L21/02063 , H01L21/31144 , H01L21/32134 , H01L21/6704

2.

发明公开
ETCHING METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE PRODUCT AND SEMICONDUCTOR DEVICE USING THE SAME 审中-公开
标题翻译：蚀刻和一种用于生产半导体衬底制品和半导体组件

公开(公告)号：EP2875521A4

公开(公告)日：2016-03-02

申请号：EP13819989

申请日：2013-07-17

申请人： FUJIFILM CORP

发明人： MURO NAOTSUGU , KAMIMURA TETSUYA , INABA TADASHI , WATANABE TAKAHIRO , PARK KEE YOUNG

IPC分类号： H01L21/3213 , H01L21/311

CPC分类号： H01L21/30608 , H01L21/02063 , H01L21/31144 , H01L21/32134

摘要： An etching method, having the step of applying an etching liquid onto a TiN-containing layer in a semiconductor substrate thereby etching the TiN-containing layer, the etching liquid comprising water, and a basic compound and an oxidizing agent in water thereof to be within the range of pH from 8.5 to 14, and the TiN-containing layer having a surface oxygen content from 0.1 mol % to 10 mol %.

3.

发明公开
COLOR FILTER, CCD SENSOR, CMOS SENSOR, ORGANIC CMOS SENSOR, AND SOLID-STATE IMAGE SENSOR 审中-公开
标题翻译：彩色滤光片的CCD传感器，CMOS传感器，有机CMOS传感器和图像传感器SOLID STATE

公开(公告)号：EP2718753A4

公开(公告)日：2015-05-06

申请号：EP12796829

申请日：2012-05-24

申请人： FUJIFILM CORP

发明人： TAGUCHI HIROSHI , MURO NAOTSUGU , YAMADA MAKOTO

IPC分类号： G02B5/20 , C09B23/00 , G02B5/22 , G03F7/004 , H04N9/07

CPC分类号： H01L31/0232 , C09B23/04 , C09B69/105 , G02B5/201 , G02B5/223 , G03F7/0007 , H01L27/14621

4.

发明公开
POLYMERIZABLE COMPOSITION 审中-公开
标题翻译：可聚合组合物

公开(公告)号：EP2572243A4

公开(公告)日：2014-01-22

申请号：EP11783674

申请日：2011-05-17

申请人： FUJIFILM CORP

发明人： MURO NAOTSUGU , IKEDA KIMI , SHIMADA KAZUTO , ARIOKA DAISUKE

IPC分类号： G03F7/004 , G03F7/027 , G03F7/031 , G03F7/033 , G03F7/035 , G03F7/038

CPC分类号： C08L35/02 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0043 , G03F7/0047 , G03F7/031 , G03F7/033 , G03F7/035 , G03F7/0388 , G03F7/0755

5.

发明公开
COLORING COMPOSITION, THERMAL TRANSFER RECORDING INK SHEET, THERMAL TRANSFER RECORDING METHOD, COLOR TONER, INKJET INK, COLOR FILTER, AND ARYLIDENE-PYRAZOLONE DYE 有权
标题翻译：染料组合物，热转印记录墨水纸，热转印记录方法，碳粉，墨水，彩色滤光片与亚芳基吡唑啉酮染料

公开(公告)号：EP2257600A4

公开(公告)日：2011-05-25

申请号：EP09714778

申请日：2009-02-27

申请人： FUJIFILM CORP

发明人： FUJIE YOSHIHIKO , ICHIKAWA SHINICHI , HOSHIMIYA TAKASHI , MIKOSHIBA HISASHI , MURO NAOTSUGU

IPC分类号： C09B23/00 , B41J2/01 , B41M5/00 , B41M5/382 , B41M5/385 , B41M5/388 , B41M5/39 , B41M5/50 , B41M5/52 , C09B67/20 , C09B67/42 , C09D11/00 , C09D11/30 , G02B5/20 , G02B5/22 , G03F7/004 , G03G9/09

CPC分类号： B41M5/3854 , C09B23/0091 , C09B23/04 , C09D11/328 , G02B5/201 , G03G9/0914 , G03G9/0916 , G03G9/092 , Y10T428/24802