公开(公告)号：EP2545412A1

公开(公告)日：2013-01-16

申请号：EP11753463.6

申请日：2011-03-04

申请人： FUJIFILM Corporation

发明人： FUJII, Kana ,  TOMIGA, Takamitsu ,  FUJIMORI, Toru

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/2041

摘要： An actinic ray-sensitive or radiation-sensitive resin composition, and a resist film and a pattern forming method using the composition are provided, the composition including (A) a compound capable of decomposing by the action of an acid to increase the solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a basic compound; and (D) a specific compound containing at least two specific alicyclic hydrocarbon groups each substituted with a hydroxyl group.

摘要翻译： 本发明提供一种感光化射线性或感放射线性的树脂组合物，以及使用该组合物的抗蚀剂膜及图案形成方法，该组合物含有（A）能够通过酸的作用分解而提高 树脂（A）在碱性显影剂中; （B）在用光化射线或辐射照射时能够产生酸的化合物; （C）碱性化合物; 和（D）含有至少两个各自被羟基取代的特定脂环烃基的特定化合物。

公开(公告)号：EP4024131A1

公开(公告)日：2022-07-06

申请号：EP20857443.4

申请日：2020-08-13

申请人： FUJIFILM Corporation

发明人： HATAKEYAMA, Naoya ,  YONEKUTA, Yasunori ,  TOMIGA, Takamitsu ,  HIGASHI, Kohei ,  YOSHINO, Fumihiro

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, (B) a photoacid generator, and an anion (P) which is one or more anions selected from the group consisting of NO 3 - , SO 4 2- , Cl - , and Br-, in which a content of the anion (P) is from 0.01 ppb to 100 ppm with respect to a total mass of the actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film formed from the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.

公开(公告)号：EP2260352A1

公开(公告)日：2010-12-15

申请号：EP09727087.0

申请日：2009-03-31

申请人： FUJIFILM Corporation

发明人： FUJII, Kana ,  TOMIGA, Takamitsu ,  TSUCHIHASHI, Toru ,  MIZUTANI, Kazuyoshi ,  YOKOYAMA, Jiro ,  SUGIYAMA, Shinichi ,  HIRANO, Shuji ,  FUJIMORI, Toru

IPC分类号： G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  G03F7/004 ,  H01L21/027

CPC分类号： G03F7/0392 ,  C08F8/12 ,  C08F12/22 ,  C08F214/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/32 ,  C08F2220/282 ,  C08K5/375 ,  C08K5/42 ,  C08L33/068 ,  C08L51/04 ,  C08L67/02 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F2220/1825 ,  C08F2220/185 ,  C08F220/14

摘要： According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.