公开(公告)号：EP2550562A1

公开(公告)日：2013-01-30

申请号：EP11759653.6

申请日：2011-03-25

申请人： FUJIFILM Corporation

发明人： KATO, Keita ,  TARUTANI, Shinji ,  TSUCHIHASHI, Toru ,  KAMIMURA, Sou ,  ENOMOTO, Yuichiro ,  FUJII, Kana ,  IWATO, Kaoru ,  KATAOKA, Shohei ,  MIZUTANI, Kazuyoshi

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC分类号： G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/2041 ,  Y10T428/24

摘要： Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and ΔSP thereof represented by formula (1) below is 2.5 (MPa)
1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent. ΔSP=SP
F -SP
I •••(1)

摘要翻译： 提供一种形成图案的方法，确保优异的曝光宽容度（EL）和焦点宽容度（焦深DOF）。 形成图案的方法包括（A）由抗蚀剂组合物形成膜，抗蚀剂组合物，（B）使膜曝光，和（C）使用含有有机溶剂的显影剂使曝光的膜显影，从而形成 消极的模式。 该抗蚀剂组合物含有（a）被酸化时分解而构成的树脂，下述式（1）所示的ΔSP为2.5（MPa）1/2以上，（b） 当暴露于光化射线或辐射时产生酸，和（c）溶剂。 ΔSP= SP F-SP I ...（1）

公开(公告)号：EP2177952A1

公开(公告)日：2010-04-21

申请号：EP08792125.0

申请日：2008-08-01

申请人： Fujifilm Corporation

发明人： TSUCHIHASHI, Toru ,  MIZUTANI, Kazuyoshi ,  HIRANO, Shuji ,  YOKOYAMA, Jiro ,  SUGIYAMA, Shinichi

IPC分类号： G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  H01L21/027

CPC分类号： G03F7/0397 ,  C08F8/12 ,  C08F12/22 ,  C08F12/24 ,  C08F212/14 ,  C08F2800/10 ,  G03F7/0045 ,  G03F7/0392 ,  Y10S430/114 ,  Y10S430/146 ,  C08F220/18 ,  C08F2220/1825 ,  C08F220/14

摘要： A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a pattern forming method using the composition. A represents a group capable of decomposing and leaving by the action of an acid, each R 1 independently represents hydrogen or a methyl group, R 2 represents a phenyl group or a cyclohexyl group, m represents 1 or 2, and n represents an integer of 0 to 2. By virtue of this construction, a resist composition ensuring high resolution, good pattern profile, sufficient depth of focus, little defects after development, and sufficiently high plasma etching resistance is provided.

公开(公告)号：EP2138898B1

公开(公告)日：2014-05-21

申请号：EP08740284.8

申请日：2008-04-11

申请人： FUJIFILM Corporation

发明人： TARUTANI, Shinji ,  TSUBAKI, Hideaki ,  MIZUTANI, Kazuyoshi ,  WADA, Kenji ,  HOSHINO, Wataru

IPC分类号： G03F7/30 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027 ,  G03F7/004 ,  G03F7/20 ,  G03F7/40

CPC分类号： G03F7/40 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325

公开(公告)号：EP2539769A1

公开(公告)日：2013-01-02

申请号：EP11747578.0

申请日：2011-02-24

申请人： FUJIFILM Corporation

发明人： IWATO, Kaoru ,  KATAOKA, Shohei ,  TARUTANI, Shinji ,  KAMIMURA, Sou ,  KATO, Keita ,  ENOMOTO, Yuichiro ,  MIZUTANI, Kazuyoshi ,  TSUCHIHASHI, Toru ,  FUJII, Kana

IPC分类号： G03F7/038 ,  G03F7/32

CPC分类号： G03F7/30 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38 ,  Y10T428/24479

摘要： Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

公开(公告)号：EP2260352A1

公开(公告)日：2010-12-15

申请号：EP09727087.0

申请日：2009-03-31

申请人： FUJIFILM Corporation

发明人： FUJII, Kana ,  TOMIGA, Takamitsu ,  TSUCHIHASHI, Toru ,  MIZUTANI, Kazuyoshi ,  YOKOYAMA, Jiro ,  SUGIYAMA, Shinichi ,  HIRANO, Shuji ,  FUJIMORI, Toru

IPC分类号： G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  G03F7/004 ,  H01L21/027

CPC分类号： G03F7/0392 ,  C08F8/12 ,  C08F12/22 ,  C08F214/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/32 ,  C08F2220/282 ,  C08K5/375 ,  C08K5/42 ,  C08L33/068 ,  C08L51/04 ,  C08L67/02 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F2220/1825 ,  C08F2220/185 ,  C08F220/14

摘要： According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.

公开(公告)号：EP2252915A1

公开(公告)日：2010-11-24

申请号：EP09720706.2

申请日：2009-03-13

申请人： FUJIFILM Corporation

发明人： MIZUTANI, Kazuyoshi ,  YOKOYAMA, Jiro ,  SUGIYAMA, Shinichi

IPC分类号： G03F7/004 ,  C08F12/04 ,  C08F20/10 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0045 ,  C08F8/12 ,  C08F12/24 ,  C09D125/14 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  C08F212/14 ,  C08F2220/1825

摘要： A resist composition and a pattern forming method using the composition are provided, the resist composition including: (A) a resin that decomposes by an action of an acid to increase a solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a compound represented by formula (C1); and (D) a solvent: wherein n represents an integer of 1 to 6; w represents an integer of 1 to 6; p represents an integer of 1 to 6; m represents an integer of 1 to 6; Ra, Rb, Rc and Rd each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group, provided that Ra and Rb may combine together to form a ring, and Rc and Rd may combine together to form a ring.

公开(公告)号：EP2138898A1

公开(公告)日：2009-12-30

申请号：EP08740284.8

申请日：2008-04-11

申请人： Fujifilm Corporation

发明人： TARUTANI, Shinji ,  TSUBAKI, Hideaki ,  MIZUTANI, Kazuyoshi ,  WADA, Kenji ,  HOSHINO, Wataru

IPC分类号： G03F7/30 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC分类号： G03F7/40 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325

摘要： A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

摘要翻译： 一种图案形成方法，包括施加抗蚀剂组合物的步骤，所述抗蚀剂组合物在负光谱显影剂中的溶解度随着光化射线或辐射照射而降低，并且其含有具有脂环族烃结构和分散度为1.7以下并且能够增加的树脂 通过酸的作用的极性，曝光步骤和使用负色调显影剂的显影步骤; 用于该方法的抗蚀剂组合物; 并且提供了用于该方法的显影剂和冲洗溶液，由此可以形成线边缘粗糙度降低且尺寸均匀性高的图案。