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公开(公告)号：EP4129975A1
公开(公告)日：2023-02-08
申请号：EP21781265.0
申请日：2021-03-02
申请人： FUJIFILM Corporation
IPC分类号： C07C309/17 , C07C381/12 , C08F220/26 , G03F7/004 , G03F7/038 , G03F7/039
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition, with which a pattern having excellent LWR performance can be obtained. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition includes a salt including a sulfonium cation having an aryl group substituted with an acid-decomposable group-containing group and having at least three fluorine atoms; and a resin having a polarity that increases through decomposition by an action of an acid, in which the acid-decomposable group-containing group includes a group having a polarity that increases through decomposition by an action of an acid, and the acid-decomposable group-containing group includes no fluorine atom.
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公开(公告)号：EP4166537A1
公开(公告)日：2023-04-19
申请号：EP21822341.0
申请日：2021-05-19
申请人： FUJIFILM Corporation
IPC分类号： C07C309/07 , C07C309/17 , C07C309/65 , C07C311/09 , C07C311/48 , C07C311/53 , C07C381/12 , C07D207/48 , C07D211/96 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20
摘要： A first object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having a good shape can be obtained. Furthermore, a second object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. In addition, a third object of the present invention is to provide a compound which can be suitably used in the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, an acid-decomposable resin having a weight-average molecular weight of 30,000 or less, and a solvent, and the compound that generates an acid upon irradiation with actinic rays or radiation includes a compound (I).-
公开(公告)号：EP3992181A1
公开(公告)日：2022-05-04
申请号：EP20831665.3
申请日：2020-06-01
申请人： FUJIFILM Corporation
发明人： USHIYAMA Aina , KOJIMA Masafumi , GOTO Akiyoshi , SHIRAKAWA Michihiro , KATO Keita , OKA Hironori
IPC分类号： C07C381/12 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition that is capable of obtaining a pattern having excellent LWR performance even in a case where the composition has been stored for a long period of time. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin.
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公开(公告)号：EP4159716A1
公开(公告)日：2023-04-05
申请号：EP21812472.5
申请日：2021-04-21
申请人： FUJIFILM Corporation
IPC分类号： C07C303/22 , C07C309/06 , C07C309/17 , C07C381/12 , C09K3/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be obtained, a resist film, a pattern forming method, a method for manufacturing an electronic device, a compound, and a method for producing the compound. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including a resin having a repeating unit having a group having a polarity that increases through decomposition by the action of an acid, in which the actinic ray-sensitive or radiation-sensitive resin composition further includes, in addition to the resin, a compound having at least one cation represented by General Formula (1), or the resin further has, in addition to the repeating unit, a repeating unit having the cation represented by General Formula (1).
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公开(公告)号：EP4166582A1
公开(公告)日：2023-04-19
申请号：EP21821095.3
申请日：2021-05-19
申请人： FUJIFILM Corporation
发明人： USHIYAMA Aina , TAKADA Akira , KOJIMA Masafumi , GOTO Akiyoshi , SHIRAKAWA Michihiro , KATO Keita
IPC分类号： C08F220/12 , C08F220/28 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20
摘要： An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be formed even after the composition is stored for a long period of time. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin of which polarity increases through decomposition by an action of an acid, and a compound that generates an acid upon irradiation with actinic rays or radiation, and the compound that generates an acid upon irradiation with actinic rays or radiation is selected from compounds (I) and (III).
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公开(公告)号：EP3988543A1
公开(公告)日：2022-04-27
申请号：EP20827917.4
申请日：2020-06-16
申请人： FUJIFILM Corporation
发明人： TAKADA Akira , GOTO Akiyoshi , KOJIMA Masafumi , USHIYAMA Aina
IPC分类号： C07D327/06 , C07D327/08 , C07D333/16 , C07D333/76 , C09K3/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition that is capable of forming a pattern having excellent LWR performance. Provided are a resist film and a pattern forming method, each using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device, using the pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of compounds (I) to (III), and a content of the compounds selected from the group consisting of the compounds (I) to (III) is more than 20.0% by mass with respect to a total solid content in the composition.
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