公开(公告)号：EP4166582A1

公开(公告)日：2023-04-19

申请号：EP21821095.3

申请日：2021-05-19

申请人： FUJIFILM Corporation

发明人： USHIYAMA Aina ,  TAKADA Akira ,  KOJIMA Masafumi ,  GOTO Akiyoshi ,  SHIRAKAWA Michihiro ,  KATO Keita

IPC分类号： C08F220/12 ,  C08F220/28 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

摘要： An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be formed even after the composition is stored for a long period of time. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin of which polarity increases through decomposition by an action of an acid, and a compound that generates an acid upon irradiation with actinic rays or radiation, and the compound that generates an acid upon irradiation with actinic rays or radiation is selected from compounds (I) and (III).

公开(公告)号：EP3605226A1

公开(公告)日：2020-02-05

申请号：EP18774945.2

申请日：2018-02-23

申请人： Fujifilm Corporation

发明人： SAKITA Kyohei ,  FUJITA Mitsuhiro ,  TANAKA Takumi ,  YAMAMOTO Keishi ,  GOTO Akiyoshi ,  KATO Keita

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039

摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent pattern line width roughness (LWR) and critical dimension uniformity (CDU). In addition, provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, for which the actinic ray-sensitive or radiation-sensitive resin composition is used. The actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.

公开(公告)号：EP4282887A1

公开(公告)日：2023-11-29

申请号：EP22742446.2

申请日：2022-01-07

申请人： FUJIFILM Corporation

发明人： KATO Keita ,  SHIRAKAWA Michihiro ,  TAKAHASHI Satomi ,  SHIMIZU Tetsuya

IPC分类号： C08F20/20 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32

摘要： Provided are a pattern forming method including (1) a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin (A) which is decomposed by action of acid to increase polarity and a compound (B) which generates an acid by irradiation with an actinic ray or a radiation, (2) a step of exposing the film, and (3) a step of subjecting the exposed film to at least one of development or rinsing with an organic treatment liquid containing butyl acetate and a hydrocarbon having 11 or more carbon atoms, in which a content of the hydrocarbon having 11 or more carbon atoms in the organic treatment liquid is 1% by mass or more and 35% by mass or less; a pattern forming method capable of obtaining a pattern having excellent in-plane uniformity of a line width by a method for manufacturing an electronic device including the pattern forming method; and a method for manufacturing an electronic device including the pattern forming method.

公开(公告)号：EP3992181A1

公开(公告)日：2022-05-04

申请号：EP20831665.3

申请日：2020-06-01

申请人： FUJIFILM Corporation

发明人： USHIYAMA Aina ,  KOJIMA Masafumi ,  GOTO Akiyoshi ,  SHIRAKAWA Michihiro ,  KATO Keita ,  OKA Hironori

IPC分类号： C07C381/12 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition that is capable of obtaining a pattern having excellent LWR performance even in a case where the composition has been stored for a long period of time. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin.

公开(公告)号：EP3605226A8

公开(公告)日：2020-04-01

申请号：EP18774945.2

申请日：2018-02-23

申请人： FUJIFILM Corporation

发明人： SAKITA Kyohei ,  FUJITA Mitsuhiro ,  TANAKA Takumi ,  YAMAMOTO Keishi ,  GOTO Akiyoshi ,  KATO Keita

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039

摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent pattern line width roughness (LWR) and critical dimension uniformity (CDU). In addition, provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, for which the actinic ray-sensitive or radiation-sensitive resin composition is used. The actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.