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公开(公告)号:EP0694175A1
公开(公告)日:1996-01-31
申请号:EP92919855.0
申请日:1992-09-24
IPC分类号: G02B6
CPC分类号: G02B6/3652 , G02B6/1221 , G02B6/2817
摘要: A coupling element for fiber-optic light guides has the following characteristic features: (a) at least three guiding channels for receiving the fiber-optic light guides are arranged in a plane and end in the coupling element; (b) the first and second guiding channels are spaced apart and form at their ends a spacing zone; (c) a beam deviating reflector is arranged in the spacing zone; (d) the beam deviating reflector is designed and arranged so that light irradiated into the fiber-optic light guide received in the first guiding channel is transmitted to the fiber-optic light guide received in the second guiding channel, whereas light that is irradiated into the fiber-optic light guide received in the second guiding channel is reflected at the beam deviating reflector; (e) the other guiding channel(s) are arranged so that the light reflected by the beam deviating reflector falls at least for the most part on the end of the fiber optic light guides received therein; (f) the coupling element forms a single, coherent component with the guiding channels and the beam deviating reflector. This coupling element is particularly useful for multimode-fibers, that can thus be laid and exchanged without complicated adjustment.
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公开(公告)号:EP0659286B1
公开(公告)日:1997-10-29
申请号:EP93919305.8
申请日:1993-09-09
发明人: EL-KHOLI, Aida , GÖTTERT, Jost , MOHR, Jürgen , KRIEG, Manfred
IPC分类号: G03F7/039 , C08F265/06
CPC分类号: G03F7/039 , C08F265/06 , C08F2/02
摘要: A casting resin composed of 65 to 95 % by weight methylmethacrylate (MMA) with a dissolved solids content from 5 to 35 % by weight polymethylmethacrylate (PMMA), with at least 30000 molecular weight and a weight average Mw which does not exceed 1.3 . 106, is used to produce a positive radiographic resist. A process is also disclosed for producing a radiographic resist, according to which a concentration of 0.2 to 0.4 % by weight azodiisobutyric acid dinitrile (AIBN) is used as initiator and a concentration of less than 0.1 % by weight mercaptane or a non-aromatic mercaptane derivate is used as regulator. The use of said casting resin and this production process allow radiographic resists to be obtained having improved microstructures after exposure to radiation and development.
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公开(公告)号:EP0720756B1
公开(公告)日:1997-06-18
申请号:EP94926193.7
申请日:1994-08-13
IPC分类号: G03F7/20
CPC分类号: G03F7/2022 , B29C64/135 , B29C2035/0844 , G03F7/00
摘要: The invention relates to a process for producing microstructure bodies tapering as the height increases so that sieves or nets, for example, can be formed by galvanic shaping, the apertures of which are smaller on one side than on the other. The process of the invention comprises the usual steps in the X-ray deep lithography on an X-ray resist; in addition, the X-ray resist is subjected to a second irradiation over the entire surface in which the characteristic dose limit is not attained in the X-ray resist.
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公开(公告)号:EP0500620B1
公开(公告)日:1996-11-27
申请号:EP90916248.9
申请日:1990-11-07
发明人: BLEY, Peter , HEIN, Herbert , MOHR, Jürgen , SCHOMBURG, Werner
IPC分类号: G03F7/36
摘要: In the process, negative moulds of the microstructures are produced from plastics material on an electrically conducting substrate by electron-beam lithography, X-ray lithography or microforming techniques, and the cavities in the negative moulds filled with metal by electrodeposition, using the electrically conducting substrate as an electrode. The invention proposes that, during the production of the negative moulds, a residual layer of plastics material be left on the electrically conducting substrate at the bottom of the mould cavities and, before filling the mould cavities with metal by electrodeposition, this plastics layer on the floor of the cavities is removed by reactive ion etching using ions accelerated perpendicularly towards the surface of the substrate.
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