VERFAHREN UND VORRICHTUNG ZUR INTERFEROMETRISCHEN PRÜFUNG
    4.
    发明公开
    VERFAHREN UND VORRICHTUNG ZUR INTERFEROMETRISCHEN PRÜFUNG 审中-公开
    VERFAHREN UND VORRICHTUNG ZUR INTERFEROMETRISCHENPRÜFUNG

    公开(公告)号:EP3224570A1

    公开(公告)日:2017-10-04

    申请号:EP15812971.8

    申请日:2015-11-26

    摘要: The invention relates to a method and a device for the interferometric testing of the shape and/or position of at least two optical functional surfaces (13, 14) using an interferometric testing structure comprising an interferometer (9), a beam-shaping optical element (1), and alignment marks (15, 16, 17, 18). The beam-shaping optical element (1) is used to generate alignment wave fronts and testing wave fronts which are transmitted to or reflected at the alignment marks (15, 16, 17, 18) and/or the optical functional surfaces (13, 14), whereby measurement wave fronts are generated. The method and the device allow a measurement of the position of the optical functional surfaces (13, 14) with respect to one another and/or with respect to the alignment marks (15, 16, 17, 18) and a determination of shape and/or positional deviations of the optical functional surfaces (13, 14) from the target geometry and/or position of said surfaces by analyzing the measurement wave fronts in the interferometer (9).

    摘要翻译: 本发明涉及一种使用干涉测试结构对至少两个光学功能表面(13,14)的形状和/或位置进行干涉测试的方法和设备,所述干涉测试结构包括干涉仪(9),束成形光学元件 (1)和对准标记(15,16,17,18)。 光束整形光学元件(1)用于产生对准波前和测试波阵面,所述波阵面被传输到或反射在对准标记(15,16,17,18)和/或光学功能表面(13,14 ),由此产生测量波阵面。 该方法和装置允许测量光学功能表面(13,14)相对于彼此和/或相对于对准标记(15,16,17,18)的位置以及确定形状和 /或通过分析干涉仪(9)中的测量波阵面,光学功能表面(13,14)与目标几何形状和/或所述表面的位置的位置偏差。