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    NON-INTERFEROMETRIC, NON-ITERATIVE COMPLEX AMPLITUDE READING METHOD AND APPARATUS
    4.
    发明公开
    NON-INTERFEROMETRIC, NON-ITERATIVE COMPLEX AMPLITUDE READING METHOD AND APPARATUS 审中-实审

    公开(公告)号：EP4343448A1

    公开(公告)日：2024-03-27

    申请号：EP23174133.1

    申请日：2023-05-18

    申请人： Fujian Normal University

    发明人： HAO, Jianying ,  TAN, Xiaodi ,  LIN, Xiao ,  REN, Yuhong

    IPC分类号： G03H1/08 ,  G03H1/04 ,  G06N3/045 ,  G06N3/08 ,  G06N3/0464 ,  G01J9/02 ,  G06T7/00 ,  G06T7/55 ,  G06V10/82

    摘要： The present invention discloses a non-interferometric, non-iterative complex amplitude reading method and apparatus. The reading method includes the following steps: diffracting a light beam containing amplitude information and phase information to obtain a diffraction pattern with intensity variations; constructing a diffraction intensity-complex amplitude model and training it based on the correlation between the diffraction pattern and amplitude information and phase information, and applying the trained model directly to new diffraction images to obtain amplitude information and phase information. The method can achieve detection of complex amplitude information, including amplitude and phase, from a single diffraction image, improve the stability and accuracy of phase reading results, increase the calculation speed, and simplify the optical system. It is suitable for applications in holographic storage, biomedical image processing, and microscopic imaging, among others.

    HOLOGRAPHIC METROLOGY APPARATUS AND METHOD
    5.
    发明公开
    HOLOGRAPHIC METROLOGY APPARATUS AND METHOD 审中-公开

    公开(公告)号：EP4332678A1

    公开(公告)日：2024-03-06

    申请号：EP22193868.1

    申请日：2022-09-05

    申请人： ASML Netherlands B.V.

    发明人： BUIJS, Robin, Daniel ,  VAN SCHAIJK, Theodorus, Thomas, Marinus ,  DEN BOEF, Arie, Jeffrey

    IPC分类号： G03F7/20 ,  G03H1/04 ,  G03H1/08

    摘要： A method of determining a parameter of interest of a structure comprising at least one first feature oriented along a first axis of a structure coordinate system and at least one second feature oriented along a second axis of the structure coordinate system. The method comprising: illuminating the first feature and the second feature with first illumination from a first direction oblique to said first axis and second axis, so as to generate first scattered radiation from the first feature and second scattered radiation from the second feature, detecting a first interference pattern formed by interference between a portion of the first scattered radiation and first reference illumination; detecting a second interference pattern formed by interference between a portion of the second scattered radiation and the first reference illumination; and determining the parameter of interest of the structure using the first interference pattern and the second interference pattern.