摘要:
The purpose of the present invention is to provide a support for a lithographic printing plate. The support has excellent scratch resistance and with the support, an original lithographic printing plate that has excellent printing durability when used as a lithographic printing plate and exhibits excellent on-machine developability can be obtained. For this support for a lithographic printing plate, which is provided with an aluminum plate and an anodized aluminum film thereon and which has micropores in the anodized film that extend in the depth direction from the surface that is on the opposite side from the aluminum plate: the micropores are configured from a large diameter hole section that extends from the surface of the anodized film to a mean depth of 75 - 120 nm (depth (A)) and a small diameter hole section that connects with the bottom of the large diameter hole section and extends from the connection position to a mean depth of 900-2000 nm; the mean diameter at the anodized film surface of the large diameter hole section is 10 nm to less than 30 nm, and the mean diameter and the depth (A) satisfy the relationship (depth (A)/mean diameter) = greater than 4.0 to 12.0; and the mean diameter at the connection position of the small diameter pore section is greater than 0 and less than 10 nm.
摘要:
The purpose of the present invention is to provide a support for a lithographic printing plate. The support has excellent scratch resistance and with the support, an original lithographic printing plate that has excellent printing durability when used as a lithographic printing plate and exhibits excellent on-machine developability can be obtained. For this support for a lithographic printing plate, which is provided with an aluminum plate and an anodized aluminum film thereon and which has micropores in the anodized film that extend in the depth direction from the surface that is on the opposite side from the aluminum plate: the micropores are configured from a large diameter hole section that extends from the surface of the anodized film to a mean depth of 75 - 120 nm (depth (A)) and a small diameter hole section that connects with the bottom of the large diameter hole section and extends from the connection position to a mean depth of 900-2000 nm; the mean diameter at the anodized film surface of the large diameter hole section is 10 nm to less than 30 nm, and the mean diameter and the depth (A) satisfy the relationship (depth (A)/mean diameter) = greater than 4.0 to 12.0; and the mean diameter at the connection position of the small diameter pore section is greater than 0 and less than 10 nm.