公开(公告)号：EP3208365B1

公开(公告)日：2018-11-28

申请号：EP15851302.8

申请日：2015-10-07

申请人： Fujifilm Corporation

发明人： KOMATSU Hiroshi

IPC分类号： C25F3/14 ,  C25D9/12 ,  C25F3/04 ,  C25D11/04 ,  C25D11/20 ,  C25D11/02 ,  H01M4/66 ,  H01M4/70

CPC分类号： H01M4/80 ,  C23C18/1651 ,  C23C18/34 ,  C23C18/36 ,  C23C18/54 ,  C25D3/38 ,  C25D9/12 ,  C25D11/024 ,  C25D11/04 ,  C25D11/08 ,  C25D11/20 ,  C25D11/24 ,  C25F3/04 ,  C25F3/14 ,  H01M4/66 ,  H01M4/661 ,  H01M4/70

摘要： An object is to provide an aluminum plate having favorable coating properties and favorable adhesiveness to active materials and a method for manufacturing an aluminum plate. The aluminum plate having a plurality of through holes that penetrate in a thickness direction includes through holes A which have an average opening diameter of the through holes of 0.1 µm or more and less than 100 µm and have a shape in which a maximum diameter Ra is formed inside and the maximum diameter Ra and a minimum diameter Rb satisfy 1>Rb/Ra‰¥0.1.

公开(公告)号：EP2878452B1

公开(公告)日：2018-11-28

申请号：EP13823769.8

申请日：2013-07-26

申请人： Fujifilm Corporation

发明人： TAGAWA Yoshiharu ,  KUROKAWA Shinya ,  MATSUURA Atsushi ,  MIYAGAWA Yuya ,  SAWADA Hirokazu ,  NISHINO Atsuo

IPC分类号： B41N3/03 ,  B41N1/14 ,  G03F7/00 ,  G03F7/09 ,  C25D11/12 ,  C25D11/24

CPC分类号： B41N1/14 ,  B41N1/083 ,  B41N3/034 ,  C25D11/005 ,  C25D11/08 ,  C25D11/12 ,  C25D11/16 ,  C25D11/24 ,  C25F3/04

摘要： The purpose of the present invention is to provide a support for a lithographic printing plate. The support has excellent scratch resistance and with the support, an original lithographic printing plate that has excellent printing durability when used as a lithographic printing plate and exhibits excellent on-machine developability can be obtained. For this support for a lithographic printing plate, which is provided with an aluminum plate and an anodized aluminum film thereon and which has micropores in the anodized film that extend in the depth direction from the surface that is on the opposite side from the aluminum plate: the micropores are configured from a large diameter hole section that extends from the surface of the anodized film to a mean depth of 75 - 120 nm (depth (A)) and a small diameter hole section that connects with the bottom of the large diameter hole section and extends from the connection position to a mean depth of 900-2000 nm; the mean diameter at the anodized film surface of the large diameter hole section is 10 nm to less than 30 nm, and the mean diameter and the depth (A) satisfy the relationship (depth (A)/mean diameter) = greater than 4.0 to 12.0; and the mean diameter at the connection position of the small diameter pore section is greater than 0 and less than 10 nm.

公开(公告)号：EP2835450B1

公开(公告)日：2018-02-21

申请号：EP13876766.0

申请日：2013-09-16

申请人： Guangdong Janus Intelligent Group Corporation Limited

发明人： ZHANG, Shaohua ,  LEI, Ting ,  WANG, Changming ,  LAI, Yuhua

IPC分类号： C25F3/04 ,  B32B7/08 ,  B32B15/04

CPC分类号： C25F3/04

摘要： A micro-nano processing method of an aluminum or aluminum alloy surface includes a step of placing aluminum or an aluminum alloy as an anode in an electrolyte containing hydrochloric acid, sulfuric acid, phosphoric acid, and an etching inhibitor for DC electrochemical etching, where the concentration of hydrochloric acid is 1.5 to 3 mol/L, the concentration of sulfuric acid is 0.9 to 1.2 mol/L, and the concentration of phosphoric acid is 0.6 to 1 mol/L. A method for integrating aluminum or an aluminum alloy and a plastic includes the following steps: forming a micro-nano porous structure on an aluminum or aluminum alloy surface by using the micro-nano processing method; and closely combining a plastic and the aluminum or aluminum alloy surface by means of the micro-nano porous structure. An aluminum or aluminum alloy structure has a micro-nano porous structure formed on the surface of the aluminum or aluminum alloy structure by using the micro-nano processing method. By using this method, the micro-nano hole processing efficiency is high, the quality is high, and the method is environmental friendly.

公开(公告)号：EP3208365A1

公开(公告)日：2017-08-23

申请号：EP15851302.8

申请日：2015-10-07

申请人： Fujifilm Corporation

发明人： KOMATSU Hiroshi

IPC分类号： C25F3/14 ,  C25D9/12 ,  C25F3/04 ,  H01M4/66 ,  H01M4/70

CPC分类号： H01M4/80 ,  C23C18/1651 ,  C23C18/34 ,  C23C18/36 ,  C23C18/54 ,  C25D3/38 ,  C25D9/12 ,  C25D11/024 ,  C25D11/04 ,  C25D11/08 ,  C25D11/20 ,  C25D11/24 ,  C25F3/04 ,  C25F3/14 ,  H01M4/66 ,  H01M4/661 ,  H01M4/70

摘要： An object is to provide an aluminum plate having favorable coating properties and favorable adhesiveness to active materials and a method for manufacturing an aluminum plate. The aluminum plate having a plurality of through holes that penetrate in a thickness direction includes through holes A which have an average opening diameter of the through holes of 0.1 µm or more and less than 100 µm and have a shape in which a maximum diameter Ra is formed inside and the maximum diameter Ra and a minimum diameter Rb satisfy 1>Rb/Ra≥0.1.

摘要翻译： 目的是提供具有良好的涂布性和对活性材料的良好粘附性的铝板以及用于制造铝板的方法。 具有沿厚度方向贯通的多个贯通孔的铝板包括贯通孔A，贯通孔A的贯通孔的平均开口径为0.1μm以上且小于100μm，具有最大直径Ra为 形成在内部，并且最大直径Ra和最小直径Rb满足1> Rb /Ra≥0.1。

公开(公告)号：EP2343402B1

公开(公告)日：2017-08-02

申请号：EP09817844.5

申请日：2009-09-30

申请人： FUJIFILM Corporation

发明人： HOTTA, Hisashi ,  HIROKAWA, Tsuyoshi

IPC分类号： C25F7/00 ,  C25F3/04

CPC分类号： C25F3/04 ,  B41N3/034 ,  C25D5/18 ,  C25D7/0607 ,  C25D7/0635 ,  C25D11/005 ,  C25D11/024 ,  C25D11/04 ,  C25D11/18 ,  C25F7/00

公开(公告)号：EP2835450A4

公开(公告)日：2015-12-09

申请号：EP13876766

申请日：2013-09-16

申请人： JANUS DONGGUAN PREC COMPONENTS

发明人： ZHANG SHAOHUA ,  LEI TING ,  WANG CHANGMING ,  LAI YUHUA

IPC分类号： C25F3/04 ,  B32B7/08 ,  B32B15/04

CPC分类号： C25F3/04

摘要： A micro-nano processing method of an aluminum or aluminum alloy surface includes a step of placing aluminum or an aluminum alloy as an anode in an electrolyte containing hydrochloric acid, sulfuric acid, phosphoric acid, and an etching inhibitor for DC electrochemical etching, where the concentration of hydrochloric acid is 1.5 to 3 mol/L, the concentration of sulfuric acid is 0.9 to 1.2 mol/L, and the concentration of phosphoric acid is 0.6 to 1 mol/L. A method for integrating aluminum or an aluminum alloy and a plastic includes the following steps: forming a micro-nano porous structure on an aluminum or aluminum alloy surface by using the micro-nano processing method; and closely combining a plastic and the aluminum or aluminum alloy surface by means of the micro-nano porous structure. An aluminum or aluminum alloy structure has a micro-nano porous structure formed on the surface of the aluminum or aluminum alloy structure by using the micro-nano processing method. By using this method, the micro-nano hole processing efficiency is high, the quality is high, and the method is environmental friendly.

公开(公告)号：EP2878452A1

公开(公告)日：2015-06-03

申请号：EP13823769.8

申请日：2013-07-26

申请人： Fujifilm Corporation

发明人： TAGAWA Yoshiharu ,  KUROKAWA Shinya ,  MATSUURA Atsushi ,  MIYAGAWA Yuya ,  SAWADA Hirokazu ,  NISHINO Atsuo

IPC分类号： B41N3/03 ,  B41N1/14 ,  G03F7/00 ,  G03F7/09

CPC分类号： B41N1/14 ,  B41N1/083 ,  B41N3/034 ,  C25D11/005 ,  C25D11/08 ,  C25D11/12 ,  C25D11/16 ,  C25D11/24 ,  C25F3/04

摘要： The purpose of the present invention is to provide a support for a lithographic printing plate. The support has excellent scratch resistance and with the support, an original lithographic printing plate that has excellent printing durability when used as a lithographic printing plate and exhibits excellent on-machine developability can be obtained. For this support for a lithographic printing plate, which is provided with an aluminum plate and an anodized aluminum film thereon and which has micropores in the anodized film that extend in the depth direction from the surface that is on the opposite side from the aluminum plate: the micropores are configured from a large diameter hole section that extends from the surface of the anodized film to a mean depth of 75 - 120 nm (depth (A)) and a small diameter hole section that connects with the bottom of the large diameter hole section and extends from the connection position to a mean depth of 900-2000 nm; the mean diameter at the anodized film surface of the large diameter hole section is 10 nm to less than 30 nm, and the mean diameter and the depth (A) satisfy the relationship (depth (A)/mean diameter) = greater than 4.0 to 12.0; and the mean diameter at the connection position of the small diameter pore section is greater than 0 and less than 10 nm.

摘要翻译： 本发明的目的是提供一种用于平版印刷版的支持体。 该载体具有确实具有优异的印刷耐久性当作为平版印刷版使用，并且显示出优异的机上显影性，可以得到优异的耐擦伤性和与支撑，原始平版印刷版的。 用于平版印刷印版这种支持，所有这一切都在铝板和薄膜在其上的阳极化的铝上设置有和其中在阳极氧化具有微孔薄膜并延伸在距表面的深度方向上所做的是在从铝板的相反侧： 微孔是从大直径孔部，被配置做了从阳极氧化的表面延伸胶片至75的平均深度为120nm（深度（A））和小直径孔部做了与大直径孔的底部连接 部分和从连接位置到900-2000纳米的平均深度延伸; 在大直径孔部的阳极氧化膜表面的平均直径为10nm〜小于30nm，平均直径和深度（A）满足关系（深度（A）/平均直径）=大于4.0至 12.0; 并在小直径孔部的连接位置的平均直径是大于0且小于10纳米。

公开(公告)号：EP2551385A2

公开(公告)日：2013-01-30

申请号：EP12178250.2

申请日：2012-07-27

申请人： Fujifilm Corporation

发明人： Komatsu, Hiroshi ,  Hotta, Hisashi

IPC分类号： C25F3/04

CPC分类号： C25F3/04 ,  B41N3/034

摘要： An aluminum support is manufactured at lower cost by efficiently performing a surface roughening treatment with dispersed pits formed on the aluminum support. In an electrolytic surface roughening treatment method for performing an electrolytic surface roughening treatment on a strip-shaped metal as being conveyed in an acidic electrolytic solution by applying an alternating waveform voltage, the method includes a step of applying a negative voltage to the metal plate at least once while the alternating waveform voltage is being applied so that the metal plate assumes a negative polarity.

摘要翻译： 铝载体被有效地执行与形成在铝载体上分散的凹坑的表面粗糙化处理以较低的成本制造。 在电解粗面化处理方法，用于执行对电解粗面化上的带状金属处理，通过施加交变波形电压在酸性电解液被输送中，该方法包括在施加负电压到所述金属板的一个步骤 至少一次而交替波形电压被施加所以没有金属板übernimmt负极性。

公开(公告)号：EP2427584A1

公开(公告)日：2012-03-14

申请号：EP10709557.2

申请日：2010-03-22

申请人： Novelis, Inc.

发明人： COLEMAN, Andrew ,  WRIGHT, David, S. ,  KAMP, Nicolas ,  BROWN, Jeremy Mark

IPC分类号： C22C21/10 ,  B41N1/08 ,  B41N3/03

CPC分类号： C22C21/10 ,  B41N1/083 ,  B41N3/034 ,  C25F3/04

摘要： The invention relates to an aluminium alloy lithographic sheet product having an enhanced electrolytic graining response in which Zn between 0.5 and 2.5 wt % is added to an aluminium base alloy, in particular an alloy of the 1XXX, 3XXX or 5XXX series alloys. The invention also relates to a method of producing a lithographic sheet product.

公开(公告)号：EP2384100A2

公开(公告)日：2011-11-02

申请号：EP11164058.7

申请日：2011-04-28

申请人： Fujifilm Corporation

发明人： Hotta, Yoshinori ,  Hatanaka, Yusuke

IPC分类号： H05K1/05 ,  C25D11/12 ,  C25D11/16 ,  H01L33/64 ,  H01L33/60

CPC分类号： H05K1/053 ,  C25D7/08 ,  C25D11/04 ,  C25D11/12 ,  C25D11/18 ,  C25F3/04 ,  H01L33/60 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2924/00011 ,  H01L2924/01015 ,  H01L2924/01047 ,  H01L2924/1301 ,  H01L2924/30107 ,  H01L2924/3011 ,  H05K3/1216 ,  H05K3/125 ,  H05K2201/2054 ,  H05K2203/0257 ,  H05K2203/0315 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/01005 ,  H01L2924/01033

摘要： An insulated light-reflective substrate, comprising a substrate and an anodized film provided on the surface of the substrate, wherein: the substrate has at its surface an aluminum alloy layer of a thickness of not less than 10 µm; the aluminum alloy layer has an aluminum purity of 99.9% by weight or higher, with the total content of Si and Fe in the layer being not more than 0.005% by weight, and the content of inevitable impurities in the layer as components other than Al, Si, Fe, Ga and Zn being not more than 0.01% by weight; the anodized film has micropores each extending from the surface of the film in the direction of thickness; and the ratio of center line length to depth of the micropores is 1.0 to 1.2.

摘要翻译： 一种绝缘光反射基板，包括设置在所述基板的表面上的基板和阳极氧化膜，其中：所述基板在其表面上具有不小于10μm的厚度的铝合金层; 铝合金层的铝纯度为99.9重量％以上，层内的Si和Fe的总含量为0.005重量％以下，作为Al以外的成分的层中的不可避免的杂质含量 ，Si，Fe，Ga和Zn不大于0.01重量％; 阳极氧化膜具有从膜表面沿厚度方向延伸的微孔; 中心线长度与微孔深度之比为1.0〜1.2。