公开(公告)号：EP2037345A1

公开(公告)日：2009-03-18

申请号：EP07766937.2

申请日：2007-06-13

申请人： Fujikin Incorporated

发明人： NAGASE, Masaaki ,  DOHI, Ryousuke ,  IKEDA, Nobukazu ,  NISHINO, Kouji ,  HIRATA, Kaoru ,  SUGITA, Katsuyuki ,  MATSUMOTO, Atsushi

IPC分类号： G05D7/06

CPC分类号： G05D7/0635 ,  G01F1/36 ,  G01F15/005 ,  G01F15/022

摘要： It has been found to be disadvantageous that, with a conventional pressure type flow control apparatus, it is not possible to determine the state of a valve on the downstream side of a throttle mechanism with a flow rate output signal due to the structural reason of the apparatus. To overcome the difficulty, the determination of whether a valve on the downstream side of a throttle mechanism is open is achieved at ease using the state of changes of a flow rate output signal while a pressure type flow control apparatus is in operation.
With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe to be inputted to a pressure type flow control apparatus is changed to detect the magnitude ΔV of changes of a flow rate output signal Qo from a pressure type flow control apparatus while said flow rate setting value Qe changes so that it is determined either that a valve on the downstream side of a throttle mechanism is opening normally in the case that the magnitude ΔV of changes of said flow rate output signal Qo is found to be above the predetermined value, or that the releasing operations are malfunctioning in the case that the magnitude ΔV of changes is found to be below the predetermined value.

摘要翻译： 已发现不利的是，在以往的压力式流量控制装置，它是不可能的确定性矿上用的流量输出信号的节流机构下游侧阀的状态由于该结构的原因 设备。 为了克服困难，是否上的节流机构下游侧阀打开使用流量输出信号的变化的状态，同时压力式流量控制装置是在操作放心实现该确定。 用压力式流量控制装置，在节流机构下游侧阀被释放，并且流量设定值Qe以输入到一个压力式流量控制装置被改变，以检测流量的变化幅度“V 率输出信号QO来自压力式流量控制装置，而所述流量设定值Qe变动，从而做到了为确定性开采无论做了节流机构下游侧阀的情况下正常地打开并的变化幅度“V 上述流量输出信号QO被发现是高于预定值，或做的开放动作是的情况下故障确实大小“的变化的V被认为是低于预定值。

公开(公告)号：EP1921530A1

公开(公告)日：2008-05-14

申请号：EP06783162.8

申请日：2006-08-28

申请人： Fujikin Incorporated

发明人： NAGASE, Masaaki ,  DOHI, Ryousuke ,  IKEDA, Nobukazu ,  NISHINO, Kouji ,  HIRATA, Kaoru ,  SUGITA, Katsuyuki ,  MATSUMOTO, Atsushi

IPC分类号： G05D7/06 ,  G01F1/00 ,  G01F1/42 ,  G01M3/04

CPC分类号： G01F1/42 ,  F16K37/0091 ,  G05D7/0635

摘要： It is so made that abnormality of malfunction and sheet leaks occurring with a plurality of valves incorporated into a fluid supply line using a flow rate control apparatus can be checked easily, promptly and accurately by means of using operations of a flow rate control apparatus possessing a pressure sensor.
Specifically, with a fluid supply line provided with a flow rate control apparatus possessing a pressure sensor equipped with a flow rate setting mechanism, a flow rate/pressure display mechanism and/or a flow rate self-diagnosis mechanism, abnormality of control valves, installed with the afore-mentioned flow rate control apparatus and on the upstream side and downstream side thereof, is detected by using the afore-mentioned pressure value displayed and/or the value diagnosed with a self-diagnosis mechanism of the afore-mentioned flow rate control apparatus.

摘要翻译： 就这样制成没有故障，并且片材的泄漏与使用流量控制装置并入到流体供应管线阀发生的多个异常可以容易地检查，及时，准确地通过装置设定使用的流量控制装置波塞的动作唱的 压力传感器。 具体而言，设置有流量控制装置波塞一个流体供应管线唱配备有流量设定机构，流量/压力显示机构和/或流量自诊断机构，控制阀的异常的压力传感器，安装 与前述流量控制装置和在上游侧和下游侧中，通过使用显示前述压力值和/或诊断患有前述流量控制的自诊断机构的值来检测 设备。

公开(公告)号：EP1918799A1

公开(公告)日：2008-05-07

申请号：EP06746185.5

申请日：2006-05-10

申请人： FUJIKIN INCORPORATED ,  National University Corporation Tohoku Unversity

发明人： OHMI, Tadahiro ,  NISHINO, Kouji ,  DOHI, Ryousuke ,  IKEDA, Nobukazu ,  NAGASE, Masaaki ,  HIRATA, Kaoru ,  SUGITA, Katsuyuki ,  SHINOHARA, Tsutomu ,  HIROSE, Takashi ,  IMAI, Tomokazu ,  YOSHIDA, Toshihide ,  TANAKA, Hisashi

IPC分类号： G05D7/06 ,  F16K27/00 ,  F16L55/00 ,  G01F1/42

CPC分类号： F16K27/003 ,  F16L55/02718 ,  G01F1/36 ,  G01F15/001 ,  G01F15/005 ,  G05D7/0635

摘要： The present invention makes it possible for a flow rate to be controlled to be switched easily by means of an orifice being changed conveniently without disassembling or assembling a pressure type flow rate control apparatus.
An orifice changeable pressure type flow rate control apparatus of the present invention is so constituted that a valve body (23) of a control valve (2) for a pressure type flow rate control apparatus (A) is installed between an inlet side fitting block (39) provided with a coupling part of a fluid supply pipe and an outlet side fitting block (43) provided with a coupling part of a fluid takeout pipe; a fluid inlet side of the valve body (23) and the afore-mentioned inlet side fitting block (39), and also a fluid outlet side of the afore-mentioned valve body (23) and the afore-mentioned outlet side fitting block (43) are detachably and hermitically connected, respectively, so that a flow passage for gases through the afore-mentioned control valve (2) is formed; and, a gasket type orifice (38) for a pressure type flow rate control apparatus (A) is removably inserted between a gasket type orifice insertion hole (42c) provided on the outlet side of the afore-mentioned valve body (23) and a gasket type orifice insertion hole (43b) of the outlet side fitting block (43b).

摘要翻译： 本发明通过在不拆卸或组装压力式流量控制装置的情况下方便地改变孔口，可以容易地控制流量的切换。 本发明的节流孔可变压力型流量控制装置的特征在于，在压力式流量控制装置（A）的控制阀（2）的阀体（23）之间， 39）设置有流体供给管的联接部和设置有流体取出管的联接部的出口侧配件块（43） 阀体（23）和前述入口侧配件块（39）的流体入口侧以及上述阀体（23）的流体出口侧和上述出口侧配件块（ 43）分别可拆卸地和隐蔽地连接，从而形成用于通过上述控制阀（2）的气体的流动通道; 并且用于压力式流量控制装置（A）的垫圈型孔口（38）可移除地插入设置在上述阀体（23）的出口侧的垫圈型孔插入孔（42c）和 出口侧装配块（43b）的垫圈型孔插入孔（43b）。

公开(公告)号：EP2034379A1

公开(公告)日：2009-03-11

申请号：EP07766936.4

申请日：2007-06-13

申请人： Fujikin Incorporated

发明人： HIRATA, Kaoru ,  SAWADA, Yohei ,  DOHI, Ryousuke ,  NISHINO, Kouji ,  IKEDA, Nobukazu

IPC分类号： G05D7/06

CPC分类号： G05D7/0664 ,  Y10T137/85938 ,  Y10T137/87314 ,  Y10T137/87539

摘要： A flow rate ratio variable type diverted gas supply apparatus with which a gas is supplied to a chamber of semiconductor manufacturing facilities achieves a substantial reduction in size and cost, and makes it possible that a flow rate ratio is regulated at ease and with high accuracy.
With a flow rate ratio variable type fluid supply apparatus with which a gas of a flow rate Q supplied from a flow rate control system 6 is diverted and flowed to a No. 1 flow diverting pipe passage 1 and a No. 2 flow diverting pipe passage 2 with prescribed flow rates Q 1 /Q 0 so that the gas of flow rate Q is supplied to a chamber through both flow diverting pipe passages 1, 2, and the No. 1 orifice 3 having an opening area S 1 is installed on the aforementioned No. 1 flow diverting pipe passage 1, and the aforementioned No. 2 flow diverting pipe passage 2 is made to be a pipe passage to which a plurality of branch pipe passages 2a-2n are connected in parallel, and orifices 4a-4n having opening area S 2 a~S 2 n are installed on the aforementioned branch pipe passages 2a-2n respectively, and open/close valves Vb-Vn are installed on all, or some of, the aforementioned branch pipe passages, thus making it possible that gas of a flow rate Q is diverted and flowed to the flow diverting pipe passages 1, 2 with the flow rate ratio Q 1 /Q 0 equivalent to the ratio of the No. 1 orifice 3 of the aforementioned No. 1 flow diverting pipe passage1 and the total opening area S 2 o of the flow passable orifices of the aforementioned No. 2 flow diverting pipe passage 2 by means of regulating the total opening area S 2 o of flow passable orifices of the No. 2 flow diverting pipe passage by opening/closing operations of said open/close valves Vb-Vn.

摘要翻译： 向半导体制造装置的室供给气体的流量比可变型转向气体供给装置实现了大幅度的尺寸和成本的降低，能够容易且准确地调节流量比。 利用流量比可变型流体供给装置，将从流量控制系统6供给的流量Q的气体转向并流向1号分流管路1和2号分流管路 2，具有规定的流量Q 1 / Q 0，使得流量Q的气体通过两个分流管路1,2供应到室，并且具有开口面积S1的1号孔3安装在 上述1号分流管路1和上述2号分流管路2成为多个分支管路2a-2n并联连接的管路，并且具有 开口区域S 2 a〜S 2 n分别安装在上述分支管路2a-2n上，并且开闭阀Vb-Vn安装在上述分支管道的全部或一部分上，从而使得 流量Q的气体被转向并流向流向分流管pi pe通道1,2，其流量比Q 1 / Q 0相当于上述1号分流管通道1的1号孔3的比例和流通通孔的总开口面积S 2 o 上述2号分流管路2，通过开闭阀Vb-Vn的开闭动作，调节2号分流管路的流通通路的总开口面积S 2 o。

公开(公告)号：EP2034047A1

公开(公告)日：2009-03-11

申请号：EP07766935.6

申请日：2007-06-13

申请人： Fujikin Incorporated

发明人： HIRATA, Kaoru ,  NAGASE, Masaaki ,  HIDAKA, Atsushi ,  MATSUMOTO, Atsushi ,  DOHI, Ryousuke ,  NISHINO, Kouji ,  IKEDA, Nobukazu

IPC分类号： C23C16/455 ,  H01L21/205

CPC分类号： C23C16/4481 ,  C23C16/52 ,  G05D16/2013 ,  Y10T137/7737

摘要： Simplification and downsizing of the structure of an evaporation supply apparatus for the raw material used in manufacturing a semiconductor by the MODVC method are implemented. At the same time, stabilization and improvement of the quality of the semiconductor are implemented by highly accurately controlling the amount of raw material supplied to the process chamber.
The evaporation supply apparatus of the present invention includes: a source tank in which a raw material is pooled; a flow rate control device that, while regulating the flow rate of carrier gas at a constant flow rate from a carrier gas supply source, supplies the carrier gas into the raw material in the source tank; a primary piping path for feeding mixed gas G 0 , made up of raw material vapor G 4 and carrier gas G 1 , pooled in an upper space of the source tank; an automatic pressure regulating device that regulates the opening degree of a control valve, interposed in the tail end of the primary piping path, based on the detected values of the pressure and temperature of mixed gas G 0 in the primary piping path to regulate the cross-sectional area of the passage through which the mixed gas G 0 is distributed so as to hold a pressure of the mixed gas G 0 inside the source tank at a constant value; and a constant-temperature heating unit for heating the source tank and parts excluding an arithmetic control unit of the automatic pressure regulating device to a set temperature, in which the mixed gas G 0 is supplied to a process chamber while controlling the pressure inside the source tank to a desired pressure.

摘要翻译： 用于制造由该方法MODVC一个半导体中使用的原料的气化供给装置的结构的简化和小型化实现的。 与此同时，稳定和半导体的质量的提高是通过高度精确地设定控制原料供给到处理腔室的量实施。 本发明的蒸发供应设备包括：其中将原料汇集源罐; 一流量控制装置，虽然在从载气供给源的恒定流速调节载气的流量，载体气体供给到在源箱中的原料; 用于供给混合气体G 0的主配管路径，由原料蒸气G 4与载气G 1，在原料容器的上部空间中汇集的; 的自动压力调节装置做调控的控制阀的开度，在主配管路径的尾端插入，基于在主配管路径中的压力，并混合气体G 0的温度来调节交叉的检测值 通过该混合气G 0被分配，以保持混合气体G 0为恒定值的原料容器内的压力通道的截面面积; 以及用于加热源罐和不包括自动压力调节装置，以设定温度，其中，所述混合气体G 0，同时控制源的内部的压力被供给到处理腔室的运算控制部的各部分的恒温加热部 坦克所需的压力。