摘要:
A cost reduction can be achieved by making a differential pressure type flowmeter simple in structure, and highly accurate flow rate measurements can be attained over the wide flow rate range of 100%-1 % with errors E of less than 1 (%SP) both in real time and in a state of inline. To achieve the ends, a differential pressure type flowmeter comprises an orifice, a detector to detect a fluid pressure P 1 on the upstream side of an orifice, a detector to detect a fluid pressure P 2 on the downstream side of an orifice, a detector to detect a fluid temperature T on the upstream side of an orifice, and a control computation circuit to compute a fluid's flow rate Q passing through an orifice by using the pressure P 1 , pressure P 2 and temperature T detected with the aforementioned detectors, and the aforementioned fluid's flow rate Q is computed with the equation Q=C1 · P1/√T· ((P 2 /P 1 ) m - (P 2 /P 1 ) n ) ½ (where C 1 is a proportional constant, and m and n are constants).
摘要:
An actuator composed of a step motor and a cam mechanism is finely adjusted vertically so as to perform zero-point adjustment of a valve easily and readily. In a step motor driven cam valve 1 a stem 7 is disposed to freely ascend and descend within a body 2 having an in-low passage 2a, an out-flow passage 2b, a valve chamber 2c, and a valve seat 2d. The stem 7 is descended by an actuator disposed at a position above the stem 7 and composed of a step motor 9 and a cam mechanism 10 that changes a rotational motion of the step motor 9 to a linear motion and transmits the linear motion to the stem 7. A diaphragm 3 disposed within a valve chamber 2c or a valve body 30 arranged at a lower end part of the stem 7 rests on the valve seat 2d. A lift support mechanism 11 that supports the actuator to freely ascend and descend is arranged at a bonnet 5 that covers the valve chamber 2c of the body 2. A height fine-adjustment mechanism 12 finely adjusts the height of the actuator relative to the stem 7 and is arranged at the lift supporting mechanism 11.
摘要:
It has been found to be disadvantageous that, with a conventional pressure type flow control apparatus, it is not possible to determine the state of a valve on the downstream side of a throttle mechanism with a flow rate output signal due to the structural reason of the apparatus. To overcome the difficulty, the determination of whether a valve on the downstream side of a throttle mechanism is open is achieved at ease using the state of changes of a flow rate output signal while a pressure type flow control apparatus is in operation. With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe to be inputted to a pressure type flow control apparatus is changed to detect the magnitude ΔV of changes of a flow rate output signal Qo from a pressure type flow control apparatus while said flow rate setting value Qe changes so that it is determined either that a valve on the downstream side of a throttle mechanism is opening normally in the case that the magnitude ΔV of changes of said flow rate output signal Qo is found to be above the predetermined value, or that the releasing operations are malfunctioning in the case that the magnitude ΔV of changes is found to be below the predetermined value.
摘要:
A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
摘要:
Summary The present invention provides a vacuum thermal insulating valve that may be used at high temperature in gas supply systems or gas exhaust systems, and also may be made substantially small and compact in size owing to its excellent thermal insulating performance. With a vacuum thermal insulating valve comprising a valve equipped with a valve body and an actuator, and a vacuum thermal insulating box that houses the valve, the afore-mentioned vacuum thermal insulating box S is formed by a square-shaped lower vacuum jacket S 5 having a cylinder-shaped vacuum thermal insulating pipe receiving part J on a side and with its upper face made open, and the square-shaped upper vacuum jackets S 4 , which is hermetically fitted to the lower vacuum jacket S 5 and with its lower face made open.
摘要:
To provide a concentration measurement method with which the concentrations of predetermined chemical components can be measured non-destructively, accurately, and rapidly by a simple means, up to the concentrations in trace amount ranges, as well as a concentration measurement method with which the concentrations of chemical components in a measurement target can be accurately and rapidly measured in real time up to the concentrations in nano-order trace amount ranges, and which is endowed with a versatility that can be realized in a variety of embodiments and modes. [Solution] In the present invention, a measurement target is irradiated, in a time sharing manner, with light of a first wavelength and light of a second wavelength that have different optical absorption rates with respect to the measurement target. The light of each wavelength, arriving optically via the measurement target as a result of irradiation with the light of each wavelength, is received at a shared light-receiving sensor. A differential signal is formed, the differential signal being of a signal pertaining to the light of the first wavelength and a signal pertaining to the light of the second wavelength, the signals outputted from the light-receiving sensor upon receipt of the light. The concentration of a chemical component in the measurement target is derived on the basis of the differential signal.
摘要:
It is so made that abnormality of malfunction and sheet leaks occurring with a plurality of valves incorporated into a fluid supply line using a flow rate control apparatus can be checked easily, promptly and accurately by means of using operations of a flow rate control apparatus possessing a pressure sensor. Specifically, with a fluid supply line provided with a flow rate control apparatus possessing a pressure sensor equipped with a flow rate setting mechanism, a flow rate/pressure display mechanism and/or a flow rate self-diagnosis mechanism, abnormality of control valves, installed with the afore-mentioned flow rate control apparatus and on the upstream side and downstream side thereof, is detected by using the afore-mentioned pressure value displayed and/or the value diagnosed with a self-diagnosis mechanism of the afore-mentioned flow rate control apparatus.
摘要:
The present invention makes it possible for a flow rate to be controlled to be switched easily by means of an orifice being changed conveniently without disassembling or assembling a pressure type flow rate control apparatus. An orifice changeable pressure type flow rate control apparatus of the present invention is so constituted that a valve body (23) of a control valve (2) for a pressure type flow rate control apparatus (A) is installed between an inlet side fitting block (39) provided with a coupling part of a fluid supply pipe and an outlet side fitting block (43) provided with a coupling part of a fluid takeout pipe; a fluid inlet side of the valve body (23) and the afore-mentioned inlet side fitting block (39), and also a fluid outlet side of the afore-mentioned valve body (23) and the afore-mentioned outlet side fitting block (43) are detachably and hermitically connected, respectively, so that a flow passage for gases through the afore-mentioned control valve (2) is formed; and, a gasket type orifice (38) for a pressure type flow rate control apparatus (A) is removably inserted between a gasket type orifice insertion hole (42c) provided on the outlet side of the afore-mentioned valve body (23) and a gasket type orifice insertion hole (43b) of the outlet side fitting block (43b).
摘要:
A flow rate ratio variable type diverted gas supply apparatus with which a gas is supplied to a chamber of semiconductor manufacturing facilities achieves a substantial reduction in size and cost, and makes it possible that a flow rate ratio is regulated at ease and with high accuracy. With a flow rate ratio variable type fluid supply apparatus with which a gas of a flow rate Q supplied from a flow rate control system 6 is diverted and flowed to a No. 1 flow diverting pipe passage 1 and a No. 2 flow diverting pipe passage 2 with prescribed flow rates Q 1 /Q 0 so that the gas of flow rate Q is supplied to a chamber through both flow diverting pipe passages 1, 2, and the No. 1 orifice 3 having an opening area S 1 is installed on the aforementioned No. 1 flow diverting pipe passage 1, and the aforementioned No. 2 flow diverting pipe passage 2 is made to be a pipe passage to which a plurality of branch pipe passages 2a-2n are connected in parallel, and orifices 4a-4n having opening area S 2 a~S 2 n are installed on the aforementioned branch pipe passages 2a-2n respectively, and open/close valves Vb-Vn are installed on all, or some of, the aforementioned branch pipe passages, thus making it possible that gas of a flow rate Q is diverted and flowed to the flow diverting pipe passages 1, 2 with the flow rate ratio Q 1 /Q 0 equivalent to the ratio of the No. 1 orifice 3 of the aforementioned No. 1 flow diverting pipe passage1 and the total opening area S 2 o of the flow passable orifices of the aforementioned No. 2 flow diverting pipe passage 2 by means of regulating the total opening area S 2 o of flow passable orifices of the No. 2 flow diverting pipe passage by opening/closing operations of said open/close valves Vb-Vn.
摘要:
Simplification and downsizing of the structure of an evaporation supply apparatus for the raw material used in manufacturing a semiconductor by the MODVC method are implemented. At the same time, stabilization and improvement of the quality of the semiconductor are implemented by highly accurately controlling the amount of raw material supplied to the process chamber. The evaporation supply apparatus of the present invention includes: a source tank in which a raw material is pooled; a flow rate control device that, while regulating the flow rate of carrier gas at a constant flow rate from a carrier gas supply source, supplies the carrier gas into the raw material in the source tank; a primary piping path for feeding mixed gas G 0 , made up of raw material vapor G 4 and carrier gas G 1 , pooled in an upper space of the source tank; an automatic pressure regulating device that regulates the opening degree of a control valve, interposed in the tail end of the primary piping path, based on the detected values of the pressure and temperature of mixed gas G 0 in the primary piping path to regulate the cross-sectional area of the passage through which the mixed gas G 0 is distributed so as to hold a pressure of the mixed gas G 0 inside the source tank at a constant value; and a constant-temperature heating unit for heating the source tank and parts excluding an arithmetic control unit of the automatic pressure regulating device to a set temperature, in which the mixed gas G 0 is supplied to a process chamber while controlling the pressure inside the source tank to a desired pressure.